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1.发明公开
公开(公告)号：EP1855159A1
公开(公告)日：2007-11-14
申请号：EP06714631.6
申请日：2006-02-24
申请人： JSR Corporation
IPC分类号： G03F7/11 , H01L21/027
CPC分类号： G03F7/0752 , G03F7/0751 , G03F7/11 , H01L21/0274 , H01L21/0332 , Y10S430/106 , Y10S430/115 , Y10T428/31515 , Y10T428/31612 , Y10T428/31663
摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A),
R 1 b R 2 c Si(OR 3 ) 4-a (A)
wherein R 1 is a monovalent organic group having at least one unsaturated bond, R 2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R 3 individually represents a monovalent organic group, R 1 is a group other than OR 3 , a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.摘要翻译： 一种用于抗蚀剂下层组合物，被膜上设置。 该组合物具有优异的储存稳定性，并能形成一个抗蚀剂图案的抗蚀剂下层膜具有优异的粘附性的抗蚀剂电影，可提高再现性和在去除抗蚀剂过程中发展和氧灰化使用的碱性液体抗性。 该组合物包括水解产物和/或下式的硅烷化合物的缩合物（A），€€ƒƒƒ€€€ƒƒƒ€€€ƒƒR1 B r的2 C的Si（OR 3）4- 一个€ƒ€ƒ€ƒ€ƒ€ƒ（A）worin R 1为具有至少一个不饱和键，R 2独立darstellt氢原子，卤素原子或一价有机基团，R为单价有机基团3独立darstellt 一价有机基团，R 1不是OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c是0〜2的整数，条件做了= b + C ，
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公开(公告)号：EP2505613A1
公开(公告)日：2012-10-03
申请号：EP10832991.3
申请日：2010-10-15
申请人： JSR Corporation
CPC分类号： H05B33/04 , C08G77/12 , C08G77/58 , C08K5/057 , C08K5/5419 , H01L23/296 , H01L51/5246 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： A composition includes (A) a compound shown by the following general formula (1), and (B) a compound shown by the following general formula (2).
(R 1 )nM (1)摘要翻译： 组合物含有（A）下述通式（1）所示的化合物和（B）下述通式（2）所示的化合物。 （R1）nM的（1）
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