Patent search ap:("KLA TENCOR CORP") AND inv:"STOKOWSKI STANLEY E" Page 1

1.

发明公开
INSPECTION SYSTEMS AND METHODS FOR DETECTING DEFECTS ON EXTREME ULTRAVIOLET MASK BLANKS 有权
Title translation: 测试系统和针对极紫外空白光罩缺陷IDENTIFYING方法

公开(公告)号：EP2443651A4

公开(公告)日：2014-07-30

申请号：EP10789969

申请日：2010-06-10

Applicant: KLA TENCOR CORP

Inventor： STOKOWSKI STANLEY E

IPC: H01L21/027 , B82Y10/00 , B82Y40/00 , G03F1/00 , G03F1/24 , G03F1/84 , H01L21/66

CPC classification number: G03F1/84 , B82Y10/00 , B82Y40/00 , G03F1/24

2.

发明公开
IN-LINE WAFER EDGE INSPECTION, WAFER PRE-ALIGNMENT, AND WAFER CLEANING 审中-公开

公开(公告)号：EP3117453A4

公开(公告)日：2017-11-01

申请号：EP15809587

申请日：2015-06-19

Applicant: KLA-TENCOR CORP

Inventor： NICOLAIDES LENA , TSAI BEN-MING BENJAMIN , AJI PRASHANT A , GASVODA MICHAEL , STOKOWSKI STANLEY E , ZHAO GUOHENG , WEN YOUXIAN , MAHADEVAN MOHAN , HORN PAUL D , VOLLRATH WOLFGANG

IPC: H01L21/66 , G01N21/95 , G03F7/20 , H01L21/027

CPC classification number: G01N21/9503 , G01N2201/06113 , G03F7/7085 , H01L22/12

3.

发明公开
APPARATUS AND METHODS FOR INSPECTING EXTREME ULTRA VIOLET RETICLES 有权
Title translation: DEVICE AND METHOD FOR回顾极紫外光刻线

公开(公告)号：EP2862197A4

公开(公告)日：2016-02-17

申请号：EP13803745

申请日：2013-06-07

Applicant: KLA TENCOR CORP

Inventor： NASSER-GHODSI MEHRAN , STOKOWSKI STANLEY E , VAEZ-IRAVANI MEHDI

IPC: G06T7/00 , G03F1/84 , H01L21/027

CPC classification number: G06T7/001 , G06T2207/10061 , G06T2207/30148

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