公开(公告)号：EP2724361A2

公开(公告)日：2014-04-30

申请号：EP12803940.1

申请日：2012-06-07

申请人： KLA-Tencor Corporation

发明人： MANASSEN, Amnon ,  SELIGSON, Joel ,  SAPIENS, Noam

IPC分类号： H01L21/027

CPC分类号： G01J1/4257 ,  G02B21/0016 ,  G02B21/082 ,  G02B21/365 ,  G02B26/0833 ,  G03F7/70633

摘要： An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.

摘要翻译： 光学系统可以包括物镜，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统以及分别位于光瞳共轭平面和场共轭平面处的至少两个动态光学阵列装置 照明光学器件。 动态光学阵列装置被配置为控制从照明系统耦合到物镜的照明的一个或多个特性。

公开(公告)号：EP2474027B1

公开(公告)日：2020-01-15

申请号：EP10814430.4

申请日：2010-09-01

申请人： KLA-Tencor Corporation

发明人： KANDEL, Daniel ,  LEVINSKI, Vladimir ,  SVIZHER, Alexander ,  SELIGSON, Joel ,  HILL, Andrew ,  BACHAR, Ohad ,  MANASSEN, Amnon ,  CHUANG, Yung-Ho Alex ,  SELA, Ilan ,  MARKOWITZ, Moshe ,  NEGRI, Daria ,  ROTEM, Efraim

IPC分类号： G01N21/956

公开(公告)号：EP2867918A1

公开(公告)日：2015-05-06

申请号：EP13809023.8

申请日：2013-06-25

申请人： Kla-Tencor Corporation

发明人： SAPIENS, Noam ,  SELIGSON, Joel ,  LEVINSKI, Vladimir ,  KANDEL, Daniel ,  FELER, Yoel ,  BRINGOLTZ, Barak ,  MANASSEN, Amnon ,  BENISTY, Eliav

IPC分类号： H01L21/66

CPC分类号： G01N21/4788 ,  G01N2201/06113 ,  G02B27/56 ,  G02B27/58

摘要： Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.

公开(公告)号：EP2474027A2

公开(公告)日：2012-07-11

申请号：EP10814430.4

申请日：2010-09-01

申请人： KLA-Tencor Corporation

发明人： KANDEL, Daniel ,  LEVINSKI, Vladimir ,  SVIZHER, Alexander ,  SELIGSON, Joel ,  HILL, Andrew ,  BACHAR, Ohad ,  MANASSEN, Amnon ,  CHUANG, Yung-Ho Alex ,  SELA, Ilan ,  MARKOWITZ, Moshe ,  NEGRI, Daria ,  ROTEM, Efraim

IPC分类号： H01L21/66

CPC分类号： G01N21/47 ,  G01B11/02 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4792 ,  G01N2201/06113 ,  G01N2201/105 ,  G03F7/70625 ,  G03F7/70633

摘要： Various metrology systems and methods are provided.

公开(公告)号：EP2583300B1

公开(公告)日：2018-05-23

申请号：EP11796320.7

申请日：2011-06-14

申请人： KLA-Tencor Corporation

发明人： HILL, Andrew V. ,  MANASSEN, Amnon ,  KANDEL, Daniel ,  LEVINSKI, Vladimir ,  SELIGSON, Joel ,  SVIZHER, Alexander ,  WANG, David Y. ,  ROTTER, Lawrence D. ,  DE VEER, Johannes D.

IPC分类号： G01N21/47 ,  G03F7/20 ,  G02B27/14

CPC分类号： G02B27/141 ,  G01N21/474 ,  G01N21/4788 ,  G01N2021/4792 ,  G02B27/145 ,  G03F7/70633

摘要： Systems and methods for discrete polarization scatterometry are provided.

公开(公告)号：EP2583300A2

公开(公告)日：2013-04-24

申请号：EP11796320.7

申请日：2011-06-14

申请人： KLA-Tencor Corporation

发明人： HILL, Andrew V. ,  MANASSEN, Amnon ,  KANDEL, Daniel ,  LEVINSKI, Vladimir ,  SELIGSON, Joel ,  SVIZHER, Alexander ,  WANG, David Y. ,  ROTTER, Lawrence D. ,  DE VEER, Johannes D.

IPC分类号： H01L21/027 ,  H01L21/66

CPC分类号： G02B27/141 ,  G01N21/474 ,  G01N21/4788 ,  G01N2021/4792 ,  G02B27/145 ,  G03F7/70633

摘要： Systems and methods for discrete polarization scatterometry are provided. One embodiment relates to an optical subsystem of a scatterometer. The optical subsystem includes one or more light sources configured to produce light having different polarizations. The optical subsystem also includes a polarizing beam splitter configured to separate the light into two different light beams having orthogonal and mutually exclusive polarizations. The optical subsystem further includes one or more second optical elements configured to control which one of the two different light beams illuminates the wafer during measurements. The optical subsystem also includes a detection subsystem configured to separately detect two different scattered light beams resulting from illumination of the wafer. The two different scattered light beams have orthogonal and mutually exclusive polarizations. All optical surfaces of the optical subsystem used for the measurements are stationary during the measurements.