公开(公告)号：EP0142025A2

公开(公告)日：1985-05-22

申请号：EP84112111.4

申请日：1984-10-10

申请人： KOLLMORGEN CORPORATION

发明人： Teng, Yu-Ling ,  Mayernik, Richard

IPC分类号： C23C18/28

CPC分类号： C23C18/1879 ,  C23C18/1608 ,  C23C18/1612 ,  C23C18/1617 ,  C23C18/182 ,  C23C18/1831 ,  C23C18/1834 ,  C23C18/1868 ,  C23C18/1882 ,  C23C18/204 ,  C23C18/206 ,  C23C18/2066 ,  C23C18/24 ,  H05K3/185

摘要： An improved method for making conductive metal patterns is claimed involving the steps of treating a substrate with a solution comprising a reducible salt of a non-noble metal and a light radiation sensitive reducing compound, exposing said substrate to light radiant energy, fixing with a solution comprised of a complexing agent followed by electroless deposition, the improvement comprising extending the life span of the fixing solution by maintaining the concentration of the light sensitive reducing compound of the fixing solution so that it does not exceed 0,4 m moles/l i ter.

公开(公告)号：EP0142025B1

公开(公告)日：1990-01-03

申请号：EP84112111.4

申请日：1984-10-10

申请人： KOLLMORGEN CORPORATION

发明人： Teng, Yu-Ling ,  Mayernik, Richard

IPC分类号： C23C18/28

CPC分类号： C23C18/1879 ,  C23C18/1608 ,  C23C18/1612 ,  C23C18/1617 ,  C23C18/182 ,  C23C18/1831 ,  C23C18/1834 ,  C23C18/1868 ,  C23C18/1882 ,  C23C18/204 ,  C23C18/206 ,  C23C18/2066 ,  C23C18/24 ,  H05K3/185

公开(公告)号：EP0171817A2

公开(公告)日：1986-02-19

申请号：EP85110271.5

申请日：1985-08-16

申请人： KOLLMORGEN CORPORATION

发明人： Teng, Yu-Ling ,  McCoy, Charles ,  DeFalco, Francis ,  Mayernick, Richard ,  Liu, Chong Tan

IPC分类号： C25D3/56 ,  C25D3/22

CPC分类号： C25D3/565

摘要： The present invention provides an aqueous composition and process for electrodepositing a layer of a ductile, strongly adhering, adsorptive and/or absorptive zinc coating or zinc coating comprising silicon and phosphorous on a metal substrate. The electrodeposition composition is prepared by reacting metallic silicon and zinc with phosphoric acid and an alkali metal hydroxide in the ratio of between 0,4 and 1,3 moles of alkali metal hydroxide per mole of phosphorus acid, and adjusting the solution to a pH of 1 or higher after completion of the reaction. The coating is deposited on the metal substrate by electrodeposition and comprises about 70 to 99,5% by weight of zinc, and about 0,1 to 10% by weight of silicon, and about 0,5 to 20% by weight of phosphorus.
The resulting Zn/Si/P coating improves the resistance of the metal substrate to corrosion, wear, galling, stress corrosion cracking and cracking during mechanical forming operations. While essentially all metals of industrial importance may be coated, this process is especially important for ferrous metals, steels, stainless steels, copper, aluminium, chromium and titanium.

摘要翻译： 本发明提供了上wässrige组合物和用于electrodespositing可延展的层的处理，牢固粘附吸附和/或吸收锌涂层或锌涂层上的金属基片包括硅和磷。 的电沉积组合物是通过使金属硅和锌与磷酸和碱金属氢氧化物在每磷酸摩尔的碱金属氢氧化物的0.4和1.3之间的摩尔比，和调节溶液至pH调制机 1或更高的反应结束后添加。 该涂层沉积在通过电沉积在金属基材和包括锌的重量约70至99.5％，约0.1至10重量％的硅，以及约0.5至20％（重量）的phoshorus。 将所得的Zn / Si的/ P涂层改善金属基材的耐腐蚀性，耐磨损，磨损，应力腐蚀开裂和期间机械成型操作开裂。 虽然本质上的工业重要性的所有金属可以被涂覆，这个过程是爱黑色金属，钢，不锈钢，铜，铝，铬及钛尤其重要。