-
公开(公告)号:EP1375463A1
公开(公告)日:2004-01-02
申请号:EP02713248.9
申请日:2002-03-29
发明人: HANABATA, Makoto, c/o Kansai Research Inst. Inc. , SATO, Masahiro, c/o Kansai Research Institute Inc. , KATAYAMA, Junko, c/o Kansai Research Institute Inc , KITAJIMA, Satsuki, c/o Kansai Research Inst. Inc. , NIWA, Atsushi, c/o Kansai Research Institute, Inc.
IPC分类号: C07C43/205 , C07C69/96 , C07C43/225 , C07C69/92 , C07C69/773 , C07C43/215 , C07C69/618 , C07C69/65 , C07C69/734 , C07C69/82 , C07C69/76 , C07C69/94 , C07C235/56 , C07C271/58 , C07C317/22 , C07F7/08 , G03F7/004 , C08K5/00 , C08L101/00 , H01L21/30
CPC分类号: C07C317/22 , C07C43/303 , C07C43/313 , C07C43/315 , C07C69/92 , C07C69/96 , C07C271/58 , C07C2601/14 , C07C2603/18 , G03F7/0045 , G03F7/0392 , Y02P20/55 , Y10S430/114
摘要: A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):
A-[(J) m -(X-Pro)] n (1)
wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1.
The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.