公开(公告)号：EP1601006A3

公开(公告)日：2005-12-14

申请号：EP05251949.3

申请日：2005-03-30

申请人： LAM RESEARCH CORPORATION

发明人： Woods, Carl ,  Parks, John ,  Smith, Michael G. R.

IPC分类号： H01L21/00 ,  B08B3/00 ,  B08B3/04 ,  C23C18/16 ,  C25D7/12 ,  C25D5/22 ,  B05D1/00

CPC分类号： B08B3/02 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  C25D21/00 ,  H01L21/02057 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/67063 ,  H01L21/6708 ,  Y10S134/902

摘要： An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.

摘要翻译： 提供了一种用于产生待形成在衬底的表面上的流体弯液面的设备，包括：壳体，其中壳体包括待放置在衬底的衬底表面附近的壳体表面。 壳体还包括由壳体表面围绕的工艺配置接收区域。 该设备还包括具有插入表面的过程配置插入件，其中过程配置插入件被限定为配合在壳体的过程配置接收区域内，使得插入表面和壳体表面限定可以靠近 衬底的衬底表面。

公开(公告)号：EP1601006B1

公开(公告)日：2007-10-10

申请号：EP05251949.3

申请日：2005-03-30

申请人： LAM RESEARCH CORPORATION

发明人： Woods, Carl ,  Parks, John ,  Smith, Michael G. R.

IPC分类号： H01L21/00 ,  B08B3/00 ,  B08B3/04 ,  C23C18/16 ,  C25D7/12 ,  C25D5/22 ,  B05D1/00

CPC分类号： B08B3/02 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  C25D21/00 ,  H01L21/02057 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/67063 ,  H01L21/6708 ,  Y10S134/902

公开(公告)号：EP1601006A2

公开(公告)日：2005-11-30

申请号：EP05251949.3

申请日：2005-03-30

申请人： LAM RESEARCH CORPORATION

发明人： Woods, Carl ,  Parks, John ,  Smith, Michael G. R.

IPC分类号： H01L21/00 ,  B08B3/00 ,  B08B3/04 ,  C23C18/16 ,  C25D7/12 ,  C25D5/22 ,  B05D1/00

CPC分类号： B08B3/02 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  C25D21/00 ,  H01L21/02057 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/67063 ,  H01L21/6708 ,  Y10S134/902

摘要： An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.

摘要翻译： 提供了一种用于产生要形成在基板的表面上的流体弯液面的装置，其包括壳体，其中壳体包括靠近基板的基板表面放置的壳体表面。 壳体还包括由壳体表面包围的过程配置接收区域。 该设备还包括具有插入表面的过程配置插入件，其中该过程配置插入件被限定为适合于壳体的过程配置接收区域内，使得插入表面和壳体表面限定可以靠近 衬底的衬底表面。