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8 条记录 (耗时 0.015 秒)

    Method and apparatus for transporting a substrate using non-newtonian fluid
    1.
    发明公开
    Method and apparatus for transporting a substrate using non-newtonian fluid 审中-公开
    使用液体nichtnewtonischen方法和装置用于在基板的输送

    公开(公告)号：EP1734574A1

    公开(公告)日：2006-12-20

    申请号：EP06253004.3

    申请日：2006-06-10

    申请人： LAM RESEARCH CORPORATION

    发明人： de Larios, John M. ,  Ravkin, Mike ,  Parks, John ,  Korolik, Mikhail ,  Redeker, Fred C.

    IPC分类号： H01L21/677

    CPC分类号： H01L21/67784 ,  H01L21/67057

    摘要： A method for transporting a substrate is provided. In this method, a non-Newtonian fluid is provided and the substrate is suspended in the non-Newtonian fluid. The non-Newtonian fluid is capable of supporting the substrate. Thereafter, a supply force is applied on the non-Newtonian fluid to cause the non-Newtonian fluid to flow, whereby the flow is capable of moving the substrate along a direction of the flow. Apparatuses and systems for transporting the substrate using the non-Newtonian fluid also are described.

    摘要翻译： 本发明提供一种用于输送基板的方法。 在此方法中，非牛顿流体被提供和基片悬浮于非牛顿流体。 非牛顿流体是能够支撑基材。 有后，供给力被施加于非牛顿流体，使非牛顿流体流，由此所述气流能够沿着流动的方向移动所述衬底。 用于使用所述非牛顿流体，从而输送所述基板装置和系统进行了描述。

    Apparatus and system for cleaning a substrate
    3.
    发明公开
    Apparatus and system for cleaning a substrate 审中-公开
    Vorrichtung und System zur Reinigung eines Substrats

    公开(公告)号：EP1803503A2

    公开(公告)日：2007-07-04

    申请号：EP06256392.9

    申请日：2006-12-15

    申请人： Lam Research Corporation

    发明人： Freer, Erik M. ,  De Larios, John M. ,  Mikhaylichenko, Katrina ,  Thomas, Clint ,  Parks, John ,  Ravkin, Michael ,  Korolik, Mikhail ,  Redeker, Fred C.

    IPC分类号： B08B3/00 ,  B08B13/00 ,  H01L21/00 ,  C11D11/00 ,  C11D3/20 ,  C11D17/00

    CPC分类号： H01L21/67051 ,  B08B3/003 ,  B08B3/02

    摘要： An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.

    摘要翻译： 公开了一种用于清洁衬底的设备。 该装置具有第一头单元和第二头单元。 第一头单元定位成接近基底的表面，并且具有限定在构造成向基底的表面提供泡沫的第一排通道。 第二头单元被定位成基本上邻近第一头单元并且靠近衬底的表面。 第二和第三行通道被限定在第二头单元内。 第二排通道被配置成向衬底表面提供流体。 第三排通道被配置为向基板的表面施加真空。

    An apparatus and a method for processing a fluid meniscus
    7.
    发明公开
    An apparatus and a method for processing a fluid meniscus 有权
    Eine Vorrichtung und ein Verfahren um ein Fluidmeniskus herzustellen

    公开(公告)号：EP1601006A2

    公开(公告)日：2005-11-30

    申请号：EP05251949.3

    申请日：2005-03-30

    申请人： LAM RESEARCH CORPORATION

    发明人： Woods, Carl ,  Parks, John ,  Smith, Michael G. R.

    IPC分类号： H01L21/00 ,  B08B3/00 ,  B08B3/04 ,  C23C18/16 ,  C25D7/12 ,  C25D5/22 ,  B05D1/00

    CPC分类号： B08B3/02 ,  C25D5/08 ,  C25D17/00 ,  C25D17/001 ,  C25D21/00 ,  H01L21/02057 ,  H01L21/67023 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/67063 ,  H01L21/6708 ,  Y10S134/902

    摘要： An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.

    摘要翻译： 提供了一种用于产生要形成在基板的表面上的流体弯液面的装置，其包括壳体，其中壳体包括靠近基板的基板表面放置的壳体表面。 壳体还包括由壳体表面包围的过程配置接收区域。 该设备还包括具有插入表面的过程配置插入件，其中该过程配置插入件被限定为适合于壳体的过程配置接收区域内，使得插入表面和壳体表面限定可以靠近 衬底的衬底表面。