Illumination system for electron beam lithography tool
    1.
    发明公开
    Illumination system for electron beam lithography tool 有权
    电子束光刻设备的照明装置

    公开(公告)号:EP1091386A3

    公开(公告)日:2006-03-01

    申请号:EP00308685.7

    申请日:2000-10-03

    CPC classification number: H01J37/065 H01J37/12 H01J2237/1205 H01J2237/31774

    Abstract: A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical "fly's eye" lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

    Illumination system for electron beam lithography tool
    3.
    发明公开
    Illumination system for electron beam lithography tool 有权
    BeleuchtungsvorrichtungfürElektronenstrahl-Lithographiegeräte

    公开(公告)号:EP1091386A2

    公开(公告)日:2001-04-11

    申请号:EP00308685.7

    申请日:2000-10-03

    CPC classification number: H01J37/065 H01J37/12 H01J2237/1205 H01J2237/31774

    Abstract: A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical "fly's eye" lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

    Abstract translation: 一种通过将透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 透镜阵列可以是一个或多个网状网格或网格和连续箔片的组合。 透镜阵列形成了类似于光学“飞眼”透镜的大量微透镜。 透镜阵列将输入的固体电子束分裂成多个子波束,使得输出光束发射不同于入射光束发射,而光束总电流保持不变。 该方法和装置允许独立控制束电流和光束发射,这在SCALPEL照明系统中是有益的。

Patent Agency Ranking