公开(公告)号：EP2503587A2

公开(公告)日：2012-09-26

申请号：EP12172592.3

申请日：2004-03-10

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Kruit, Pieter

IPC: H01J37/317 ,  H01J37/063 ,  H01J3/02

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets and a charged particle beam lithography system comprising such an apparatus, said apparatus comprising:
a charged particle source (1) for generating a diverging charged particle beam;
a collimating means (4) for collimating said diverging charged particle beam, wherein said collimating means comprises at least one deflector array,
said deflector array adapted for having a voltage applied to each deflector of said deflector array for deflecting a beamlet (8),

wherein at least one deflector of said deflector array is adapted to assert a deflecting effect proportional to its distance with respect the optical axis of the beam.

Abstract translation: 本发明涉及一种用于产生多个带电粒子子束的装置和包括这种装置的带电粒子束光刻系统，所述装置包括：用于产生发散带电粒子束的带电粒子源（1） 用于准直所述发散带电粒子束的准直装置（4），其中所述准直装置包括至少一个偏转器阵列，所述偏转器阵列适于具有施加到所述偏转器阵列的每个偏转器的偏转器的电压，用于偏转小梁（8），其中 所述偏转器阵列的至少一个偏转器适于断定与其相对于光束的光轴的距离成比例的偏转效应。

公开(公告)号：EP2486581A1

公开(公告)日：2012-08-15

申请号：EP10769080.2

申请日：2010-10-08

Applicant: Mapper Lithography IP B.V.

Inventor： KONING, Johan Joost ,  STEENBRINK, Stijn Willem Herman ,  SCHIPPER, Bart

IPC: H01J37/317 ,  H01J37/12

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/12 ,  H01J2237/0435 ,  H01J2237/1205

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

公开(公告)号：EP2434522A1

公开(公告)日：2012-03-28

申请号：EP11195133.1

申请日：2003-07-08

Applicant: Canon Kabushiki Kaisha ,  Hitachi Ltd.

Inventor： Ono, Haruhito ,  Nagae, Kenichi ,  Takakuwa, Masaki ,  Nakayama, Yoshinori ,  Muto, Harunobu

IPC: H01J37/317 ,  H01J37/12 ,  B82Y10/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

Abstract: There is provided a multi-charged beam lens constituted by stacking, via fiber chips (212) serving as insulator members along the optical path of a charged beam, a plurality of electrodes (201a-201c) having a charged beam passing region (202) where a plurality of charged beam apertures are formed. The electrodes have shield apertures (203) between the charged beam passing region and the fiber chips. A conductive shield (204) extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region (202) and the fiber chips (212) serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.

Abstract translation: 提供了一种通过层叠构成的多带电束透镜，通过作为绝缘体构件沿着带电束的光路光纤芯片（212），电极（201A-201C），其具有带电束通过区域的多个（202） 其中带电束孔径的形成有多个。 电极具有防护孔（203）的带电束通过区域和纤维芯片之间。 导电屏蔽（204）通过屏蔽延伸没有孔接触电极上，并切断连接所述带电束通过区域（202）和作为绝缘体构件的纤维片（212）的直的路径。 这防止了绝缘构件的上充电的电子束在多带电束透镜的影响。

公开(公告)号：EP2126955A1

公开(公告)日：2009-12-02

申请号：EP08702133.3

申请日：2008-01-24

Applicant: NFAB Limited

Inventor： EASTHAM, Derek Anthony

IPC: H01J37/12

CPC classification number: H01J37/073 ,  B82Y15/00 ,  H01J37/065 ,  H01J37/12 ,  H01J37/28 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/1205 ,  H01J2237/1207

Abstract: A particle beam generator comprising particle extraction means disposed adjacent a particle source and operable to extract particles from such a source into an extraction aperture of the extraction means to form a particle beam, particle accelerating means operable to accelerate the extracted particles to increase the energy of the beam, and focussing means operable to focus the particle beam, each of said extraction means, accelerating means and focussing means being arranged in sequence and having apertures therethrough and in alignment to define a passageway through which the particles are constrained to move, characterised in that the extraction means comprises a lens structure comprising at least a pair of electrodes separated by a layer of insulating material allowing the application of different potentials to each of the lens structure electrodes, one of said electrodes comprising an extraction plate having an extraction aperture formed therein, by means of which extraction plate particles may be drawn from the particle source and through the extraction aperture by means of a potential difference between the source and said extraction plate.

公开(公告)号：EP1891467A4

公开(公告)日：2009-06-10

申请号：EP06768670

申请日：2006-05-29

Applicant: CEBT CO LTD

Inventor： KIM HO SEOB ,  KIM BYENG JIN

IPC: G02B3/00

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.

公开(公告)号：EP2050118A1

公开(公告)日：2009-04-22

申请号：EP07768909.9

申请日：2007-07-13

Applicant: Mapper Lithography IP B.V.

Inventor： KRUIT, Pieter ,  ZHANG, Yanxia ,  VAN BRUGGEN, Martijn, J. ,  STEENBRINK, Stijn, Willem, Herman, Karel

IPC: H01J37/12 ,  H01J37/063

CPC classification number: H01J37/12 ,  H01J2237/0453 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/153 ,  H01J2237/26 ,  H01J2237/3175

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one millimeter, more in particular less than a few tens of micrometers. In further elaboration, a lens is combined with a current limiting aperture (CLA), aligned such relative to a lens of said structure, that a virtual aperture (VA) effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

公开(公告)号：EP2023372A1

公开(公告)日：2009-02-11

申请号：EP07114130.3

申请日：2007-08-09

Applicant: Hitachi Ltd.

Inventor： Blackburn, Arthur

IPC: H01J37/12 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/12 ,  G01Q30/02 ,  G01Q70/10 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/03 ,  H01J2237/04756 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/20292 ,  H01J2237/244 ,  H01J2237/2544 ,  H01J2237/2583 ,  H01J2237/28 ,  H01J2237/2818

Abstract: An electrostatic lens unit (23) for a charged particle beam system includes an insulating sheet (35, 37) having first and second opposite sides (42, 43) and comprising first and second laterally-spaced portions (35, 37). The first insulating sheet portion (37) is arranged to provide a cantilever (25) supporting a tip (26) for nanometre-scale probing of a surface of a sample adjacent the second side of the sheet. The second insulating sheet portion supports first and second electrodes (69, 81) on the first and second sides (42, 43) respectively and has an aperture (41) for allowing passage of a charged particle beam through the electrodes from the first side to the second side of the sheet.

Abstract translation: 用于带电粒子束系统的静电透镜单元（23）包括具有第一和第二相对侧（42,43）并且包括第一和第二横向间隔部分（35,37）的绝缘片（35,37）。 第一绝缘片部分（37）被布置成提供支撑尖端（26）的悬臂（25），用于对邻近片材的第二侧的样品的表面进行纳米级探测。 第二绝缘片部分分别支撑第一和第二侧面（42,43）上的第一和第二电极（69,81），并且具有孔（41），用于允许带电粒子束通过电极从第一侧通过到 表格的第二面。

公开(公告)号：EP1929504A1

公开(公告)日：2008-06-11

申请号：EP06783665.0

申请日：2006-08-18

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob

IPC: H01J37/147

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J2237/06375 ,  H01J2237/1205 ,  H01J2237/28

Abstract: The present invention relates to a method of effectively changing the energy of an electron beam in an electron column for generating an electron beam. This includes the step of additionally applying voltage to an electrode such that the electron beam finally has the desired energy so as to freely control the energy when the electron beam reaches a sample.

公开(公告)号：EP1586106A4

公开(公告)日：2007-08-08

申请号：EP03781059

申请日：2003-12-30

Applicant: CEBT CO LTD

Inventor： KIM HO SEOB ,  AHN SEUNG JOON ,  KIM DAE WOOK

IPC: G03F9/00 ,  H01J3/02 ,  H01J3/10 ,  H01J37/06 ,  H01J37/067 ,  H01J37/15

CPC classification number: H01J3/028 ,  H01J3/10 ,  H01J37/067 ,  H01J37/15 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/24465 ,  H01J2237/24507

Abstract: The present invention provides a new extractor for a micro-column and an alignment method of the aperture of said extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of said alignment.

公开(公告)号：EP1649483A1

公开(公告)日：2006-04-26

申请号：EP04774182.2

申请日：2004-07-24

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob

IPC: H01J37/26

CPC classification number: H01J37/12 ,  H01J9/18 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/31774

Abstract: The present invention provides a method for manufacturing a lens assembly of a microcolumn having a plurality of microlenses and a plurality of insulating layers alternately interposed between the microlenses. The method includes forming at least one first microlens assembly set (set_1) by anodic-bonding an insulating layer (101) and a microlens (102) together; layering a second microlens assembly set (set_2) on the first microlens assembly set (set_1); and scanning a laser beam, thus welding the first microlens assembly set (set_1) to the microlens of the second microlens assembly set (set_2). The method of the present invention further includes anodic-bonding the microlens assembly sets together.