公开(公告)号：EP1091386B1

公开(公告)日：2012-11-21

申请号：EP00308685.7

申请日：2000-10-03

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Kruit, Peter ,  Moonen, Daniel ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065 ,  H01J37/317 ,  H01J37/30 ,  H01J37/12

CPC classification number: H01J37/065 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/31774

公开(公告)号：EP1052678B1

公开(公告)日：2009-07-01

申请号：EP00303786.8

申请日：2000-05-05

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Lidlle, James Alexander ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/31791

公开(公告)号：EP1091386A2

公开(公告)日：2001-04-11

申请号：EP00308685.7

申请日：2000-10-03

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Kruit, Peter ,  Moonen, Daniel ,  Waskiewicz, Warren Kazmir

IPC: H01J37/317 ,  H01J37/30 ,  H01J37/12

CPC classification number: H01J37/065 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical "fly's eye" lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

Abstract translation: 一种通过将透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 透镜阵列可以是一个或多个网状网格或网格和连续箔片的组合。 透镜阵列形成了类似于光学“飞眼”透镜的大量微透镜。 透镜阵列将输入的固体电子束分裂成多个子波束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许独立控制束电流和光束发射，这在SCALPEL照明系统中是有益的。

公开(公告)号：EP1091386A3

公开(公告)日：2006-03-01

申请号：EP00308685.7

申请日：2000-10-03

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Kruit, Peter ,  Moonen, Daniel ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065 ,  H01J37/317 ,  H01J37/30 ,  H01J37/12

CPC classification number: H01J37/065 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/31774

Abstract: A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical "fly's eye" lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

公开(公告)号：EP1052677B1

公开(公告)日：2008-07-23

申请号：EP00303780.1

申请日：2000-05-05

Applicant: Lucent Technologies Inc.

Inventor： Katsap, Victor ,  Liddle, James Alexander ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/3175 ,  Y10S430/143

公开(公告)号：EP1052678A3

公开(公告)日：2006-07-05

申请号：EP00303786.8

申请日：2000-05-05

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Lidlle, James Alexander ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/31791

Abstract: The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. The bias on the Wehnelt aperture (38) is reversed from the conventional bias so that it is biased positively with respect to the cathode. The Wehnelt opening is tapered with a disk emitter (36) inserted into the taper. The result of these modifications is an electron beam output with low brightness which is highly uniform over the beam cross section.

Abstract translation: 本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。 Wehnelt孔径（38）上的偏置与常规偏压相反，使得它相对于阴极被正偏置。 Wehnelt开口呈锥形，盘形发射器（36）插入锥形。 这些修改的结果是具有低亮度的电子束输出，其在束横截面上是高度均匀的。

公开(公告)号：EP1052677A3

公开(公告)日：2006-06-07

申请号：EP00303780.1

申请日：2000-05-05

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Liddle, James Alexander ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/3175 ,  Y10S430/143

Abstract: The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. A mesh grid is applied to the Wehnelt aperture and the mesh grid functions as a multiple secondary emitter to produce a uniform beam flux over a wide area. The grid voltage of the modified gun is substantially lower than in a conventional Wehnelt gun, i.e. less than 100 volts, which can be switched conveniently and economically using semiconductor drive circuits.

公开(公告)号：EP1052678A2

公开(公告)日：2000-11-15

申请号：EP00303786.8

申请日：2000-05-05

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Lidlle, James Alexander ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/31791

Abstract: The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. The bias on the Wehnelt aperture is reversed from the conventional bias so that it is biased positively with respect to the cathode. The Wehnelt opening is tapered with a disk emitter inserted into the taper. The resuit of these modifications is an electron beam output with low brightness which is highly uniform over the beam cross section.

Abstract translation: 本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。 Wehnelt孔径（38）上的偏置与常规偏压相反，使得它相对于阴极被正偏置。 Wehnelt开口呈锥形，盘形发射器（36）插入锥形。 这些修改的结果是具有低亮度的电子束输出，其在束横截面上是高度均匀的。

公开(公告)号：EP1052677A2

公开(公告)日：2000-11-15

申请号：EP00303780.1

申请日：2000-05-05

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Liddle, James Alexander ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/3175 ,  Y10S430/143

Abstract: The specification describes a method and apparatus for electron beam lithography wherein a Wehnelt electron gun is modified to improve the uniformity of the electron beam. A mesh grid is applied to the Wehnelt aperture and the mesh grid functions as a multiple secondary emitter to produce a uniform beam flux over a wide area. The grid voltage of the modified gun is substantially lower than in a conventional Wehnelt gun, i.e. less than 100 volts, which can be switched conveniently and economically using semiconductor drive circuits.

Abstract translation: 本说明书描述了一种用于电子束光刻的方法和装置，其中修改了Wehnelt电子枪以改善电子束的均匀性。 网格被施加到Wehnelt孔径，并且网格栅格用作多个次级发射器以在广泛的区域上产生均匀的光束通量。 修改枪的电网电压基本上低于常规的Wehnelt枪，即小于100伏特，其可以使用半导体驱动电路方便和经济地切换。