IMPROVED MICROETCHING SOLUTION
    1.
    发明公开
    IMPROVED MICROETCHING SOLUTION 有权
    改进的微蚀

    公开(公告)号:EP1920026A1

    公开(公告)日:2008-05-14

    申请号:EP06771598.7

    申请日:2006-05-31

    IPC分类号: C09K13/00

    摘要: The present invention related to an improved microetching solution and a method of using the improved composition for roughening a metal surface and increasing the adhesion strength of a metal layer to a subsequently applied layer. The microetching composition is an aqueous solution comprising cupric ion source, a pyridine derivative, multiethyleneamine, and an acid. In a preferred embodiment, the microetching solution of the invention also comprises a source of halide ions such as sodium chloride or hydrochloric acid.