公开(公告)号：EP2284873A4

公开(公告)日：2014-04-02

申请号：EP09733087

申请日：2009-04-10

申请人： NAT UNIVERSITY CORP TOHOKU UNVERSITY ,  STELLA CHEMIFA CORP

发明人： OHMI TADAHIRO ,  TERAMOTO AKINOBU ,  HASEBE RUI ,  MIYASHITA MASAYUKI

IPC分类号： H01L21/306

CPC分类号： H01L21/02052 ,  H01L21/02054 ,  H01L21/0206 ,  Y10S438/906

公开(公告)号：EP2197020A4

公开(公告)日：2012-12-26

申请号：EP08830661

申请日：2008-09-12

申请人： NAT UNIVERSITY CORP TOHOKU UNVERSITY ,  FOUND ADVANCEMENT INT SCIENCE

发明人： OHMI TADAHIRO ,  GOTO TETSUYA

IPC分类号： H01J61/06 ,  H01J9/02 ,  H01J61/70

CPC分类号： H01J61/0675 ,  H01J9/022 ,  H01J61/72

公开(公告)号：EP2662886A4

公开(公告)日：2015-07-29

申请号：EP12739200

申请日：2012-01-23

申请人： FURUKAWA ELECTRIC CO LTD ,  NAT UNIVERSITY CORP TOHOKU UNVERSITY

发明人： KAMBAYASHI HIROSHI ,  TERAMOTO AKINOBU ,  OHMI TADAHIRO

IPC分类号： H01L29/778 ,  H01L21/306 ,  H01L21/336 ,  H01L21/338 ,  H01L29/20 ,  H01L29/423 ,  H01L29/51

CPC分类号： H01L29/66666 ,  H01L21/30621 ,  H01L29/2003 ,  H01L29/4236 ,  H01L29/51 ,  H01L29/66462 ,  H01L29/66522 ,  H01L29/7783 ,  H01L29/7786

公开(公告)号：EP1780778A4

公开(公告)日：2009-06-03

申请号：EP05757755

申请日：2005-07-11

申请人： UNIV TOHOKU ,  STELLA CHEMIFA CORP

发明人： OHMI TADAHIRO ,  TERAMOTO AKINOBU ,  KIKUYAMA HIROHISA ,  NII KEIICHI ,  YAMAMOTO MASASHI

IPC分类号： H01L21/306

CPC分类号： H01L21/02063

摘要： Disclosed is a process liquid which causes only little dissolution of atoms from a semiconductor surface and enables to form a clean and flat semiconductor surface. Also disclosed are a processing method and an apparatus for manufacturing a semiconductor. Specifically disclosed is a process liquid which causes only little dissolution of atoms from a semiconductor surface by using an aqueous solution containing at least one alcohol or ketone, thereby realizing a clean and flat surface.