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公开(公告)号：EP3196330A4
公开(公告)日：2018-03-28
申请号：EP14902022
申请日：2014-09-17
发明人： MORIGUCHI HIDEKI , SAITO TADASHI , TANAKA YOSHIKAZU , ARAHI TETSUMI , OGAWA KATSUAKI , OKAZAKI TAKAHIRO , SUGIURA HIROYUKI , ITO YOSHIHIRO
CPC分类号： C23C14/0605 , B82Y40/00 , C01B31/0206 , C01B32/05 , C23C14/024 , C23C14/06 , C23C14/5833
摘要： Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance (defect resistance) and peeling resistance. This coating film coats a substrate surface, wherein a hard carbon layer is formed extending in columns-shape perpendicular to the substrate when observed in a cross-sectional bright-field TEM image, the hard carbon layer is formed using a PVD method, and the ID/IG ratio is 1-6 when the hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, and heater temperature to maintain a substrate temperature of 250-400°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate.
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公开(公告)号：EP3196331A4
公开(公告)日：2018-04-18
申请号：EP14902110
申请日：2014-09-17
发明人： MORIGUCHI HIDEKI , SAITO TADASHI , TANAKA YOSHIKAZU , SHIBATA AKINORI , ARAHI TETSUMI , OGAWA KATSUAKI , OKAZAKI TAKAHIRO , SUGIURA HIROYUKI , ITO YOSHIHIRO
IPC分类号： C23C14/06 , C01B32/05 , C10M103/02 , C23C14/32
CPC分类号： C10M103/02 , C01B31/02 , C01B32/05 , C01P2002/82 , C01P2004/04 , C10M2201/0413 , C10N2230/20 , C23C14/06 , C23C14/0605 , C23C14/325
摘要： Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance and peeling resistance. This film is coated on a substrate surface, wherein the coating film has a hard carbon that presents relatively black and white when observed in a cross-sectional bright-field TEM image, a mesh-shaped hard carbon layer is formed using a PVD method, said layer having white-colored hard carbon in a mesh shape extending in the thickness direction and black-colored hard carbon dispersed into the cavities in the mesh, and the ID/IG ratio is 1-6 when the mesh-shaped hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, and heater temperature, etc. to maintain a substrate temperature exceeding 200°C but not exceeding 300°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate.
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