公开(公告)号：EP1937757B1

公开(公告)日：2018-10-17

申请号：EP06710193.1

申请日：2006-03-08

申请人： National Center for Scientific Research Demokritos ,  Tserepi, Angeliki ,  Gogolidis, Evangelos ,  Misiakos, Konstantinos

发明人： TSEREPI, Angeliki ,  GOGOLIDES, Evangelos ,  MISIAKOS, Konstantinos ,  VLACHOPOULOU, Maria-Elena ,  VOURDAS, Nikolaos

IPC分类号： C08J7/12 ,  B05D3/14 ,  H05H1/14 ,  B81B1/00

CPC分类号： B05D5/08 ,  B01L3/5027 ,  B05D3/144 ,  B05D7/02 ,  B29C59/14 ,  B29K2033/12 ,  C08J7/12 ,  C08J2333/12 ,  C08J2383/04

摘要： This invention provides a method for the fabrication of surfaces of high surface area ratio on polymeric/plastic materials, and their application in the control of the wetting properties of surfaces, of the transport of liquids on such fabricated surfaces, or of the separation of liquids in microchannels of said surfaces. The fabrication of surfaces of high surface area ratio comprises the following steps: (a) selection of a polymer/plastic layer which contains two or more components differing in their plasma etching behaviour (b) exposure of said polymer/plastic layer to an etching plasma to provide selective removal of one polymer component versus a second plasma-resistant component so as to result in a randomly rough columnar-like surface. In addition, exposure of the said surface to an oxidizing plasma or to a fluorocarbon. depositing plasma renders the surface fully hydrophilic or en super-hydrophobic, respectively.

公开(公告)号：EP1937757A1

公开(公告)日：2008-07-02

申请号：EP06710193.1

申请日：2006-03-08

申请人： National Center for Scientific Research Demokritos ,  Tserepi, Angeliki ,  Gogolidis, Evangelos ,  Misiakos, Konstantinos

发明人： TSEREPI, Angeliki ,  GOGOLIDES, Evangelos ,  MISIAKOS, Konstantinos ,  VLACHOPOULOU, Maria-Elena ,  VOURDAS, Nikolaos

IPC分类号： C08J7/12 ,  B05D3/14 ,  H05H1/14 ,  B81B1/00

CPC分类号： B05D5/08 ,  B01L3/5027 ,  B05D3/144 ,  B05D7/02 ,  B29C59/14 ,  B29K2033/12 ,  C08J7/12 ,  C08J2333/12 ,  C08J2383/04

摘要： This invention provides a method for the fabrication of surfaces of high surface area ratio on polymeric/plastic materials, and their application in the control of the wetting properties of surfaces, of the transport of liquids on such fabricated surfaces, or of the separation of liquids in microchannels of said surfaces. The fabrication of surfaces of high surface area ratio comprises the following steps: (a) selection of a polymer/plastic layer which contains two or more components differing in their plasma etching behaviour (b) exposure of said polymer/plastic layer to an etching plasma to provide selective removal of one polymer component versus a second plasma-resistant component so as to result in a randomly rough columnar-like surface. In addition, exposure of the said surface to an oxidizing plasma or to a fluorocarbon. depositing plasma renders the surface fully hydrophilic or en super-hydrophobic, respectively.

摘要翻译： 本发明提供了在聚合物/塑料材料的高表面面积比的表面的制造方法，及其在表面的液体的运输的，的润湿性的控制上应用求制造的表面，或液体的分离的 在所述表面的微通道。 高表面积比的表面的制造包括以下步骤：（a）选择含有两个或更多个部件在蚀刻等离子体在他们的等离子体蚀刻行为（b）所述聚合物/塑料层的曝光不同的聚合物/塑料层的 为了提供与第二等离子体抗性分量选择性去除一种聚合物组分，以便产生一个随机粗糙柱状状表面。 此外，该表面暴露于所述与氧化浆液或碳氟化合物。 沉积等离子体使表面完全亲水或烯超疏水，分别。

公开(公告)号：EP1395878A1

公开(公告)日：2004-03-10

申请号：EP02727805.0

申请日：2002-05-30

申请人： National Center for Scientific Research Demokritos ,  Argitis, Panagiotis ,  Misiakos, Konstantinos ,  Kakabakos, Sotirios E. ,  Douvas, Antonios ,  Diakoumakos, Constantinos D.

发明人： ARGITIS, Panagiotis ,  MISIAKOS, Konstantinos ,  KAKABAKOS, Sotirios, E.Inst. of Radioisotopes ,  DOUVAS, Antonios ,  DIAKOUMAKOS, Constantinos D.

IPC分类号： G03F7/039 ,  G03F7/40 ,  G01N33/552 ,  G01N33/545

CPC分类号： G03F7/0397 ,  G01N33/545 ,  G01N33/552 ,  G03F7/40 ,  Y10S430/106 ,  Y10S430/111

摘要： Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and analogous resists for biomolecule layer patterning on solid substrates are also described. The processes described enable micropatterning of more than two different proteins on solid substrates without denaturation of the proteins. The preferred resist materials are based on (meth)acrylate copolymers that contain at least one acid cleavable ester group and at least one hydrophilic group such as an alcoholic or a carboxylic group.

公开(公告)号：EP1395878B1

公开(公告)日：2009-07-08

申请号：EP02727805.0

申请日：2002-05-30

申请人： National Center for Scientific Research Demokritos ,  Argitis, Panagiotis ,  Misiakos, Konstantinos ,  Kakabakos, Sotirios E. ,  Douvas, Antonios ,  Diakoumakos, Constantinos D.

发明人： ARGITIS, Panagiotis ,  MISIAKOS, Konstantinos ,  KAKABAKOS, Sotirios, E. Inst. of Radioisotopes and ,  DOUVAS, Antonios ,  DIAKOUMAKOS, Constantinos D.

IPC分类号： G03F7/039 ,  G03F7/40 ,  G01N33/552 ,  G01N33/545

CPC分类号： G03F7/0397 ,  G01N33/545 ,  G01N33/552 ,  G03F7/40 ,  Y10S430/106 ,  Y10S430/111

摘要： Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and analogous resists for biomolecule layer patterning on solid substrates are also described. The processes described enable micropatterning of more than two different proteins on solid substrates without denaturation of the proteins. The preferred resist materials are based on (meth)acrylate copolymers that contain at least one acid cleavable ester group and at least one hydrophilic group such as an alcoholic or a carboxylic group.

公开(公告)号：EP3532825A1

公开(公告)日：2019-09-04

申请号：EP17797175.1

申请日：2017-10-23

申请人： NATIONAL CENTER FOR SCIENTIFIC RESEARCH "DEMOKRITOS" ,  Misiakos, Konstantinos ,  Raptis, Ioannis

发明人： MISIAKOS, Konstantinos ,  RAPTIS, Ioannis ,  SALAPATAS, Alexandros

IPC分类号： G01N21/45