公开(公告)号：EP0717762A4

公开(公告)日：1997-06-11

申请号：EP94927305

申请日：1994-09-02

申请人： RODEL INC

发明人： COOK LEE MELBOURNE ,  LONCKI SCOTT B ,  BRANCALEONI GREGORY

IPC分类号： C01B33/18 ,  C09K3/14 ,  H01L21/304 ,  C09G1/02

CPC分类号： C09K3/1454

摘要： Disclosed is a process for preparing activated compositions and the compositions derived therefrom which are suitable for polishing surfaces, particularly integrated circuits, wherein a base abrasive is activated by addition of a second cation whose oxide exhibits a higher polishing rate than the base abrasive alone. The activation is effected by chemical adsorption of the activating cation onto the base abrasive during cyclic impact in an aqueous medium whose pH is at a level which is favorable for adsorption of the activating cation onto the base abrasive surface.

公开(公告)号：EP0706582A4

公开(公告)日：1997-06-11

申请号：EP94918171

申请日：1994-05-25

申请人： RODEL INC

发明人： BRANCALEONI GREGORY ,  COOK LEE MELBOURNE

IPC分类号： B24B37/00 ,  C04B41/91 ,  C09G1/02 ,  C23F1/24 ,  C23F1/30 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3105 ,  H01L21/321 ,  C23F1/00

CPC分类号： H01L21/3212 ,  C09G1/02 ,  H01L21/31053 ,  Y10S451/905

摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.

公开(公告)号：EP0690772A4

公开(公告)日：1995-06-01

申请号：EP93902930

申请日：1993-01-05

申请人： RODEL INC

发明人： BRANCALEONI GREGORY ,  JENSEN ELMER W ,  ROBERTS JOHN V H

IPC分类号： B24D3/00 ,  B24D3/34 ,  C08L71/02 ,  C09C1/68 ,  C09G1/02 ,  C09K3/14

CPC分类号： C09G1/02 ,  B24D3/346 ,  C09K3/14

摘要： An abrasive composition for use in polishing or planarizing the surface of a work piece is provided comprising about 30 to 50 percent of cerium oxide; about 8 to about 20 percent of fumed silica and about 15 to about 45 percent of precipitated silica. Methods using the composition to polish or planarize the surfaces of work pieces, as well as products produced by such methods, are also provided.

摘要翻译： 提供用于抛光或平坦化工件表面的磨料组合物，其包含约30至50％的氧化铈; 约8至约20％的热解法二氧化硅和约15至约45％的沉淀二氧化硅。 还提供了使用组合物来抛光或平坦化工件表面的方法，以及通过这些方法生产的产品。