Semiconductor device manufacturing method
    4.
    发明公开
    Semiconductor device manufacturing method 有权
    Methode zur Herstellung eines Halbleiterbauelements

    公开(公告)号:EP1641039A1

    公开(公告)日:2006-03-29

    申请号:EP05020906.3

    申请日:2005-09-26

    摘要: The invention is directed to an improvement of reliability of a chip size package type semiconductor device in a manufacturing method thereof. A support body (14) is formed on a front surface of a semiconductor substrate (10) with a first insulation film (11) therebetween. Then, a part of the semiconductor substrate (10) is selectively etched from its back surface to form an opening (10w), and then a second insulation film (16) is formed on the back surface. Next, the first insulation film (11) and the second insulation film (16) at a bottom of the opening (10w) are selectively etched, to expose pad electrodes (12) at the bottom of the opening (10w). Then, a third resist layer (18) is selectively formed on the second insulation film (16) at boundaries between sidewalls and the bottom of the opening (10w) on the back surface of the semiconductor substrate (10). Furthermore, a wiring layer (19) electrically connected with the pad electrodes (12) at the bottom of the opening (10w) and extending onto the back surface of the semiconductor substrate (10) is selectively formed corresponding to a predetermined pattern.

    摘要翻译: 本发明的目的在于提高芯片尺寸封装型半导体器件的制造方法的可靠性。 在半导体基板(10)的前表面上形成有第一绝缘膜(11)的支撑体(14)。 然后,从其背面选择性地蚀刻半导体衬底(10)的一部分以形成开口(10w),然后在背面形成第二绝缘膜(16)。 接下来,选择性地蚀刻开口(10w)底部的第一绝缘膜(11)和第二绝缘膜(16),以露出开口(10w)底部的焊盘电极(12)。 然后,在半导体衬底(10)的背面的开口(10w)的侧壁和底部之间的边界处,在第二绝缘膜(16)上选择性地形成第三抗蚀剂层(18)。 此外,对应于预定图案,选择性地形成与开口(10w)底部的焊盘电极(12)电连接并延伸到半导体衬底(10)的背面上的布线层(19)。