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1.发明授权Radiation sensitive compositions comprising polymer having acid labile groups 失效含有具有基的聚合物的辐射敏感混合物säureunstabilen
公开(公告)号：EP0534324B1
公开(公告)日：1999-12-22
申请号：EP92115982.8
申请日：1992-09-18
Applicant: SHIPLEY COMPANY INC.
Inventor： Sinta, Roger , Hemond, Richard, C. , Medeiros, David, R. , Rajaratnam, Martha, M. , Thackeray, James W. , Canistro, Dianne
CPC classification number: G03F7/0233 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/11
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公开(公告)号：EP0423446B1
公开(公告)日：1998-03-04
申请号：EP90114949.2
申请日：1990-08-03
Applicant: SHIPLEY COMPANY INC.
Inventor： Lamola, Angelo A. , Calabrese, Gary , Sinta, Roger
IPC: G03F7/038
CPC classification number: G03F7/0045 , G03F7/038
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3.发明公开Radiation sensitive compositions comprising polymer having acid labile groups 失效Strahlungsempfindliches Gemisch，das Polymere mitsäureunstabilenGruppierungenenthält。
公开(公告)号：EP0534324A1
公开(公告)日：1993-03-31
申请号：EP92115982.8
申请日：1992-09-18
Applicant: SHIPLEY COMPANY INC.
Inventor： Sinta, Roger , Hemond, Richard, C. , Medeiros, David, R. , Rajaratnam, Martha, M. , Thackeray, James W. , Canistro, Dianne
IPC: G03F7/039
CPC classification number: G03F7/0233 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/11
Abstract: The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.
Abstract translation: 本发明提供了具有酚和环醇单元的聚合物粘合剂的辐射敏感组合物。 聚合物的至少一部分酚单元和/或环醇单元与酸不稳定基团键合。 暴露和未曝光区域之间的高溶解度差异仅通过粘合剂与酸不稳定基团的适度取代来实现。
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公开(公告)号：EP0423446A1
公开(公告)日：1991-04-24
申请号：EP90114949.2
申请日：1990-08-03
Applicant: SHIPLEY COMPANY INC.
Inventor： Lamola, Angelo A. , Calabrese, Gary , Sinta, Roger
IPC: G03F7/038
CPC classification number: G03F7/0045 , G03F7/038
Abstract: A photoacid-generating photoresist composition sensitized with an aromatic, multi-ring, heterocylcic nitrogen containing sensitizer, preferably a ring extended phenothiazine derivative. The use of the sensitizer permits exposure of photoresists to near UV irradiation where such photoresists have heretofore been exposed to deep UV irradiation. The invention is especially useful for acid hardening photoresist systems.
Abstract translation: 一种产生光致酸的光致抗蚀剂组合物，其用芳香族，多环，杂环状含氮增感剂，优选环延长的吩噻嗪衍生物敏化。 敏化剂的使用允许光致抗蚀剂暴露于近紫外辐射下，其中这种光刻胶已经暴露于深紫外线照射。 本发明特别适用于酸硬化光致抗蚀剂体系。
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