公开(公告)号：EP0118291A3

公开(公告)日：1986-08-20

申请号：EP84301389

申请日：1984-03-02

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Furuta, Akihiro ,  Hanabata, Makoto ,  Yasui, Seimei ,  Hiroaki, Osamu ,  Jinno, Naoyoshi

IPC分类号： G03F07/08

CPC分类号： G03F7/0236

摘要： A positive type photoresist composition comprises (a) a novolak resin and (b) a quinonediazide compound in wt. ratio of 1:1 to 6:1. The novolak resin is obtained by the addition condensation of a phenol and formaldehyde, in one stage by using as a catalyst an organic acid salt of a divalent metal more electropositive than hydrogen, or in two stages by using the acid catalyst in the subsequent stage, the phenol being at least one compound of formula:
wherein R is hydrogen or C1-4 alkyl group and being such that the average C number in the substituent per phenol nucleus is 0.5 to 1.5 and less than 50 mol% of the molecules have substituents at the ortho- or para-position with respect to the -OH group. Preferred salts are acetates of Mg, Mn, Zn, Cd, Co, and Pb. NMR spectra are shown of the resins. The composition in solvent is coated on a support, and has a good resolving power.

公开(公告)号：EP0118291B1

公开(公告)日：1990-07-11

申请号：EP84301389.7

申请日：1984-03-02

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Furuta, Akihiro ,  Hanabata, Makoto ,  Yasui, Seimei ,  Hiroaki, Osamu ,  Jinno, Naoyoshi

IPC分类号： G03F7/023

CPC分类号： G03F7/0236

公开(公告)号：EP0118291A2

公开(公告)日：1984-09-12

申请号：EP84301389.7

申请日：1984-03-02

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Furuta, Akihiro ,  Hanabata, Makoto ,  Yasui, Seimei ,  Hiroaki, Osamu ,  Jinno, Naoyoshi

IPC分类号： G03F7/023

CPC分类号： G03F7/0236

摘要： A positive type photoresist composition comprises (a) a novolak resin and (b) a quinonediazide compound in wt. ratio of 1:1 to 6:1. The novolak resin is obtained by the addition condensation of a phenol and formaldehyde, in one stage by using as a catalyst an organic acid salt of a divalent metal more electropositive than hydrogen, or in two stages by using the acid catalyst in the subsequent stage, the phenol being at least one compound of formula:
wherein R is hydrogen or C1-4 alkyl group and being such that the average C number in the substituent per phenol nucleus is 0.5 to 1.5 and less than 50 mol% of the molecules have substituents at the ortho- or para-position with respect to the -OH group.
Preferred salts are acetates of Mg, Mn, Zn, Cd, Co, and Pb.
NMR spectra are shown of the resins.
The composition in solvent is coated on a support, and has a good resolving power.