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公开(公告)号：EP0118291A2
公开(公告)日：1984-09-12
申请号：EP84301389.7
申请日：1984-03-02
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
摘要： A positive type photoresist composition comprises (a) a novolak resin and (b) a quinonediazide compound in wt. ratio of 1:1 to 6:1. The novolak resin is obtained by the addition condensation of a phenol and formaldehyde, in one stage by using as a catalyst an organic acid salt of a divalent metal more electropositive than hydrogen, or in two stages by using the acid catalyst in the subsequent stage, the phenol being at least one compound of formula:
wherein R is hydrogen or C1-4 alkyl group and being such that the average C number in the substituent per phenol nucleus is 0.5 to 1.5 and less than 50 mol% of the molecules have substituents at the ortho- or para-position with respect to the -OH group.
Preferred salts are acetates of Mg, Mn, Zn, Cd, Co, and Pb.
NMR spectra are shown of the resins.
The composition in solvent is coated on a support, and has a good resolving power.-
公开(公告)号：EP0235812A1
公开(公告)日：1987-09-09
申请号：EP87103085.4
申请日：1987-03-04
IPC分类号： G11B7/24
CPC分类号： G11B7/24 , Y10S428/913 , Y10S430/146
摘要： An optical disk is provided which comprises two sheets of substrates; (1) or two sheets of substrate (1) and a reinforcing plate (4) or a reinforcing rim; or one sheet of substrate (1) and a reinforcing plate; (4) which are bonded to form an integrated body having a spacer (3) interposed there-between, said spacer (3) being made of elastomeric foam having a specific gravity of not more than 1.5 and an expansion ratio of not less than 1.5 as the material of the said spacer.(3)
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公开(公告)号：EP0118291B1
公开(公告)日：1990-07-11
申请号：EP84301389.7
申请日：1984-03-02
IPC分类号： G03F7/023
CPC分类号： G03F7/0236
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公开(公告)号：EP0235812B1
公开(公告)日：1990-06-13
申请号：EP87103085.4
申请日：1987-03-04
IPC分类号： G11B7/24
CPC分类号： G11B7/24 , Y10S428/913 , Y10S430/146
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公开(公告)号：EP0095388B1
公开(公告)日：1987-11-19
申请号：EP83303026.5
申请日：1983-05-25
IPC分类号： G03F7/08
CPC分类号： G03F7/0233
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公开(公告)号：EP0118291A3
公开(公告)日：1986-08-20
申请号：EP84301389
申请日：1984-03-02
IPC分类号： G03F07/08
CPC分类号： G03F7/0236
摘要： A positive type photoresist composition comprises (a) a novolak resin and (b) a quinonediazide compound in wt. ratio of 1:1 to 6:1. The novolak resin is obtained by the addition condensation of a phenol and formaldehyde, in one stage by using as a catalyst an organic acid salt of a divalent metal more electropositive than hydrogen, or in two stages by using the acid catalyst in the subsequent stage, the phenol being at least one compound of formula:
wherein R is hydrogen or C1-4 alkyl group and being such that the average C number in the substituent per phenol nucleus is 0.5 to 1.5 and less than 50 mol% of the molecules have substituents at the ortho- or para-position with respect to the -OH group. Preferred salts are acetates of Mg, Mn, Zn, Cd, Co, and Pb. NMR spectra are shown of the resins. The composition in solvent is coated on a support, and has a good resolving power.-
公开(公告)号：EP0095388A3
公开(公告)日：1984-05-30
申请号：EP83303026
申请日：1983-05-25
IPC分类号： G03F07/08
CPC分类号： G03F7/0233
摘要： A positive-type photoresist composition comprises polyhydroxy-a-methylstyrene or a hydroxy-a-methylstyrene copolymer having a molecular weight of from 1,000 to 100,000 and, as a photo-sensitizer, a quinonediazide compound. The copolymer may be used in combination with a novolak resin in an amount of at least 1 wt% of the resin. The weight ratio of photosensitizer to copolymer or copolymer and resin is 1:1 to 1:6.
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公开(公告)号：EP0095388A2
公开(公告)日：1983-11-30
申请号：EP83303026.5
申请日：1983-05-25
IPC分类号： G03F7/08
CPC分类号： G03F7/0233
摘要： A positive-type photoresist composition comprises polyhydroxy-a-methylstyrene or a hydroxy-a-methylstyrene copolymer having a molecular weight of from 1,000 to 100,000 and, as a photo-sensitizer, a quinonediazide compound. The copolymer may be used in combination with a novolak resin in an amount of at least 1 wt% of the resin. The weight ratio of photosensitizer to copolymer or copolymer and resin is 1:1 to 1:6.
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