SEMICONDUCTOR DEVICE
    1.
    发明公开
    SEMICONDUCTOR DEVICE 审中-公开
    半导体器件

    公开(公告)号:EP1538675A1

    公开(公告)日:2005-06-08

    申请号:EP02788677.9

    申请日:2002-11-28

    IPC分类号: H01L27/095 H01L29/812

    摘要: A protecting element, comprising a first n+-type region, an insulating region, and a second n+-type region, is connected in parallel between two terminals of an FET. Since discharge across the first and second n+ regions is enabled, electrostatic energy that reaches the operating region of the FET can be attenuated without increasing the parasitic capacitance.

    摘要翻译: 包括第一n +型区域,绝缘区域和第二n +型区域的保护元件并联连接在FET的两个端子之间。 由于跨越第一和第二n +区的放电被启用,到达FET工作区的静电能量可被衰减而不增加寄生电容。