公开(公告)号：EP0949078A1

公开(公告)日：1999-10-13

申请号：EP98945549.8

申请日：1998-09-30

申请人： SEIKO EPSON CORPORATION

发明人： NISHIKAWA, Takao ,  TAKAKUWA, Atsushi

IPC分类号： B41J2/16 ,  B41J2/045 ,  B41J2/055

CPC分类号： B41J2/1623 ,  B41J2/14233 ,  B41J2/161 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1642 ,  B41J2/1643 ,  B41J2/1645 ,  B41J2/1646 ,  B41J2002/14387 ,  Y10T29/42 ,  Y10T29/49345 ,  Y10T29/49401 ,  Y10T156/1052 ,  Y10T156/1064

摘要： This ink jet recording head manufacturing method comprises (A) a process for forming a peeling layer 11 wherein peeling is induced by light irradiation, on a base plate 10 exhibiting light-transmissivity, (B) a process for forming a common electrode film 3 on the peeling layer 11, (C) a process for forming a plurality of piezoelectric elements 4, (D) a process for forming a reservoir piece 5 comprising a lid structure that accommodates in its interior one or more piezoelectric elements 4, which interior forms an ink reservoir 51, (E) a process for irradiating the peeling layer 11 with prescribed light from the base plate 10 side thereof, thereby producing peeling in the peeling layer 11, and peeling the base plate 10 away, and (F) a process for bonding a pressure chamber plate 2, whereon are provided a plurality of pressure chambers 21, to the common electrode film 3 separated from the base plate, so that the pressure chambers 21 are sealed.
Heads compatible with high resolution can thus be manufactured because thin pressure chamber plates can be fabricated in a separate process from the piezoelectric element formation process and then, last of all, bonded in place.

摘要翻译： 该喷墨记录头的制造方法包括：（A）通过光照射而形成剥离的剥离层11的工序，具有透光性的基板10，（B）将公共电极膜3形成的工序 剥离层11，（C）用于形成多个压电元件的工艺4，（D）用于形成储存器件5的工艺，其包括盖结构，该盖结构在其内部容纳有一个或多个压电元件4，该压电元件4内部形成 墨水储存器51，（E）从基板10侧用规定的光照射剥离层11的工序，剥离层11剥离，剥离基板10，（F） 将压力室板2接合到与基板分离的公共电极膜3上的多个压力室21，使得压力室21被密封。 因此，可以制造与高分辨率兼容的头部，因为可以在与压电元件形成工艺分离的工艺中制造薄压力室板，然后最后粘合就位。

公开(公告)号：EP1115156A1

公开(公告)日：2001-07-11

申请号：EP00935527.2

申请日：2000-06-02

申请人： Seiko Epson Corporation

发明人： SHIMODA, Tatsuya ,  NISHIKAWA, Takao

IPC分类号： H01L27/10 ,  H01L27/108 ,  H01L21/8242

CPC分类号： H01L27/11502 ,  H01L21/0337 ,  H01L21/31691 ,  H01L27/11507 ,  H01L28/55 ,  H01L28/60

摘要： A method of manufacturing a ferroelectric memory device includes a step of forming a first region (24) having surface characteristics allowing the material for the members of a ferroelectric capacitor section to be preferentially deposited, and a second region (26) having surface characteristics allowing the material for the capacitor section to be less deposited than the first region (24), and a step of providing the material on the base (10) to form a first electrode (32), a ferroelectric film (34), and a second electrode (36) in the first region (24) of the base (10).

摘要翻译： 制造铁电存储器件的方法包括形成具有允许优先沉积强电介质电容器部件的部件的材料的表面特性的第一区域（24）的步骤，以及具有表面特性的第二区域（26），其允许 电容器部分的材料比第一区域（24）更少沉积;以及在基底（10）上提供材料以形成第一电极（32），铁电体膜（34）和第二电极 （10）的第一区域（24）中的（36）。

公开(公告)号：EP0949078B1

公开(公告)日：2005-11-30

申请号：EP98945549.8

申请日：1998-09-30

申请人： SEIKO EPSON CORPORATION

发明人： NISHIKAWA, Takao ,  TAKAKUWA, Atsushi

IPC分类号： B41J2/16 ,  B41J2/045 ,  B41J2/055

CPC分类号： B41J2/1623 ,  B41J2/14233 ,  B41J2/161 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1642 ,  B41J2/1643 ,  B41J2/1645 ,  B41J2/1646 ,  B41J2002/14387 ,  Y10T29/42 ,  Y10T29/49345 ,  Y10T29/49401 ,  Y10T156/1052 ,  Y10T156/1064

摘要： A method of producing an ink jet type recording head comprising the steps of (A) forming a peel layer (11) undergoing peeling upon irradiation of light on a light-transmitting substrate base (10), (B) forming a common electrode film (3) on the peel layer (11), (C) forming a plurality of piezoelectric devices (4) on the common electrode film (3), (D) forming a reservoir member (5) having a cover-like structure for accommodating therein at least one piezoelectric device (4) and having the inside thereof for forming an ink reservoir (51), (E) irradiating predetermined rays of light from the side of the substrate base (10) to the peel layer (11), causing the peel layer (11) to peel and peeling the substrate base (10), and (F) bonding a pressure chamber substrate (2) having a plurality of pressure chambers (21) formed therein to the common electrode film (3) after the peeling of the substrate base in such a manner as to seal each pressure chamber (21). Because this method can produce the thin pressure chamber substrate separatelyfrom the formation of the piezoelectric device and finally bonds them together, it can produce a head capable of coping with high resolution.

公开(公告)号：EP1115156B1

公开(公告)日：2009-08-26

申请号：EP00935527.2

申请日：2000-06-02

申请人： Seiko Epson Corporation

发明人： SHIMODA, Tatsuya ,  NISHIKAWA, Takao

IPC分类号： H01L27/10 ,  H01L27/108 ,  H01L21/8242 ,  H01L21/02 ,  H01L21/033 ,  H01L21/316 ,  H01L21/8246 ,  H01L27/115

CPC分类号： H01L27/11502 ,  H01L21/0337 ,  H01L21/31691 ,  H01L27/11507 ,  H01L28/55 ,  H01L28/60

摘要： A method including a step of forming a first region (24) on which the material of a member of a ferroelectric capacitor section is easily deposited and a second region (26) on which the material for forming the ferroelectric capacitor section is less easily deposited than the first region (24), in the surface of a substrate (10) on which a transistor is formed, and a step of supplying materials to the substrate (10), and forming a first electrode (32), a ferroelectric film (34), and a second electrode (36) in the first region (24).

公开(公告)号：EP1143772A1

公开(公告)日：2001-10-10

申请号：EP00961233.4

申请日：2000-09-26

申请人： SEIKO EPSON CORPORATION

发明人： SHIMODA, Tatsuya ,  NISHIKAWA, Takao

IPC分类号： H05B33/12 ,  H05B33/10 ,  H05B33/14 ,  G09F9/40 ,  G09F9/30

CPC分类号： H01L27/3293 ,  G09F9/313 ,  H01L27/3244

摘要： A circuit section 22C of a TFT layer 22 is disposed behind an adjacent EL display device 14, so that the gap between pixels at the peripheries of the adjacent EL display devices 14 may be 10 µm. Thus, four EL display devices 14 appear to be unified, forming the large EL display panel 10. In addition, in the case in which a plurality of EL display devices are arranged in a matrix pattern, the pitch between the pixels provided in the pixel section of the TFT array is maintained constant.

摘要翻译： TFT层22的电路部22C设置在相邻的EL显示装置14的后方，使得相邻的EL显示装置14的周边的像素间的间隔可以为10μm。 因此，四个EL显示装置14似乎是统一的，形成大的EL显示面板10.此外，在多个EL显示装置以矩阵图形排列的情况下，像素中提供的像素之间的间距 TFT阵列的截面保持恒定。