公开(公告)号：EP1891145A1

公开(公告)日：2008-02-27

申请号：EP06764418.7

申请日：2006-06-13

申请人： Silecs OY

发明人： RANTALA, Juha T. ,  PAULASAARI, Jyri ,  PIETIKÄINEN, Jarkko

IPC分类号： C08G77/60 ,  H01L21/312 ,  H01B3/46

CPC分类号： H01B3/46 ,  C08G77/08 ,  C08G77/50 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122 ,  H01L21/3127 ,  Y10T428/31663

摘要： A method for producing a polymer for semiconductor optoelectronics, comprising the steps of providing a monomer is produced having the formula (I), wherein: R1 is a hydrolysable group, R2 is hydrogen, and R3 is a bridging linear or branched bivalent hydrocarbyl group, said monomer being produced by hydrosilylation of the corresponding starting materials, and homo- or copolymerizing the monomer to produce a polymer.

摘要翻译： 一种薄膜，其包括通过聚合单体具有式I得到的组合物：worin：R t _{1 是可水解基团，R 2 为有机交联基团，反应性裂解 基或极化性还原性的有机基团，R 3 为桥连的直链或支链的二价烃基，以形成硅氧烷材料。 所述有机官能化的分子能够在基质中进一步反应，以进行交联，切割或两者的组合。 本发明提供了由于高交联密度桥连基团优良的耐化学性和非常低的化学吸附行为。}

公开(公告)号：EP1787319A1

公开(公告)日：2007-05-23

申请号：EP05777305.3

申请日：2005-08-31

申请人： Silecs OY

发明人： RANTALA, Juha, T. ,  PAULASAARI, Jyri ,  KYLMÄ, Janne ,  TÖRMÄNEN, Turo, T. ,  PIETIKÄINEN, Jarkko ,  HACKER, Nigel ,  HADZIC, Admir

IPC分类号： H01L21/312 ,  H01B3/46 ,  C08G77/60

CPC分类号： C09D183/14 ,  C08G77/50 ,  H01B3/46 ,  H01L21/02126 ,  H01L21/02282 ,  H01L21/3122 ,  H01L21/76822 ,  H01L21/76837 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10T428/31663 ,  H01L2924/00

摘要： A thin film comprising a composition obtained by polymerizing a monomer having the formula (I), wherein R1 is a hydrolysable group, R2 is a polarizability reducing organic group, and R3 is a bridging hydrocarbon group, to form a siloxane material. The invention also concerns methods for producing the thin films. The thin film can be used a low k dielectric in integrated circuit devices. The novel dielectric materials have excellent properties of planarization resulting in good local and global planarity on top a semiconductor substrate topography, which reduces or eliminates the need for chemical mechanical planarization after dielectric and oxide liner deposition.

公开(公告)号：EP1891146B1

公开(公告)日：2015-01-14

申请号：EP06764419.5

申请日：2006-06-13

申请人： Silecs OY

发明人： PAULASAARI, Jyri ,  PIETIKÄINEN, Jarkko ,  RANTALA, Juha T.

IPC分类号： C08G77/60 ,  H01L21/312 ,  H01B3/46

CPC分类号： H01B3/46 ,  C08G77/08 ,  C08G77/50 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122 ,  H01L21/3127 ,  Y10T428/31663

公开(公告)号：EP1891146A2

公开(公告)日：2008-02-27

申请号：EP06764419.5

申请日：2006-06-13

申请人： Silecs OY

发明人： PAULASAARI, Jyri ,  PIETIKÄINEN, Jarkko ,  RANTALA, Juha T.

IPC分类号： C08G77/60 ,  H01L21/312 ,  H01B3/46

CPC分类号： H01B3/46 ,  C08G77/08 ,  C08G77/50 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122 ,  H01L21/3127 ,  Y10T428/31663

摘要： A thin film comprising a composition obtained by polymerizing a monomer having the formula I: wherein: R1 is a hydrolysable group, R2 is an organic crosslinking group, a reactive cleaving group or a polarizability reducing organic group, and R3 is a bridging linear or branched bivalent hydrocarbyl group to form a siloxane material. The organo-functionalized molecule is capable of further reacting in the matrix so as to undergo cross-linking, cleaving or combination of both. The present invention provides excellent chemical resistance and very low chemical adsorption behavior due to high cross-linking bridging group density.