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    POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
    1.
    发明公开
    POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN 有权
    高分子化合物，抗蚀剂用于形成此类高分子化合物和方法组成光阻结构

    公开(公告)号：EP1717261A4

    公开(公告)日：2010-02-24

    申请号：EP05709454

    申请日：2005-01-28

    申请人： TOKYO OHKA KOGYO CO LTD

    发明人： OGATA TOSHIYUKI ,  MATSUMARU SYOGO ,  KINOSHITA YOHEI ,  HADA HIDEO ,  SHIONO DAIJU ,  SHIMIZU HIROAKI ,  KUBOTA NAOTAKA

    IPC分类号： C08G85/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0397 ,  C07C69/54 ,  C07C2603/74 ,  C08F220/28 ,  C08F290/06 ,  C08F290/061 ,  C09D133/14 ,  G03F7/0046 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition. The photoresist composition and the resist pattern formation method use the polymer compound including an alkali soluble group (i), wherein the alkali soluble group (i) is at least one substituent group selected from an alcoholic hydroxyl group, a carboxyl group, or a phenolic hydroxyl group, and the substituent group is protected by an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1): (wherein R 1 represents a cycloaliphatic group which contains no more than 20 carbon atoms and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom, and n represents 0 or an integer of 1 to 5.).

    摘要翻译： 本发明提供能够构成光致抗蚀剂组合物，所有这些都能够具有优异的分辨率，具有良好的矩形性形成精细图案的，获得良好的抗蚀剂特性，即使当从酸产生剂产生的酸的酸强度弱的聚合物化合物， 并且具有良好的敏感性; 光致抗蚀剂组合物包含所述聚合物化合物; 和使用光致抗蚀剂组合物的抗蚀图案形成方法。 光致抗蚀剂组合物和抗蚀图案形成方法使用聚合物化合物包括过碱可溶性基团（i）中，worin选自醇羟基，羧基，或酚中选出的至少一个取代基团的碱可溶性基团（i） 羟基，和取代基组是通过在酸解离性保护，溶解抑制基（ii）由通式（1）表示：（其中，R 1表示含有不多于20个碳原子并且可以含有氧的环脂族基团 原子，氮原子，硫原子，或卤原子，n为0或darstellt至1的整数〜5）。