POSITIVE PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION AND PROCESS FOR PRODUCING THE SAME
    4.
    发明公开
    POSITIVE PHOTOSENSITIVE RESIN PRECURSOR COMPOSITION AND PROCESS FOR PRODUCING THE SAME 有权
    PRE一种感光性树脂组合物和方法及其

    公开(公告)号:EP1037112A4

    公开(公告)日:2002-12-18

    申请号:EP99940701

    申请日:1999-09-07

    CPC classification number: G03F7/0233 C08G73/1025 C08L79/08

    Abstract: A positive photosensitive resin precursor composition characterized by comprising (a) a polymer consisting mainly of structural units bonded to each other in the manner shown by general formula (1) and (b) a photo-acid generator, being capable of forming a pattern through light irradiation and subsequent development, and having a total carboxyl group content of 0.02 to 2.0 mmol per g of the polymer. It provides a photosensitive resin composition which is capable of alkali development and is highly sensitive. (R represents a tri- to octavalent C2+ organic group; R represents a di- to hexavalent C2+ organic group; R represents hydrogen or a C1-20 organic group; n is an integer of 3 to 100,000; m is 1 or 2; and p and q each is an integer of 0 to 4, provided that p+q>0).

    Abstract translation: 本发明涉及一种正型感光性树脂前体组合物的所有其特征DASS它含有(a)聚合物,其中主要组分包括其中结构单元之间的键合是通过通式种结构单元(1)和 (b)中光产酸剂,和它可形成由包含在所述聚合物光照射和随后的显影,并且总羧基的图案是从0点02至2.0毫摩尔/ g,且它提供了高灵敏度后者可以是感光性树脂组合物 碱开发。 (R <1>是化合价的有机基团3至8个具有至少2个碳原子,R <2>是化合价的有机基团的2至6具有至少2个碳原子,R <3> 是氢或有机基团具有1至20个碳原子。N + q为> 0至3的整数值至100,000,m是1或2,p和q是从0的值至4的整数且p)

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