摘要:
Provided is a novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound according to the present invention is represented by the following formula (1). In the formula, R 1 and R 2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R 1 and R 2 may be bonded to form a ring structure and may contain a hetero atom bond. R 3 indicates a single bond or an organic group. R 4 to R 9 each independently indicate a hydrogen atom, an organic group, etc., but R 6 and R 7 are never hydroxyl groups. R 10 indicates a hydrogen atom or an organic group.
摘要:
Provided is a novel vinyl-group-containing fluorene compound and a method for producing the same, a polymerizable monomer and cross-linking agent comprising this compound, a leaving-group-containing fluorene compound, a monovinyl-group-containing fluorene compound, and methods for producing the same. This vinyl-group-containing fluorene compound is represented by formula (1) (In the formula, W 1 and W 2 represent a group represented by formula (2), a group represented by formula (4), a hydroxyl group, or a (meth)acryloyloxy group, R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon, and n1 and n2 are integers of 0-4. In formulas (2) and (4), a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or a group represented by -S-, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer of 0 or greater.).
摘要:
This invention provides: a new imidazole compound that yields a surface treatment liquid that is very effective at suppressing migration and the oxidation of a wiring surface; a metal surface treatment liquid that contains the imidazole compound; a metal surface treatment method that uses the metal surface treatment liquid; and a laminate production method that uses the surface treatment liquid. Metal is surface-treated using the surface treatment liquid which includes a saturated fatty acid or a saturated fatty acid ester of a specific structure, in which a prescribed position is substituted by an aromatic group of a prescribed structure and an imidazolyl group that may have a substituent group.
摘要:
Provided are a novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator comprising the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt is represented by formula (a1). In the formula, R 1 and R 2 each independently represent the group that is represented by formula (a2) or an alkyl group that may be substituted by a halogen atom, R 1 and R 2 are bonded to each other and may form a ring with the sulfur atom within the formula, R 3 is the group represented by formula (a3) or the group represented by formula (a4), A 1 represents S or the like, X - represents a monovalent anion, and R 1 and R 2 are not both an alkyl group which may be substituted with a halogen atom. In formulas (a2) to (a4), the ring Z 1 represents an aromatic hydrocarbon ring, R 4 , R 6 , R 9 , and R 10 each represents a specific monovalent group, R 5 , R 7 , and R 8 each represents a specific divalent group, A 2 and A 3 each represents S or the like, ml represents an integer of 0 or more, and n1 and n2 each represent 0 or more.
摘要:
Provided is a composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or -S-, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.
摘要翻译:提供含有新的含有乙烯基的化合物的组合物。 该组合物含有由通式(1)表示的含乙烯基的化合物。 式中W 1和W 2表示由通式(2)表示的基团(其中环(Z)为芳族烃环,X为单键或-S-,R 1为单键或 C 4亚烷基,R 2为特定取代基,例如一价烃,m为0以上的整数),通式(4)表示的基团(其中,环(Z),X, R 1,R 2和m如前所述),羟基或(甲基)丙烯酰氧基; 环(Y 1,Y 2)为芳烃环; R表示单键或特定二价基团; R 3a和R 3b表示氰基,卤素原子或一价烃基; n1和n2为0-4的整数。