DEVICE FOR THE CONTINUOUS SUPPLY OF A LIQUID COMPOUND AND RELATED METHOD

    公开(公告)号:EP3865220A1

    公开(公告)日:2021-08-18

    申请号:EP20156835.9

    申请日:2020-02-12

    摘要: A device for continuous supply of a liquid compound comprises a feed port (2) configured for connection to a discontinuous supply (3) of the liquid compound, a compound vessel (4) comprising a compound inlet (5) and a compound outlet (6), a first supply line (7) connecting the feed port (2) to the compound inlet (5), a closure member (8) configured to open and close the first supply line (7), an outlet port (11) for connection to the processing unit, and a second supply line (12) connecting the compound outlet (6) to the outlet port (11). The second supply line (12) comprises a flow controller (13) for measuring and controlling a flow of liquid compound through the second supply line. The flow controller allows to provide a very stable, continuous supply of liquid compound to the outlet port, and avoids the need to use moving parts, such as pumps, for the supply of the liquid compound.

    METHOD AND DEVICE FOR ATMOSPHERIC PRESSURE PLASMA TREATMENT
    5.
    发明公开
    METHOD AND DEVICE FOR ATMOSPHERIC PRESSURE PLASMA TREATMENT 有权
    方法和装置与大气压等离子体处理

    公开(公告)号:EP2590802A1

    公开(公告)日:2013-05-15

    申请号:EP11743201.3

    申请日:2011-06-29

    申请人: VITO NV

    IPC分类号: B29C59/14 H01J37/32 H05H1/24

    摘要: A continuous plasma treatment process, said process comprising the steps of: providing a plasma treatment apparatus, said apparatus comprising at least one plasma treatment zone, said plasma treatment zone comprising a pair of electrodes with endless dielectric belts each having a first and a second side and each covering an electrode of said pair of electrodes; producing a non-thermal plasma in a process gas at a pressure of 100 Pa to 1 MPa in the space between said pair of endless dielectric belt-covered electrodes by applying a voltage between said electrode pair; providing a web material to be treated such that it can be transported by said two endless dielectric belts in such a way that there is an area in the plane of said belt at least about 5 mm on either side of said web material on the side of said endless dielectric belts with no part thereof facing one electrode of said pair of electrodes; transporting said web material using said endless dielectric belts in frictional contact with said electrodes such that the side of said web material not in contact with said endless dielectric belts is treated in two passes through said at least one plasma treatment zone while at the same time the exposed parts of the endless dielectric belts transporting said web material are also treated; and cleaning said parts of said endless dielectric belts treated with said plasma using a cleaning station outside said plasma treatment zone prior to said endless dielectric belts re-entering said plasma treatment zone, wherein said electrodes have a length in the transport direction of said endless dielectric belts of at least 10 mm; and an apparatus comprising: at least one plasma treatment zone, said plasma treatment zone comprising a pair of electrodes with endless dielectric belts each having a first and a second side and each covering an electrode of said pair of electrodes; a voltage power supply for each plasma treatment zone connected to said pair of electrodes such that a non-thermal plasma can be produced upon applying a voltage to said electrode pairs in a process gas in the space between each pair of endless dielectric belt-covered electrodes; each of said electrodes in said plasma treatment zone having a discharge surface and said discharge surface being in contact with a first side of said endless dielectric belts thereby shielding said discharge surfaces and the respective sides of the endless dielectric belts in contact with said electrodes from products of said non-thermal plasma; a means of transporting a web material to be treated comprising said endless dielectric belts; a process gas supply; rollers for driving/guiding said endless dielectric belts; and a cleaning station capable of cleaning products of said plasma treatment on the second sides of said endless dielectric belts therefrom.