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1.发明公开
公开(公告)号：EP3388440A1
公开(公告)日：2018-10-17
申请号：EP18155895.8
申请日：2018-02-08
CPC分类号： C08G77/26 , C07F7/10 , C07F7/1888 , C08G77/06 , C08G2390/40 , C23C16/401 , C23C16/45527 , C23C16/45553
摘要： Amino-functionalized linear and cyclic oligosiloxanes, which have at least two silicon and two oxygen atoms as well as an organoamino group and methods for making the oligosiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-functionalized linear and cyclic oligosiloxanes are also disclosed.
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公开(公告)号：EP3339312A1
公开(公告)日：2018-06-27
申请号：EP18155154.0
申请日：2014-09-22
发明人： O'NEILL, Mark Leonard , XIAO, Manchao , LEI, Xinjian , HO, Richard , HARIPIN, Chandra , MACDONALD, Matthew R. , WANG, Meiliang
IPC分类号： C07F7/10 , C23C16/24 , H01L21/02 , C09D5/24 , C23C16/455
CPC分类号： H01L21/02219 , C07F7/10 , C09D5/24 , C23C16/24 , C23C16/45553 , H01L21/02126 , H01L21/0214 , H01L21/02164 , H01L21/02167 , H01L21/0217 , H01L21/02211 , H01L21/02271 , H01L21/02274 , H01L21/0228 , H01L21/02532 , H01L21/02592 , H01L21/02598 , H01L21/0262
摘要： Described herein are precursors and methods for forming silicon-containing films. In one aspect, the precursor comprises a compound represented by one of following Formulae A through E below:
In one particular embodiment, the organoaminosilane precursors are effective for a low temperature (e.g., 350°C or less), atomic layer deposition (ALD) or plasma enhanced atomic layer deposition (PEALD) of a silicon-containing film. In addition, described herein is a composition comprising an organoaminosilane described herein wherein the organoaminosilane is substantially free of at least one selected from the amines, halides (e.g., Cl, F, I, Br), higher molecular weight species, and trace metals.-
3.发明公开
公开(公告)号：EP3947769A1
公开(公告)日：2022-02-09
申请号：EP20795048.6
申请日：2020-04-17
发明人： LEI, Xinjian , LI, Ming , MACDONALD, Matthew R. , WANG, Meiliang
IPC分类号： C23C16/40 , C23C16/455 , C07F7/10
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公开(公告)号：EP3594219A1
公开(公告)日：2020-01-15
申请号：EP19194650.8
申请日：2014-09-22
发明人： O'Neill, Mark Leonard , XIAO, Manchao , LEI, Xinjian , HO, Richard , CHANDRA, Haripin , MACDONALD, Matthew R. , WANG, Meiliang
IPC分类号： C07F7/10 , C23C16/24 , C23C16/455 , H01L21/02
摘要： Described herein are precursors and methods for forming silicon-containing films. In one aspect, the precursor comprises a compound represented by one of following Formulae B and C below:
In one particular embodiment, the organoaminosilane precursors are effective for a low temperature (e.g., 350°C or less), atomic layer deposition (ALD) or plasma enhanced atomic layer deposition (PEALD) of a silicon-containing film. In addition, described herein is a composition comprising an organoaminosilane described herein wherein the organoaminosilane is substantially free of at least one selected from the amines, halides (e.g., Cl, F, I, Br), higher molecular weight species, and trace metals.-
公开(公告)号：EP3516089A1
公开(公告)日：2019-07-31
申请号：EP17851528.4
申请日：2017-09-14
发明人： MACDONALD, Matthew R. , LEI, Xinjian , WANG, Meiliang , HO, Richard , XIAO, Manchao , RAJARAMAN, Suresh Kalpatu
IPC分类号： C23C16/40 , C23C16/455 , C23C16/50
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6.发明公开
公开(公告)号：EP4223903A1
公开(公告)日：2023-08-09
申请号：EP23156751.2
申请日：2019-04-11
IPC分类号： C23C16/30 , C23C16/40 , C23C16/455 , C07F7/21 , C08G77/12 , C08K5/17 , C09D183/08 , C08G77/24 , C08G77/26 , C08G77/388
摘要： Organoamino-functionalized cyclic oligosiloxanes, which have at least two silicon and two oxygen atoms as well as an organoamino group and methods for making the organoamino-functionalized cyclic oligosiloxanes are disclosed. Methods for depositing silicon and oxygen containing films using the organoamino-functionalized cyclic oligosiloxanes are also disclosed.
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7.发明公开
公开(公告)号：EP4110968A1
公开(公告)日：2023-01-04
申请号：EP20928695.4
申请日：2020-09-25
IPC分类号： C23C16/40 , C23C16/455 , C07F7/21
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8.发明公开
公开(公告)号：EP3630785A1
公开(公告)日：2020-04-08
申请号：EP18806025.5
申请日：2018-05-23
IPC分类号： C07F7/21 , C23C16/40 , C23C16/34 , C23C16/455
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公开(公告)号：EP3395822B1
公开(公告)日：2020-03-25
申请号：EP18177680.8
申请日：2015-02-27
IPC分类号： C07F7/10 , C07C251/08 , C07C251/18
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公开(公告)号：EP3395822A1
公开(公告)日：2018-10-31
申请号：EP18177680.8
申请日：2015-02-27
IPC分类号： C07F7/10 , C07C251/08 , C07C251/18
摘要： Organoaminosilanes, such as without limitation di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods to make organoaminosilane compounds, or other compounds such as organoaminodisilanes and organoaminocarbosilanes, via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.
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