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    Polymer composition and resist material
    3.
    发明公开
    Polymer composition and resist material 失效
    Polymerzusammensetzung und Rezistmaterial

    公开(公告)号：EP0780732A2

    公开(公告)日：1997-06-25

    申请号：EP96309142.6

    申请日：1996-12-13

    申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD

    发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho ,  Fujie, Hirotoshi, c/o Tokyo Kenkyusho ,  Oono, Keiji, c/o Tokyo Kenkyusho

    IPC分类号： G03F7/039 ,  G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

    摘要： A polymer composition comprising (i) a polymer (a) having a monomer unit containing a functional group A which becomes alkali-soluble by heating in the presence of an acid, (ii) a polymer (b) having a monomer unit containing a functional group B which also becomes alkali-soluble, but less easily than the functional group A, by heating in the presence of an acid, and if necessary in addition to (i) and (ii) or in place of (ii), (iii) a phenolic compound having a weight-average molecular weight of 300 to 15,000 gives together with an photoacid generator a resist material suitable for forming a pattern excellent in sensitivity, resolution, mask linearity and other properties.

    摘要翻译： 一种聚合物组合物，其包含（i）具有单体单元的聚合物（a），其含有通过在酸存在下加热而变成碱溶性的官能团A.（ii）具有单体单元的聚合物（b）含有官能团 B组，也可以通过在酸的存在下加热而变得碱溶性但不如官能团A，如果需要，除了（i）和（ii）之外还可以代替（ii），（iii） ）重均分子量为300〜15,000的酚类化合物与光致酸产生剂一起形成适合于形成灵敏度，分辨率，掩模线性等优异的图案的抗蚀剂材料。