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公开(公告)号：EP0636941A1
公开(公告)日：1995-02-01
申请号：EP94305124.3
申请日：1994-07-13
发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho , Oono, Keiji, c/o Tokyo Kenkyusho , Matsuda, Hiroshi, c/o Tokyo Kenkyusho , Endo, Masayuki , Kobayashi, Satoshi
IPC分类号： G03F7/09 , C07C309/75
CPC分类号： C07C309/75 , G03F7/091
摘要： A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.
摘要翻译： 深紫外线吸收剂，其包含具有一个或在分子中多个缩水甘油基和至少一个蒽衍生物，以及一种能够溶解合成的化合物是有效的形成抗蚀剂图案的过程中从底物预防深紫外光的反射溶剂的至少一种化合物 ，从而形成超精细的图案，而不会引起切口和光晕。
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公开(公告)号：EP0636941B1
公开(公告)日：1996-03-20
申请号：EP94305124.3
申请日：1994-07-13
发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho , Oono, Keiji, c/o Tokyo Kenkyusho , Matsuda, Hiroshi, c/o Tokyo Kenkyusho , Endo, Masayuki , Kobayashi, Satoshi
IPC分类号： G03F7/09 , C07C309/75
CPC分类号： C07C309/75 , G03F7/091
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公开(公告)号：EP0552548A1
公开(公告)日：1993-07-28
申请号：EP92311383.1
申请日：1992-12-14
发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho , Oono, Keiji, c/o Tokyo Kenkyusho , Fujie, Hirotoshi, c/o Tokyo Kenkyusho
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0233 , G03F7/0758 , Y10S430/121 , Y10S430/124 , Y10S430/125
摘要： A photoresist composition comprising (a) a difficultly alkali-soluble resin obtained by reacting isopropenyl alkyl ether, 2-alkoxy-1-butene, isopropenyl trimethylsilyl ether or isopropenyl benzyl ether with a resin having phenolic hydroxyl groups, (b) a photosensitive compound which generates a carboxylic acid upon exposure to light, and (c) a solvent capable of dissolving the components (a) and (b), is effective for pattern formation using deep ultraviolet light, KrF excimer laser beams, etc.
摘要翻译： 一种光致抗蚀剂组合物，其包含（a）通过使异丙烯基烷基醚，2-烷氧基-1-丁烯，异丙烯基三甲基甲硅烷基醚或异丙烯基苄基醚与具有酚性羟基的树脂反应获得的难溶碱性树脂，（b）光敏化合物， 在暴露于光时产生羧酸，和（c）能够溶解组分（a）和（b）的溶剂，对于使用深紫外光，KrF准分子激光束等的图案形成是有效的。
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公开(公告)号：EP0552548B1
公开(公告)日：1997-03-19
申请号：EP92311383.1
申请日：1992-12-14
发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho , Oono, Keiji, c/o Tokyo Kenkyusho , Fujie, Hirotoshi, c/o Tokyo Kenkyusho
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0233 , G03F7/0758 , Y10S430/121 , Y10S430/124 , Y10S430/125
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公开(公告)号：EP0635480B1
公开(公告)日：1997-03-19
申请号：EP94305123.5
申请日：1994-07-13
发明人： Urano,Fumiyoshi, c/o Tokyo Kenkyusho , Oono, Keiji, c/o Tokyo Kenkyusho , Matsuda, Hiroshi, c/o Tokyo Kenkyusho
IPC分类号： C07C69/88 , C07C69/92 , C07C69/017
CPC分类号： C07C69/88 , C07C2603/24
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公开(公告)号：EP0635480A1
公开(公告)日：1995-01-25
申请号：EP94305123.5
申请日：1994-07-13
发明人： Urano,Fumiyoshi, c/o Tokyo Kenkyusho , Oono, Keiji, c/o Tokyo Kenkyusho , Matsuda, Hiroshi, c/o Tokyo Kenkyusho
IPC分类号： C07C69/88 , C07C69/92 , C07C69/017
CPC分类号： C07C69/88 , C07C2603/24
摘要： An anthracene derivative having at least two groups of the formula:
wherein R¹ and R² are independently hydrogen, alkyl, alkoxy, etc., is particular effective for forming an antireflection coating for preventing multiple reflection of exposing light from a highly reflective substrate, etc.摘要翻译： 具有至少两个下式的蒽衍生物：其中R 1和R 2独立地为氢，烷基，烷氧基等，其特征在于形成用于防止多次反射曝光的抗反射涂层 来自高反射性基板的光等
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公开(公告)号：EP0780732B1
公开(公告)日：2003-07-09
申请号：EP96309142.6
申请日：1996-12-13
发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho , Fujie, Hirotoshi, c/o Tokyo Kenkyusho , Oono, Keiji, c/o Tokyo Kenkyusho
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
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公开(公告)号：EP0780732A2
公开(公告)日：1997-06-25
申请号：EP96309142.6
申请日：1996-12-13
发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho , Fujie, Hirotoshi, c/o Tokyo Kenkyusho , Oono, Keiji, c/o Tokyo Kenkyusho
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A polymer composition comprising (i) a polymer (a) having a monomer unit containing a functional group A which becomes alkali-soluble by heating in the presence of an acid, (ii) a polymer (b) having a monomer unit containing a functional group B which also becomes alkali-soluble, but less easily than the functional group A, by heating in the presence of an acid, and if necessary in addition to (i) and (ii) or in place of (ii), (iii) a phenolic compound having a weight-average molecular weight of 300 to 15,000 gives together with an photoacid generator a resist material suitable for forming a pattern excellent in sensitivity, resolution, mask linearity and other properties.
摘要翻译： 一种聚合物组合物，其包含（i）具有单体单元的聚合物（a），其含有通过在酸存在下加热而变成碱溶性的官能团A.（ii）具有单体单元的聚合物（b）含有官能团 B组，也可以通过在酸的存在下加热而变得碱溶性但不如官能团A，如果需要，除了（i）和（ii）之外还可以代替（ii），（iii） ）重均分子量为300〜15,000的酚类化合物与光致酸产生剂一起形成适合于形成灵敏度，分辨率，掩模线性等优异的图案的抗蚀剂材料。
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