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13 条记录 (耗时 0.022 秒)

    Polymer composition and resist material
    5.
    发明公开
    Polymer composition and resist material 失效
    Polymerzusammensetzung und Rezistmaterial

    公开(公告)号：EP0780732A2

    公开(公告)日：1997-06-25

    申请号：EP96309142.6

    申请日：1996-12-13

    申请人： WAKO PURE CHEMICAL INDUSTRIES, LTD

    发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho ,  Fujie, Hirotoshi, c/o Tokyo Kenkyusho ,  Oono, Keiji, c/o Tokyo Kenkyusho

    IPC分类号： G03F7/039 ,  G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

    摘要： A polymer composition comprising (i) a polymer (a) having a monomer unit containing a functional group A which becomes alkali-soluble by heating in the presence of an acid, (ii) a polymer (b) having a monomer unit containing a functional group B which also becomes alkali-soluble, but less easily than the functional group A, by heating in the presence of an acid, and if necessary in addition to (i) and (ii) or in place of (ii), (iii) a phenolic compound having a weight-average molecular weight of 300 to 15,000 gives together with an photoacid generator a resist material suitable for forming a pattern excellent in sensitivity, resolution, mask linearity and other properties.

    摘要翻译： 一种聚合物组合物，其包含（i）具有单体单元的聚合物（a），其含有通过在酸存在下加热而变成碱溶性的官能团A.（ii）具有单体单元的聚合物（b）含有官能团 B组，也可以通过在酸的存在下加热而变得碱溶性但不如官能团A，如果需要，除了（i）和（ii）之外还可以代替（ii），（iii） ）重均分子量为300〜15,000的酚类化合物与光致酸产生剂一起形成适合于形成灵敏度，分辨率，掩模线性等优异的图案的抗蚀剂材料。

    Resist composition for deep ultraviolet light
    10.
    发明公开
    Resist composition for deep ultraviolet light 失效
    Resistzusammensetzungfürtiefe Ultraviolettbelichtung。

    公开(公告)号：EP0675410A1

    公开(公告)日：1995-10-04

    申请号：EP95301946.0

    申请日：1995-03-23

    申请人： WAKO PURE CHEMICAL INDUSTRIES LTD ,  MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.

    发明人： Urano, Fumiyoshi, c/o Tokyo Kenkyusho ,  Yasuda, Takanori, c/o Tokyo Kenkyusho ,  Katsuyama, Akiko ,  Yamashita, Kazuhiro

    IPC分类号： G03F7/004 ,  G03F7/09

    CPC分类号： G03F7/091 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/127 ,  Y10S430/128

    摘要： A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light.

    摘要翻译： 一种深紫外光的抗蚀剂组合物，其特征在于，含有（a）以下树脂成分（i）〜（iii）中的任一种：（i）通过酸的除去保护基而成为碱溶性的树脂，（ⅱ） 碱溶性树脂和溶解抑制性化合物的组合，（iii）碱溶性树脂和交联性化合物的组合，（b）酸产生剂，（c）特殊的蒽衍生物，（d） 溶剂适用于使用深紫外光，KrF准分子激光等在由于吸收不期望的反射深紫外光而具有水平差的高反射性基板上形成图案。