ORGANOMETALLIC COMPOUNDS USEFUL FOR CHEMICAL PHASE DEPOSITION
    6.
    发明公开
    ORGANOMETALLIC COMPOUNDS USEFUL FOR CHEMICAL PHASE DEPOSITION 审中-公开
    有机化合物可用于化学相沉积

    公开(公告)号:EP3288954A1

    公开(公告)日:2018-03-07

    申请号:EP16785706.9

    申请日:2016-04-25

    摘要: Organometallic compounds, useful in chemical phase deposition processes, having a structure: [{R1R2R3(A))x-M(CO)y]z, wherein R1, R2 and R3 are selected from H, a lower alkyl group and a phenyl group substituted with at least one selected lower alkyl group, where at least one of R1, R2 and R3 must be other than H; M is selected from cobalt, iron, manganese, and chromium group metals; A is selected from Si, Ge, and Sn; wherein: x=1, y=4, and z=1 when M is selected from a cobalt group metal, x=1, y=5, and z=1 when M is selected from a manganese group metal, x=2, y=4, and z=1 when M is selected from a chromium group metal, and x=2, y=4, and z=1 or, alternatively, x=1, y=4, and z=2 when M is selected from an iron group metal.