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    STAGE LEVELING DEVICE FOR HIGH PERFORMANCE MASK ALIGNER
    2.
    发明公开
    STAGE LEVELING DEVICE FOR HIGH PERFORMANCE MASK ALIGNER 审中-公开
    用于高性能面罩对齐器的台阶调整装置

    公开(公告)号：EP3285120A1

    公开(公告)日：2018-02-21

    申请号：EP16201944.2

    申请日：2016-12-02

    申请人： Midas System Co., Ltd.

    发明人： LEE, Gon Chul ,  MIN, Heung Ki ,  LEE, Jun Hyeong ,  JEON, Jae Geun

    IPC分类号： G03F7/20 ,  G03F9/00

    CPC分类号： H01L21/682 ,  G03F1/42 ,  G03F7/70691 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70833 ,  G03F9/7034

    摘要： Disclosed is a stage leveling device for a high-performance mask aligner, having enhanced leveling maintenance and, in particular, a novel technology of preventing leveling misalignment by firmly fixing a leveling-completed wafer stage.
    A conventional leveling device fixes a leveling-completed wafer stage by partially pressing side surfaces of a leveling rod and thus the leveling is misaligned due to deviations (errors) occurring while the leveling rod is moved upward and downward and leftward and rightward, and slip occurs due to a weak fixing strength of the leveling rod and thus the weight of the wafer (sample) that can be leveled to the maximum extent is decreased.
    To address the problems described above, according to the present invention, when a locking ring (80) inserted at an outer side of a leveling rod (40;41) maintains an inclined state, locking is performed such that an inner circumferential surface of the locking ring fixes opposite sides of the leveling rod by applying pressure thereto and, when the locking ring maintains a horizontal state, unlocking is performed such that the inner circumferential surface of the locking ring is spaced apart from the leveling rod.

    摘要翻译： 本发明公开了一种用于高性能掩模对准器的平台调平装置，其具有增强的调平维持，并且特别是通过牢固地固定调平完成的晶片台来防止调平失准的新技术。 传统的校平装置通过部分地按压调平杆的侧表面来固定校平完成的晶片台，因此由于在调平杆上下左右移动时发生的偏差（误差）而导致校平不对齐，并且发生滑动 由于调平杆的固定强度弱，因此能够最大限度地调平的晶片（试样）的重量减少。 为了解决上述问题，根据本发明，当插入调平杆（40; 41）外侧的锁定环（80）保持倾斜状态时，执行锁定，使得锁定环（80）的内圆周表面 锁定环通过向其施加压力而固定调平杆的相对侧，并且当锁定环保持水平状态时，执行解锁以使得锁定环的内圆周表面与调平杆间隔开。

    Method and apparatus for forming pattern
    4.
    发明公开
    Method and apparatus for forming pattern 审中-公开
    Verfahren und Vorrichtung zur Herstellung von Strukturen

    公开(公告)号：EP2669738A1

    公开(公告)日：2013-12-04

    申请号：EP13159508.4

    申请日：2013-03-15

    申请人： Hitachi High-Technologies Corporation

    发明人： Ushifusa, Nobuyuki ,  Uemura, Naohito ,  Suzuki, Shigeru

    IPC分类号： G03F7/12 ,  B41F15/40 ,  B41F15/42

    CPC分类号： G03F7/70691 ,  B05C3/20 ,  B05D1/32 ,  B41F15/40 ,  B41F15/42 ,  B41M1/12 ,  G03F7/12 ,  H01L31/022425 ,  H01L31/022458 ,  H01L31/18 ,  Y02E10/50

    摘要： There is provided a pattern forming apparatus which transfers a paste to a predetermined position of a pattern forming object fixed to a table through a pattern forming mask having opening portions at predetermined positions using a discharge mechanism part. To realize a pattern forming which allows the stable forming of a fine pattern with high accuracy and allows the paste to be surely filled into fine through holes, a corner portion of a distal end of the discharge mechanism part in contact with the pattern forming mask is formed into a concave shape, and a surface of the distal end portion of the discharge mechanism part including the concave shaped portion is covered with a film having liquid repellency so that the rolling of the paste is accelerated in a region formed by the concave shaped portion to form a fine pattern with high accuracy.

    摘要翻译： 提供了一种图案形成装置，其通过使用排出机构部分的具有开口部分的开口部分的图案形成掩模将糊剂转移到固定到工作台的图案形成对象的预定位置。 为了实现能够以高精度稳定地形成精细图案的图案形成，并且允许膏被可靠地填充到细小的通孔中，排出机构部分的与图案形成掩模接触的远端的角部是 形成为凹形，并且包括凹形部分的排出机构部分的远端部分的表面被具有拒水性的膜覆盖，使得在由凹形部分形成的区域中膏的滚动被加速 以高精度形成精细图案。

    EXPOSURE EQUIPMENT AND DEVICE MANUFACTURING METHOD
    5.
    发明授权
    EXPOSURE EQUIPMENT AND DEVICE MANUFACTURING METHOD 有权
    曝光装置及元件制造工艺

    公开(公告)号：EP1780772B1

    公开(公告)日：2009-09-02

    申请号：EP05758280.1

    申请日：2005-07-11

    申请人： NIKON CORPORATION

    发明人： SHIBUTA, Makoto, NIKON CORPORATION IP Dept.

    IPC分类号： H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/70691 ,  G03F7/70916

    摘要： An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (41) having an upper surface (41 A) that guides the movement of the table (PT), and a detecting device (60) that detects whether there is a liquid on the upper surface (41A) of the base member (41).

    POSITION MEASUREMENT METHOD, POSITION CONTROL METHOD, MEASUREMENT METHOD, LOADING METHOD, EXPOSURE METHOD, EXOPOSURE APPARATUS, AND DEVICE PRODUCTION METHOD
    6.
    发明公开
    POSITION MEASUREMENT METHOD, POSITION CONTROL METHOD, MEASUREMENT METHOD, LOADING METHOD, EXPOSURE METHOD, EXOPOSURE APPARATUS, AND DEVICE PRODUCTION METHOD 审中-公开
    POSITIONSMESSVERFAHREN，POSITIONSSTEUERVERFAHREN，MESSVERFAHREN，LADEVERFAHREN，BELICHTUNGSVERFAHREN，BELICHTUNGSVORRICHTUNG UND BAUELEMENTE-HERSTELLUNGSVERFAHREN

    公开(公告)号：EP1821336A1

    公开(公告)日：2007-08-22

    申请号：EP05807063.2

    申请日：2005-11-18

    申请人： NIKON CORPORATION

    发明人： YASUDA, Masahiko c/o NIKON CORPORATION, 2-3, ,  SUGIHARA, Taro c/o NIKON CORPORATION,

    IPC分类号： H01L21/027 ,  G01B11/00 ,  G03F7/20 ,  H01L21/68

    CPC分类号： G03F7/70341 ,  G03F7/70691 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70975 ,  G03F9/7011 ,  G03F9/7088 ,  Y10T29/49002

    摘要： A part of a plate (50) of a predetermined shape detachably mounted on a moving body (WST) is detected by an alignment system (ALG) while the position of the moving body is measured by a measurement unit (18 or the like) that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate (50) is obtained. Therefore, even if there are no alignment marks (fiducial marks) on the moving body (WST) for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

    摘要翻译： 通过对准系统（ALG）检测可拆卸地安装在移动体（WST）上的预定形状的板（50）的一部分，同时通过测量单元（18等）测量移动体的位置， 设定运动体的运动坐标系，并且根据与检测结果对应的检测结果和测量单元的测量结果，获得板（50）的外周边缘的位置信息。 因此，即使在移动体（WST）上没有对准标记（基准标记））进行位置测量，也可以将移动体的位置或移动体的位置控制在移动坐标系上 通过测量单元，基于板的外周边缘的位置信息。

    COMPOSITE KINEMATIC COUPLING
    8.
    发明公开
    COMPOSITE KINEMATIC COUPLING 审中-公开
    KINEMATISCHE VERBUNDKUPPLUNG

    公开(公告)号：EP1444081A4

    公开(公告)日：2006-07-05

    申请号：EP02759243

    申请日：2002-08-05

    申请人： ENTEGRIS INC

    发明人： BHATT SANJIV M ,  EGGUM SHAWN D

    IPC分类号： B29C45/14 ,  B29C45/16 ,  B29K69/00 ,  B29K71/00 ,  G03F7/20 ,  H01L21/673 ,  H01L21/677 ,  H01L21/68

    CPC分类号： B29C45/14 ,  B29C45/14311 ,  B29C45/16 ,  B29C45/1657 ,  B29K2995/0087 ,  B29L2031/16 ,  G03F7/70691 ,  G03F7/708 ,  H01L21/67379 ,  H01L21/67775 ,  H01L21/68

    摘要： The kinematic coupling of the present invention may comprise a wafer carrier base plate (100) comprising a first material, and a mounting plate (102) and multiple contact components (104). The mounting plate (102) has multiple recesses (118) corresponding to the number of contacts (104), each recess (118) provided with a protrusion (116) for engaging the bore of a respective contact component (104). The contact component (104) comprises a second material having a lower coefficient of friction than the first material. The contact component (104) may comprise an interior surface (108) with a contact surface (106) that converges as the interior surface (108) deepens. The contact component (104) may be provided to the base plate (100) as part of an over-molding, snap-in-place, staking, ultrasonic weld, or adhesive operation and held in place by mechanical interlocking.

    摘要翻译： 作为自动化制造过程的一部分的用于对准晶片载体的配件可以被称为运动耦合。 本发明的运动耦合可以包括第一材料的基板和第二材料的接触部件。 接触部件可以作为包覆成型操作的一部分提供到基板，并且可以通过化学紧固或机械紧固来保持就位。

    Cooling technique
    9.
    发明公开
    Cooling technique 有权
    Kühltechnik

    公开(公告)号：EP1521121A3

    公开(公告)日：2006-05-17

    申请号：EP04256106.8

    申请日：2004-10-01

    申请人： CANON KABUSHIKI KAISHA

    发明人： Emoto, Keiji, c/o Canon Kabushiki Kaisha

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70691 ,  G03F7/70875

    摘要： Disclosed is a positioning apparatus, including a positioning unit, and a temperature adjusting unit which adjusts a temperature of at least a portion of the positioning unit, the temperature adjusting unit including a cooling mechanism based on vaporization heat of a liquid. Also disclosed is a cooling apparatus, including a container, a supplying unit which supplies a liquid to the container, and an exhaust unit which exhausts the container.

    摘要翻译： 公开了一种定位装置，包括定位单元和温度调节单元，其调节定位单元的至少一部分的温度，温度调节单元包括基于液体的蒸发热的冷却机构。 还公开了一种冷却装置，包括容器，向容器供给液体的供给单元和排出容器的排气单元。