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    Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method
    5.
    发明公开
    Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method 有权
    透镜与这样的透镜和制造方法的带电粒子多子束带电粒子束曝光设备

    公开(公告)号：EP2434522A1

    公开(公告)日：2012-03-28

    申请号：EP11195133.1

    申请日：2003-07-08

    申请人： Canon Kabushiki Kaisha ,  Hitachi Ltd.

    发明人： Ono, Haruhito ,  Nagae, Kenichi ,  Takakuwa, Masaki ,  Nakayama, Yoshinori ,  Muto, Harunobu

    IPC分类号： H01J37/317 ,  H01J37/12 ,  B82Y10/00

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

    摘要： There is provided a multi-charged beam lens constituted by stacking, via fiber chips (212) serving as insulator members along the optical path of a charged beam, a plurality of electrodes (201a-201c) having a charged beam passing region (202) where a plurality of charged beam apertures are formed. The electrodes have shield apertures (203) between the charged beam passing region and the fiber chips. A conductive shield (204) extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region (202) and the fiber chips (212) serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.

    摘要翻译： 提供了一种通过层叠构成的多带电束透镜，通过作为绝缘体构件沿着带电束的光路光纤芯片（212），电极（201A-201C），其具有带电束通过区域的多个（202） 其中带电束孔径的形成有多个。 电极具有防护孔（203）的带电束通过区域和纤维芯片之间。 导电屏蔽（204）通过屏蔽延伸没有孔接触电极上，并切断连接所述带电束通过区域（202）和作为绝缘体构件的纤维片（212）的直的路径。 这防止了绝缘构件的上充电的电子束在多带电束透镜的影响。

    Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
    7.
    发明公开
    Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus 有权
    Deflektor，Verfahren zur Herstellung des Deflektors und Belichtungsvorrichtung mit geladenem Teilchenstrahl

    公开(公告)号：EP2555219A1

    公开(公告)日：2013-02-06

    申请号：EP12190098.9

    申请日：2003-10-01

    申请人： Canon Kabushiki Kaisha ,  Hitachi, Ltd.

    发明人： Iwasaki, Yuichi ,  Muraki, Masato ,  Tamomori, Kenji ,  Asano, Kouji ,  Esashi, Masayoshi ,  Nakayama, Yoshinori ,  Hashimoto, Shinichi ,  Moro, Yoshiaki

    IPC分类号： H01J37/147 ,  H01J9/02 ,  H01J37/30 ,  H01J37/04 ,  H01J37/317

    CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1477 ,  H01J37/3174 ,  H01J2237/0437 ,  H01J2237/31774

    摘要： A deflector which deflects a charged particle beam includes a substrate (1202) in which an opening (200), through which the charged particle beam should pass, is formed, a first deflection electrode (1204a) and second deflection electrode (1204b) which oppose each other in the opening to deflect the charged particle beam, and a first insulating layer (1208a) and second insulating layer (1208b) which are formed between said substrate and said first deflection electrode and between said substrate and said second deflection electrode, respectively. In a direction substantially perpendicular to a direction from the first deflection electrode to the second deflection electrode and an irradiation direction of the charged particle beam, a length of each of the first and second insulating layers is smaller than a length of each of the first and second deflection electrodes so as to shield the first and second insulating layers from the charged particle beam by the first and second deflection electrodes, respectively.

    摘要翻译： 使带电粒子束偏转的偏转器包括形成有带电粒子束通过的开口（200）的基板（1202），形成与第一偏转电极（1204a）和第二偏转电极（1204b）相对的第一偏转电极 在所述开口中彼此偏转所述带电粒子束;以及第一绝缘层（1208a）和第二绝缘层（1208b），其分别形成在所述基板和所述第一偏转电极之间以及所述基板和所述第二偏转电极之间。 在大致垂直于从第一偏转电极到第二偏转电极的方向以及带电粒子束的照射方向的方向上，第一和第二绝缘层的长度小于第一和第二偏转电极的长度， 第二偏转电极，以分别由第一和第二偏转电极屏蔽带电粒子束的第一和第二绝缘层。

    Charged-particle beam lens
    8.
    发明公开
    Charged-particle beam lens 有权
    LinsefüreinenLadungsträgerstrahl

    公开(公告)号：EP1383158A2

    公开(公告)日：2004-01-21

    申请号：EP03254334.0

    申请日：2003-07-08

    申请人： CANON KABUSHIKI KAISHA ,  Hitachi, Ltd.

    发明人： Ono, Haruhito, c/o Canon Kabushiki Kaisha ,  Nagae, Kenichi, Canon Kabushiki Kaisha ,  Takakuwa, Masaki ,  Nakayama, Yoshinori ,  Muto, Harunobu

    IPC分类号： H01J37/317

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

    摘要： There is provided a multi-charged beam lens constituted by stacking, via fiber chips (212) serving as insulator members along the optical path of a charged beam, a plurality of electrodes (201a-201c) having a charged beam passing region (202) where a plurality of charged beam apertures are formed. The electrodes have shield apertures (203) between the charged beam passing region and the fiber chips. A conductive shield (204) extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region (202) and the fiber chips (212) serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.

    摘要翻译： 提供了一种多带电波束透镜，其通过沿着带电光束的光路用作绝缘体构件的光纤芯片（212）堆叠，具有带电光束通过区域（202）的多个电极（201a-201c） 其中形成多个带电束孔。 电极在带电光束通过区域和光纤芯片之间具有屏蔽孔（203）。 导电屏蔽（204）在不接触电极的情况下延伸穿过屏蔽孔，并且切断连接充电光束通过区域（202）和用作绝缘体构件的光纤芯片（212）的直线路径。 这防止了多电荷束透镜中绝缘体构件对电子束的充电的影响。