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    GLASS AND METHOD FOR PRODUCING THE SAME, AND MEMBER AND APPARATUS USING THE SAME
    5.
    发明公开
    GLASS AND METHOD FOR PRODUCING THE SAME, AND MEMBER AND APPARATUS USING THE SAME 审中-公开

    公开(公告)号：EP4082976A1

    公开(公告)日：2022-11-02

    申请号：EP22168468.1

    申请日：2022-04-14

    申请人： Tosoh Corporation

    发明人： ITO, Masahiro ,  ARAI, Kazuyoshi

    IPC分类号： C03C3/062 ,  H01L21/00 ,  C03B20/00 ,  C03C3/06 ,  C03B11/00

    摘要： A glass comprising at least one oxide of Si and a di- or higher-valent metal element, the glass containing no bubbles with diameters of more than 0.1 mm, wherein an occupied area fraction of bubbles with diameters of 0.1 mm or less is 0.05% or less. A semiconductor production apparatus and a liquid crystal production apparatus comprising a glass member comprising this glass. A method for producing a glass, comprising the steps of (1) placing raw material powders for at least one oxide of Si and a di- or higher-valent metal element in a container, mixing the raw material powders together and then melting the mixture by heating under reduced pressure to obtain a melt; (2-1) pressurizing the melt in a He gas atmosphere, or (2-2) heating the melt in an inert gas atmosphere other than a He gas atmosphere and then pressurizing the melt in the inert gas atmosphere; and (3) cooling the melt.

    HEAT-REFLECTING MEMBER, AND METHOD FOR MANUFACTURING GLASS MEMBER HAVING HEAT-REFLECTING LAYER INCLUDED THEREIN
    6.
    发明公开
    HEAT-REFLECTING MEMBER, AND METHOD FOR MANUFACTURING GLASS MEMBER HAVING HEAT-REFLECTING LAYER INCLUDED THEREIN 审中-公开

    公开(公告)号：EP4039659A1

    公开(公告)日：2022-08-10

    申请号：EP20871500.3

    申请日：2020-09-18

    申请人： Shin-Etsu Quartz Products Co., Ltd. ,  Yamagata Shin-Etsu Quartz Co., Ltd. ,  Heraeus Quarzglas GmbH & Co. KG

    发明人： YAMAGUCHI Kazuhiro ,  FUJITA Daiki ,  HARADA Yoshihiro ,  SEGAWA Toru ,  WATANABE Tomonori

    IPC分类号： C03B20/00 ,  C03B33/08

    摘要： Provided are a heat reflective member, which is prevented from being broken even in a high-temperature environment at the time of its manufacturing and its use while maintaining a high reflectance, generates no dust at the time of its use, and can be washed with a chemical liquid, and a method of manufacturing a glass member with a heat reflective layer suitable as the heat reflective member. The heat reflective member is a heat reflective member having a laminated structure in which quartz glass layers are formed on an upper surface and a lower surface of a siliceous sintered powder layer, wherein the heat reflective member includes: an impermeable layer which is formed at a portion of the siliceous sintered powder layer at an end portion of the heat reflective member, which has a thickness at least larger than half of a thickness of the siliceous sintered powder layer, and through which a gas or a liquid is prevented from penetrating; and a buffer layer which is formed between the impermeable layer and the siliceous sintered powder layer, and which changes in density from the impermeable layer toward the sintered powder layer.

    METHOD FOR PRODUCING MULTILAYERED SILICA GLASS BODY
    8.
    发明公开
    METHOD FOR PRODUCING MULTILAYERED SILICA GLASS BODY 审中-公开

    公开(公告)号：EP3868723A1

    公开(公告)日：2021-08-25

    申请号：EP19874386.6

    申请日：2019-09-03

    申请人： Shin-Etsu Quartz Products Co., Ltd. ,  Heraeus Quarzglas GmbH & Co. KG

    发明人： MORI Tatsuya ,  SUGAMA Akihiko

    IPC分类号： C03B20/00 ,  B05D3/02 ,  B05D7/00 ,  B05D7/24 ,  C03C15/00

    摘要： The present invention is a method for producing a multilayered silica glass body, the method involving producing a multilayered silica glass body in which a transparent silica glass layer is provided on the surface of a siliceous substrate made of a siliceous material, wherein the method for producing a multilayered silica glass body includes a step for preparing the siliceous substrate, a step for preparing a silica slurry in which silica particles are dispersed in a liquid, a step for applying the silica slurry to the surface of the siliceous substrate, a step for leveling the silica slurry applied to the surface of the siliceous substrate by applying vibration to the siliceous substrate, a step for drying the leveled silica slurry, and a step for vitrifying the dried silica slurry by heating to form a transparent silica glass layer. As a result, a transparent silica glass layer of uniform thickness is obtained at excellent yield, and a method for producing a multilayered silica glass body easily in a short time is provided.