摘要:
Provided is a composition containing a polyphenol compound (B) and a solvent, in which the polyphenol compound (B) is at least one selected from a compound represented by the following formula (1) and a resin having a structure represented by the following formula (2) :
wherein R Y , R T , X, m, N, r, and L are as described in the description.
摘要:
The invention provides a method for purifying dihydroxynaphthalene, which is capable of suppressing soft particle generation and obtaining dihydroxynaphthalene serving as a raw material of a resin and composition excellent in filterability. The method for purifying dihydroxynaphthalene includes the step of removing a sulfur content in the dihydroxynaphthalene with an adsorbent, and neutral alumina is used as the adsorbent.
摘要:
An object of the invention is to provide a heat-resistant hexavalent chromium removal agent, which is capable of remaining in a leather or leather article for a long period of time and stably detoxifying hexavalent chromium over the long term even when a leather or leather article contains hexavalent chromium, and a leather or leather article, in which the hexavalent chromium content is less than 3 ppm. The leather or leather article of the present invention contains at least: an organic compound (A) having a structure shown in chemical formula (1) and hydroxyphenyl but not aldehyde and carboxyl, which organic compound has a property to reduce hexavalent chromium to trivalent chromium; and trivalent chromium, and the hexavalent chromium content determined in accordance with ISO 17075: 2008-02 is less than 3 ppm.
摘要:
The present invention provides a resist composition containing a compound represented by the general formula (1-3) or (30), a method for forming a resist pattern using the composition, and compounds therein:
wherein R 1 are a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms; R 3 are each independently a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or an alkenyl group having 2 to 10 carbon atoms and may be the same or different on the same naphthalene ring; m 4 are each independently an integer of 0 to 6;
wherein X' are a hydrogen atom or a monovalent substituent having 1 to 18 carbon atoms; R 0 are each independently an alkyl group having 1 to 4 carbon atoms or a halogen atom and may be the same or different on the same naphthalene ring; and p is an integer of 0 to 5.
摘要:
The present invention provides an alcoholic compound represented by the general formula (6) or (7), and a method for producing an alcoholic compound represented by the general formula (6) or (7):
wherein X' is a hydrogen atom or a monovalent substituent having 1 to 18 carbon atoms; R 0 are each independently an alkyl group having 1 to 4 carbon atoms or a halogen atom and may be the same or different on the same naphthalene ring; R' are each independently an alkylene group having 1 to 4 carbon atoms; q are each independently an integer of 1 or larger; and p are each independently an integer of 0 to 5.
摘要:
The present invention provides a resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom.
wherein R 1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms; R 2 are each independently a hydrogen atom, a halogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group and may be the same or different on the same naphthalene ring; at least one of R 2 is a hydroxyl group; n is an integer of 1 to 4; the structural formulas of the repeating units in the formulas (1) and (2) may be the same or different; in the general formula (1), m 1 are each independently an integer of 1 to 7; and in the general formula (2), X are each independently an oxygen atom or a sulfur atom, and m 2 are each independently an integer of 1 to 6.