摘要:
The present invention discloses a dispersant for a hydraulic composition, containing an alkyldiethanolamine having an alkyl group having 1 to 3 carbon atoms and a naphthalenesulfonic acid-formaldehyde condensate, wherein a weight ratio of the alkyldiethanolamine having an alkyl group having 1 to 3 carbon atoms to the naphthalenesulfonic acid-formaldehyde condensate (alkyldiethanolamine/ naphthalenesulfonic acid-formaldehyde condensate) is 0.01 to 2.0; an aqueous solution containing the same, moreover a hydraulic composition, containing an alkyldiethanolamine having an alkyl group having 1 to 3 carbon atoms, a naphthalenesulfonic acid-formaldehyde condensate, a hydraulic powder, an aggregate and water, wherein the hydraulic powder contains SO 3 in an amount of 0.5 to 6.0% by weight, and a weight ratio of the alkyldiethanolamine having an alkyl group having 1 to 3 carbon atoms to the naphthalenesulfonic acid-formaldehyde condensate (alkyldiethanolamine/ naphthalenesulfonic acid-formaldehyde condensate) is 0.01 to 2.0.
摘要:
There is provided an aromatic hydrocarbon formaldehyde resin obtained by reacting an aromatic hydrocarbon compound (A) represented by the following formula (1) with formaldehyde (B) in the presence of an acidic catalyst.
wherein R represents an organic group having 1 to 10 carbon atoms; m and n represent integers satisfying 1 ≤ m + n ≤ 10, m ≥ 0 and n ≥ 1.
摘要:
Mousse rigide à base de tannins comprenant de 10 à 100% de cellules ouvertes et totalement exempte de formaldéhyde, ladite mousse comprenant au moins un tannin de type prorobinetidine ou profisetinidine, de l'alcool furfurylique comme agent copolymérisant, du glutaraldéhyde comme monomère, au moins un agent gonflant et au moins un catalyseur acide, son procédé de préparation et son utilisation.
摘要:
There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
摘要:
A pitch having optical anisotropy for use in production of carbon fibers, wherein the patch is prepared using a compound represented by the formula . (I) as a raw starting material and subjecting the compound to thermal modification and then removing light fractions wherein R,, R 2 , R 3 , R 4 , R6, R 7 , R 8 , Rg and R, o each represents a hydrogen atom or a methyl group or an ethyl group; R 5 represents a hydrogen atom or a methyl group; the total number of carbon atoms of R,, R 2 , R 3 and R 4 is from 2 to 4 and the total number of carbon atoms of R 6 , R 7 , R 8 and R 9 is from 2 to 4; and m is at least 3. The pitch is substantially homogeneous in quality, has a low softening point and has excellent molecular orientation.
摘要:
There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
摘要:
There is provided an aromatic hydrocarbon formaldehyde resin obtained by reacting an aromatic hydrocarbon compound (A) represented by the following formula (1) with formaldehyde (B) in the presence of an acidic catalyst.
wherein R represents an organic group having 1 to 10 carbon atoms; I represents an integer of 0 to 2, and m and n represent integers satisfying 1 ≤ m + n ≤ 10, m ≥ 0 and n ≥ 1.
摘要:
To provide an aromatic hydrocarbon resin that can be used as a coating material and a resist resin for a semiconductor, and has a high carbon concentration and a low oxygen concentration, and to provide a composition for forming an underlayer film for lithography that has excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed with the same, and a pattern forming method using the same. An aromatic hydrocarbon is reacted with an aromatic aldehyde in the presence of an acidic catalyst, thereby providing an aromatic hydrocarbon resin that has a high carbon concentration of from 90 to 99.9% by mass and a low oxygen concentration of from 0 to 5% by mass. A composition for forming an underlayer film for lithography contains the resin and an organic solvent, an underlayer film is formed with the same, and a pattern forming method uses the same.
摘要:
A ferromagnetic organic substance having a triaryl methane structure and a free radical concentration of methine carbon positions of at least 10¹⁷ radicals/g, preferably at least 10¹⁸ radials/g, is provided by polycondensing a condensed polynuclear aromatic compound or an electron donating group substituted monocyclic aromatic compound with an aromatic aldehyde in the presence of an acid catalyst, to produce a precondensate having a softening point between 30°C and 120°C and being soluble in various organic solvents, and subjecting the resulting precondensate to a dehydrogenation treatment and a purification treatment, followed by molding. Alternatively, a preferable ferromagnetic organic substance having a triaryl methane structure is also manufactured by self-polycondensing an aromatic derivative having at least one electron donating group and at least one aldehyde group in the presence of an acid catalyst and then dehydrogenating the resulting polymer by light-irradiation and/or treatment with an oxidizing agent.