HYDRAULIC COMPOSITION DISPERSING AGENT
    1.
    发明公开
    HYDRAULIC COMPOSITION DISPERSING AGENT 有权
    DISPERGIERMITTELFÜREINE HYDRAULIKZUSAMMENSETZUNG

    公开(公告)号:EP2641885A4

    公开(公告)日:2017-04-26

    申请号:EP11842016

    申请日:2011-11-17

    申请人: KAO CORP

    摘要: The present invention discloses a dispersant for a hydraulic composition, containing an alkyldiethanolamine having an alkyl group having 1 to 3 carbon atoms and a naphthalenesulfonic acid-formaldehyde condensate, wherein a weight ratio of the alkyldiethanolamine having an alkyl group having 1 to 3 carbon atoms to the naphthalenesulfonic acid-formaldehyde condensate (alkyldiethanolamine/ naphthalenesulfonic acid-formaldehyde condensate) is 0.01 to 2.0; an aqueous solution containing the same, moreover a hydraulic composition, containing an alkyldiethanolamine having an alkyl group having 1 to 3 carbon atoms, a naphthalenesulfonic acid-formaldehyde condensate, a hydraulic powder, an aggregate and water, wherein the hydraulic powder contains SO 3 in an amount of 0.5 to 6.0% by weight, and a weight ratio of the alkyldiethanolamine having an alkyl group having 1 to 3 carbon atoms to the naphthalenesulfonic acid-formaldehyde condensate (alkyldiethanolamine/ naphthalenesulfonic acid-formaldehyde condensate) is 0.01 to 2.0.

    摘要翻译: 本发明公开了一种水硬性组合物用分散剂,其含有具有碳原子数为1〜3的烷基的烷基二乙醇胺和萘磺酸 - 甲醛缩合物,其中,具有碳原子数为1〜3的烷基的烷基二乙醇胺与 萘磺酸 - 甲醛缩合物(烷基二乙醇胺/萘磺酸 - 甲醛缩合物)为0.01〜2.0, 含有其的水溶液以及含有具有碳原子数为1〜3的烷基的烷基二乙醇胺,萘磺酸 - 甲醛缩合物,水硬性粉体,骨料和水的水硬性组合物,水硬性粉体含有SO 3 0.5〜6.0重量%,烷基碳原子数为1〜3的烷基二乙醇胺与萘磺酸 - 甲醛缩合物(烷基二乙醇胺/萘磺酸 - 甲醛缩合物)的重量比为0.01〜2.0。

    Resist underlayer film composition and patterning process using the same
    4.
    发明公开
    Resist underlayer film composition and patterning process using the same 有权
    抗生素和抗凝血药物

    公开(公告)号:EP2476713A1

    公开(公告)日:2012-07-18

    申请号:EP12000052.6

    申请日:2012-01-05

    IPC分类号: C08G10/02 G03F7/09

    CPC分类号: C08G10/02 G03F7/094

    摘要: There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.

    摘要翻译: 公开了一种抗蚀剂下层膜组合物,其中组合物含有通过至少一种或多种下列通式(1-1)和/或(1-2)表示的化合物的缩合获得的聚合物,以及一种或 更多种由以下通式(2-1)和/或(2-2)表示的化合物和/或其等价物。 可以提供能够形成具有降低的反射率的下层膜(即,具有最佳n值和k值作为抗反射膜的下层膜)的三层抗蚀剂工艺的下层膜组合物,优异的填充 - 特别是在60nm以上的高方位线上,特别是在蚀刻后,不会引起线下落或翘曲,以及使用该特征的图案化处理。

    Pitch for production of carbon fibers
    5.
    发明公开
    Pitch for production of carbon fibers 失效
    沥青用于生产碳纤维

    公开(公告)号:EP0200965A1

    公开(公告)日:1986-12-17

    申请号:EP86105234.8

    申请日:1986-04-16

    摘要: A pitch having optical anisotropy for use in production of carbon fibers, wherein the patch is prepared using a compound represented by the formula . (I) as a raw starting material and subjecting the compound to thermal modification and then removing light fractions
    wherein R,, R 2 , R 3 , R 4 , R6, R 7 , R 8 , Rg and R, o each represents a hydrogen atom or a methyl group or an ethyl group; R 5 represents a hydrogen atom or a methyl group; the total number of carbon atoms of R,, R 2 , R 3 and R 4 is from 2 to 4 and the total number of carbon atoms of R 6 , R 7 , R 8 and R 9 is from 2 to 4; and m is at least 3. The pitch is substantially homogeneous in quality, has a low softening point and has excellent molecular orientation.

    摘要翻译: 一种用于制造碳纤维的具有光学各向异性的沥青,其中所述贴剂使用由下式表示的化合物制备。 (I)化合物作为原料并对该化合物进行热改性,然后除去其中R 1,R 2,R 3,R 4,R 6,R 7,R 8,R 8和R 10各自表示氢原子或甲基的轻馏分 或乙基; R5代表氢原子或甲基; R 1,R 2,R 3和R 4的碳原子总数为2至4且R 6,R 7,R 8和R 9的碳原子总数为2至4; m至少为3.沥青质量基本均匀,软化点低,并具有优异的分子取向。

    Resist underlayer film composition and patterning process using the same

    公开(公告)号:EP2476713B1

    公开(公告)日:2018-04-11

    申请号:EP12000052.6

    申请日:2012-01-05

    IPC分类号: C08G10/02 G03F7/09

    CPC分类号: C08G10/02 G03F7/094

    摘要: There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.

    AROMATIC HYDROCARBON RESIN AND COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY
    8.
    发明公开
    AROMATIC HYDROCARBON RESIN AND COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY 有权
    芳香族烃类树脂和组合物形成下涂膜光刻

    公开(公告)号:EP2479198A1

    公开(公告)日:2012-07-25

    申请号:EP10817175.2

    申请日:2010-09-14

    IPC分类号: C08G10/02 C08G61/10 G03F7/11

    摘要: To provide an aromatic hydrocarbon resin that can be used as a coating material and a resist resin for a semiconductor, and has a high carbon concentration and a low oxygen concentration, and to provide a composition for forming an underlayer film for lithography that has excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed with the same, and a pattern forming method using the same. An aromatic hydrocarbon is reacted with an aromatic aldehyde in the presence of an acidic catalyst, thereby providing an aromatic hydrocarbon resin that has a high carbon concentration of from 90 to 99.9% by mass and a low oxygen concentration of from 0 to 5% by mass. A composition for forming an underlayer film for lithography contains the resin and an organic solvent, an underlayer film is formed with the same, and a pattern forming method uses the same.

    摘要翻译: 以提供芳族烃树脂也可以用作涂层材料和用于半导体的抗蚀剂树脂,和具有高的碳浓度和氧浓度低,并提供一种组合物用于光刻下层膜的形成确实具有优良的蚀刻 电阻作为下层膜用于多层抗蚀剂工艺,下层膜形成用相同,并使用相同的图案形成方法。 芳族烃是在芳族醛在酸性催化剂的存在下反应以,从而提供芳族烃树脂并具有90〜99.9%的高的碳浓度为质量和质量的0至5%的低氧浓度 , 一种用于在下层膜的形成光刻用组合物含有树脂和有机溶剂中以下层电影的被形成为与相同的,并且形成方法的图案使用相同的。

    Feromagnetic organic substance having triaryl methane structure and process for manufacturing the same
    10.
    发明公开
    Feromagnetic organic substance having triaryl methane structure and process for manufacturing the same 失效
    具有三元甲烷结构的有机有机物质及其制造方法

    公开(公告)号:EP0356915A3

    公开(公告)日:1992-09-09

    申请号:EP89115636.6

    申请日:1989-08-24

    申请人: GUNMA UNIVERSITY

    IPC分类号: C08G10/02 H01F1/00

    CPC分类号: C08G10/02 H01F1/42

    摘要: A ferromagnetic organic substance having a triaryl methane structure and a free radical concentration of methine carbon positions of at least 10¹⁷ radicals/g, preferably at least 10¹⁸ radials/g, is provided by polycondensing a condensed polynuclear aromatic compound or an electron donating group substituted monocyclic aromatic compound with an aromatic aldehyde in the presence of an acid catalyst, to produce a precondensate having a softening point between 30°C and 120°C and being soluble in various organic solvents, and subjecting the resulting precondensate to a dehydrogenation treatment and a purification treatment, followed by molding. Alternatively, a preferable ferromagnetic organic substance having a triaryl methane structure is also manufactured by self-polycondensing an aromatic derivative having at least one electron donating group and at least one aldehyde group in the presence of an acid catalyst and then dehydrogenating the resulting polymer by light-irradiation and/or treatment with an oxidizing agent.