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    ION BEAM SPUTTERING APPARATUS AND METHOD
    1.
    发明公开
    ION BEAM SPUTTERING APPARATUS AND METHOD 审中-公开

    公开(公告)号：EP4398283A3

    公开(公告)日：2024-11-13

    申请号：EP24166424.2

    申请日：2018-12-21

    申请人： Institute Of Geological And Nuclear Sciences Limited ,  Futter, Richard John ,  Davidson, Ryan James

    发明人： Futter, Richard John ,  Davidson, Ryan James ,  Leveneur, Jerome ,  Kennedy, John Vedamuthu

    IPC分类号： C23C14/04 ,  C23C14/14 ,  C23C14/34 ,  C23C14/46 ,  C23C14/56 ,  H01J37/34 ,  H01J37/317

    摘要： An ion beam sputtering apparatus comprising: an ion source configured to generate a hollow ion beam along a beam axis that is located in a hollow part of the beam; and a sputtering target having a target body that defines at least one target surface, the target body comprising sputterable particles, the target body being located relative to the ion source so that the ion beam hits the at least one target surface to sputter particles from the target body towards a surface of an object to be modified; wherein the target body is shaped so that the particles sputtered towards a surface to be modified are generally sputtered from the sputtering target in radially extending sputter directions relative to the beam axis, the sputter directions extending away from the beam axis; wherein an axis of the target body is substantially coaxial with the beam axis; and wherein the cross-sectional area of at least part of the target body, in a plane perpendicular to the beam axis, increases in a direction away from the ion source from a first cross-sectional area closer to the ion source than a second cross-sectional area further from the ion source, wherein the first cross-sectional area is substantially smaller than a cross-sectional area of the hollow portion of the ion beam, and wherein the second cross-sectional area is substantially larger than a cross-sectional area of an external periphery of the hollow ion beam. Also disclosed is a method of sputtering particles onto a surface to be modified and a method of sputtering particles onto an inner surface of an arcuate surface of a conduit.

    MASK, MASK ASSEMBLY INCLUDING THE MASK, AND METHOD OF FABRICATING DISPLAY DEVICE
    2.
    发明公开
    MASK, MASK ASSEMBLY INCLUDING THE MASK, AND METHOD OF FABRICATING DISPLAY DEVICE 审中-公开

    公开(公告)号：EP4438766A2

    公开(公告)日：2024-10-02

    申请号：EP24160515.3

    申请日：2024-02-29

    申请人： Samsung Display Co., Ltd.

    发明人： KIM, Se Il ,  YI, Sang Min ,  LEE, Seung Jin ,  CHUN, Ji Yun

    IPC分类号： C23C14/04 ,  H10K71/16

    CPC分类号： C23C14/042 ,  H10K71/166

    摘要： A mask includes, a plurality of rib portions (RP) disposed between a plurality of openings (OB), wherein the mask has a width in a first direction and a length in a second direction which intersects the first direction, the plurality of rib portions includes first rib portions (RP1), which are disposed between openings spaced apart from one another in the second direction among the plurality of openings, and second rib portions (RP2), which are disposed between openings to be spaced apart from one another in the first direction among the plurality of openings, sides of each of the first rib portions have a first taper angle, and the first taper angle is about 54 degrees or less.