公开(公告)号：EP3572667B1

公开(公告)日：2024-03-13

申请号：EP18741548.4

申请日：2018-01-12

发明人： SAKAGUCHI Yoshiyuki ,  SUN Yanbin ,  SAEGUSA Kengo ,  OMORI Hideki

IPC分类号： F04B17/03 ,  F04B39/16 ,  F04B39/00 ,  F04D19/04 ,  F04B37/14 ,  F04D29/60 ,  F04D25/06 ,  F04B37/16

公开(公告)号：EP3770443A1

公开(公告)日：2021-01-27

申请号：EP19771455.3

申请日：2019-03-13

申请人： Edwards Japan Limited

发明人： KAWASHIMA, Toshiaki

IPC分类号： F04D29/66 ,  F04B37/16 ,  F04D19/04 ,  F04D29/08 ,  F04D29/42 ,  F16F15/08

摘要： A vacuum pump and a damper for the vacuum pump are provided so as to increase vibration isolation in a twisting direction with a simple structure and prevent rupture of an O-ring and an elastic member by regulating a misalignment of flanges facing each other. Provided are a first flange and a second flange, each having a central opening, the flanges being shaped like rings opposed to each other; an O-ring and an intermediate ring that are disposed between the first flange and the second flange; O-rings disposed between the first flange and the intermediate flange and between the intermediate ring and the second flange; a plurality of elastic members that are disposed between the first flange and the second flange and are spread in the circumferential direction of central openings; and airtightness keeping means including positioning pins inserted into positioning holes sequentially provided on the first flange, the intermediate ring, and the second flange.

公开(公告)号：EP2982864B1

公开(公告)日：2017-08-09

申请号：EP14831527.8

申请日：2014-05-19

申请人： Sanoh Industrial Co., Ltd.

发明人： YAMAZAKI, Nobushi

IPC分类号： F04B35/00 ,  F04B37/16 ,  F04C25/02 ,  F16D27/11

CPC分类号： F04B37/14 ,  F04B35/00 ,  F04B35/002 ,  F04B37/16 ,  F04C25/02 ,  F04C29/005 ,  F16D27/11

公开(公告)号：EP2644899A1

公开(公告)日：2013-10-02

申请号：EP11843290.5

申请日：2011-07-28

申请人： Edwards Japan Limited

发明人： OKUDERA Satoshi ,  SAKAGUCHI Yoshiyuki

IPC分类号： F04D19/04 ,  F04B37/02 ,  F04B37/16 ,  F04C25/02

CPC分类号： F04D29/70 ,  F04B37/02 ,  F04B37/14 ,  F04B37/16 ,  F04D19/04 ,  F04D19/042 ,  F04D27/0292 ,  F04D29/644 ,  F04D29/701

摘要： The present invention provides a splinter shield for a vacuum pump, capable of reducing costs of the splinter shield by obtaining a single sheet of splinter shield having a required strength, in which fastening strength to a fixing groove is enhanced to prevent the splinter shield from bending toward the inside of a pump and coming into contact with equipment inside the pump when air rushes into the pump through an inlet port and to prevent the splinter shield from falling. Furthermore, attachment and removal of the splinter shield with respect to the inlet port are facilitated.
The present invention is a splinter shield for a vacuum pump in which a rim formed in a circumferential edge portion of the splinter shield is inserted into a fixing groove that is provided in a concave manner in an inner circumferential portion of an inlet port, and the splinter shield is provided in a tensioned manner to the inlet port by pushing a retaining ring into the fixing groove, wherein locking parts that are locked into the retaining ring at a plurality of sections in the rim are provided in a standing manner at substantially right angles to the rim.

公开(公告)号：EP2601413A1

公开(公告)日：2013-06-12

申请号：EP11814598.6

申请日：2011-07-25

申请人： Ebara Corporation

发明人： SHINOHARA, Toyoji ,  KAWAMURA, Kohtaro ,  NAKAZAWA, Toshiharu

IPC分类号： F04B37/16 ,  B01D53/46 ,  F04B49/10 ,  H01L21/205

CPC分类号： F24F7/00 ,  B01D53/005 ,  B01D53/78 ,  B01D2258/0216 ,  F04B37/14 ,  F04B49/06 ,  F04B2201/1201

摘要： An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).

摘要翻译： 排气系统（2）用于对用于制造半导体器件，液晶面板，LED或太阳能电池的制造设备（1）的腔室进行抽真空。 排气系统（2）包括用于抽空室的真空泵装置（3），用于处理从室排出的排气的废气处理装置（5），以及用于控制真空泵装置的控制器（6） 3）和/或废气处理装置（5）。 制造设备（1）的操作过程信息，以及供应给制造设备（1）的气体的种类和气体的流量被输入到控制器（6）中以控制真空泵设备（3）和 /或废气处理装置（5）。

公开(公告)号：EP2518317A1

公开(公告)日：2012-10-31

申请号：EP10839437.0

申请日：2010-12-22

申请人： Sumitomo Seika Chemicals Co. Ltd.

发明人： HARUNA Kazuo ,  MARUTA Kiyokazu ,  KUWATA Hidenori ,  SHIMA Koichi

IPC分类号： F04B37/16 ,  B01D53/04

CPC分类号： F04B41/06 ,  B01D53/0446 ,  B01D53/047 ,  B01D53/0476 ,  B01D2259/402 ,  F04B37/14 ,  F04B37/16 ,  F04B49/007 ,  F04C18/126 ,  F04C23/001 ,  F04C25/02 ,  F04C28/02 ,  F04C28/26 ,  F04C2240/81 ,  F04C2270/18

摘要： A double vacuum pump apparatus (Y2) includes positive displacement vacuum pumps (40A, 40B) and lines (52, 60). Each of the vacuum pumps includes a suction port (41) and a discharge port (42), and a pressure detector (80) is provided in the vicinity of the suction port (41) of the double vacuum pump apparatus (Y2). The line (52) connects the discharge port (42) of the vacuum pump (40A) to the suction port (41) of the vacuum pump (40B). The line (60) has an end (E6) and an end (E5) that are connected to the connection line (52), and includes a buffer tube (Z1) and an on-off valve (61) located between the tube (Zl) and the end (E5). A pressure detection signal from the pressure detector (80) is used as an on/off signal for the on-off valve (61).

摘要翻译： 双式真空泵装置（Y2）包括正位移真空泵（40A，40B）和线（52，60）。 每个真空泵包括吸入口（41）和排出口（42），以及压力检测器（80）在双式真空泵装置（Y2）的吸入口（41）的附近。 线（52）连接所述真空泵（40A）连接到真空泵（40B）的吸入口（41）的排出口（42）。 线（60）具有以结束（E6）和对端（E5）并连接到所述连接线（52），并且包括位于所述管之间的缓冲管（Z1）和（开闭阀（61） ZL）和结束（E5）。 来自压力检测器（80）的压力检测信号被用作在用于开闭阀（61）开/关信号。

公开(公告)号：EP1811176A1

公开(公告)日：2007-07-25

申请号：EP05745938.0

申请日：2005-06-01

申请人： BOC Edwards Japan Limited

发明人： NONAKA, Manabu

IPC分类号： F04B37/16 ,  F04D19/04

CPC分类号： F04D29/161 ,  F04B37/16 ,  F04D19/04 ,  F04D29/083

摘要： To improve the isolation rate of vibrations propagating from a vacuum pump to a vacuum device.
A turbo-molecular pump 1 is connected to a main vacuum chamber 2 via a vacuum seal structure 4. Further, a sub-vacuum chamber 3 is provided so as to contain the main vacuum chamber 2, the vacuum seal structure 4, and an inlet 110 of the turbo-molecular pump 1. The roughing evacuation of the sub-vacuum chamber 3 is accomplished by using a roughing vacuum pump 6 to make the sub-vacuum chamber 3 in a medium vacuum state. Since the vacuum seal structure 4 is arranged in the sub-vacuum chamber 3 in a medium vacuum state, a difference in pressure between the main vacuum chamber 2 and the sub-vacuum chamber 3 can be made extremely small. Thereby, the amount of gas leakage to the main vacuum chamber 2 can be kept at a small value. Also, the vacuum seal structure 4 can use, for example, a non-contact seal structure or a highly flexible seal member because it does not perform a function of supporting the turbo-molecular pump 1.

摘要翻译： 提高从真空泵传播到真空设备的振动的隔离率。 涡轮分子泵1经由真空密封结构4连接到主真空室2.此外，设置副真空室3以包含主真空室2，真空密封结构4和入口 通过使用粗真空泵6使副真空室3处于中等真空状态来完成副真空室3的粗抽真空。 由于真空密封结构4以中等真空状态布置在副真空室3中，所以主真空室2和副真空室3之间的压力差可以非常小。 由此，能够将向主真空腔室2的气体泄漏量保持在较小的值。 另外，真空密封结构4由于不具有支承涡轮分子泵1的功能，因此能够使用例如非接触密封结构或高柔性密封部件。

公开(公告)号：EP1609990A1

公开(公告)日：2005-12-28

申请号：EP04716009.8

申请日：2004-03-01

申请人： OHMI, Tadahiro

发明人： OHMI, Tadahiro

IPC分类号： F04B37/16 ,  F04F5/20 ,  F04D19/04 ,  F04C25/02

CPC分类号： F04B37/14 ,  F04C18/16 ,  F04C23/005 ,  F04C2220/12 ,  F04D19/046 ,  F04F5/20 ,  F04F5/54

摘要： A vacuum apparatus has a vacuum chamber provided with a gas inlet and a gas outlet, and mechanical vacuum pumps in a plurality of stages for reducing a pressure inside the vacuum chamber and maintaining the pressure-reduced state. The vacuum apparatus has an ejector pump (60) connected to a discharge port (57) of a screw pump (A) as the vacuum pump at the last stage among the vacuum pumps. The vacuum apparatus is reduced in power consumption and used in the semiconductor manufacturing field and so on.

摘要翻译： 真空装置具有设置有气体入口和气体出口的真空室，以及用于降低真空室内的压力并保持压力降低状态的多级的机械真空泵。 真空装置具有在真空泵中最后阶段的作为真空泵的螺杆泵（A）的排出口（57）连接的喷射泵（60）。 真空装置的功耗降低并用于半导体制造领域等。

公开(公告)号：EP1077329A1

公开(公告)日：2001-02-21

申请号：EP00906683.8

申请日：2000-03-03

申请人： TOKYO ELECTRON LIMITED ,  Ohmi, Tadahiro

发明人： OHMI, Tadahiro ,  HIRAYAMA, Masaki

IPC分类号： F04B37/16

CPC分类号： F04D19/04 ,  F04D25/00

摘要： The present invention provides a vacuum apparatus that includes a plurality of vacuum containers each having a gas inlet and an exhaust outlet, a gas supply system for introducing a desired gas into each of the vacuum containers through the gas inlet, and an exhaust system for keeping each of the vacuum containers at a low pressure. In this vacuum apparatus, the exhaust system includes a plurality of multistage vacuum pumps connected in series. The exhaust outlet pressure of the last-stage vacuum pump is substantially at atmospheric pressure. The last-stage vacuum pump is designed to exhaust gas from a plurality of vacuum pumps at previous stages.

摘要翻译： 本发明提供一种真空装置，其包括多个具有气体入口和排气出口的真空容器，用于通过气体入口将期望气体引入每个真空容器的气体供给系统，以及用于保持 每个真空容器处于低压下。 在这种真空装置中，排气系统包括串联连接的多个多级真空泵。 最后一级真空泵的排气出口压力基本上处于大气压。 最后一级真空泵设计用于在先前阶段从多个真空泵排出气体。

公开(公告)号：EP0895484A4

公开(公告)日：2000-12-06

申请号：EP97917644

申请日：1997-03-25

申请人： SAES PURE GAS INC

发明人： LORIMER D ARCY H

IPC分类号： B01D8/00 ,  F04B37/02 ,  F04B37/08 ,  F04B37/16

CPC分类号： F04B37/02 ,  F04B37/08 ,  Y10S417/901

摘要： A combination cryopump/getter pump (50) including a cryopump section (52) having a cryopump inlet (76), a getter pump section (54) having a getter pump inlet (86), and a mechanism (60) for coupling the cryopump section (52) and the getter pump section (54) to a single port (58) of a process chamber to be evacuated. Preferably, a cylindrical getter pump section (54) surrounds a cylindrical cryopump section (52). Preferably, the cryopump section (52) and the getter pump section (54) are coupled to the common port (58) of the process chamber by a gate valve mechanism (60). In one embodiment, the gate valve mechanism (60) isolates the cryopump inlet (76) and the getter pump inlet (86) when in a closed position. In another embodiment, the gate valve mechanism (60) does not isolate the cryopump inlet (76) and the getter pump inlet (86) when in a closed position. Preferably, thermal insulation (78) is provided between the getter pump section (54) and the cryopump section (52) to thermally isolate the two sections. The cryopump section preferably includes both a 15 °K array (72) and an 80 °K array (70a-d).