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公开(公告)号：JP5553421B2
公开(公告)日：2014-07-16
申请号：JP2012166335
申请日：2012-07-26
Applicant: 株式会社ルネッサンス・エナジー・リサーチ , 国立大学法人神戸大学
IPC: B01D69/00 , B01D71/38 , B01D71/40 , C01B3/48 , C01B3/56 , C01B32/50 , C08F216/06 , C08F220/06 , H01M8/06
CPC classification number: B01D53/228 , B01D61/38 , B01D69/02 , B01D69/10 , B01D69/142 , B01D71/38 , B01D71/40 , B01D71/76 , B01D2053/221 , B01D2325/22 , B05D1/00 , C01B3/503 , C01B2203/0283 , C01B2203/041 , H01M8/0612 , H01M8/0668 , Y02P70/56
Abstract: CO 2 -facilitated transport membrane that can be applied to a CO 2 -permeable membrane reactor is stably provided. The CO 2 -facilitated transport membrane is provided such that a gel layer (1) composed of a hydrogel membrane is deposited onto a porous membrane (2). More preferably, the gel layer (1) deposited onto a hydrophilic porous membrane (2) is coated with and supported by hydrophobic porous membranes (3) and (4). The gel layer contains a deprotonating agent including an alkali metal element together with glycine. The deprotonating agent is preferably a carbonate or a hydroxide of an alkali metal element, and more preferably, the alkali metal element is potassium, cesium, or rubidium.
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公开(公告)号：JPWO2012081644A1
公开(公告)日：2014-05-22
申请号：JP2012548825
申请日：2011-12-14
Applicant: 宇部興産株式会社
CPC classification number: C08G73/1046 , B05D1/00 , C08G73/1042 , G03G15/14 , G03G15/162 , G03G15/2057
Abstract: 本発明は、下記化学式(1)で示される繰返し単位を有するポリイミドからなることを特徴とするシームレスベルトに関する。【化1】化学式(1)において、Aは、25〜95モル%が下記化学式(2)で示される4価のユニットであり、75〜5モル%が下記化学式(3)で示される4価のユニットであり、Bは、15〜95モル%が下記化学式(4)で示される2価のユニットであり、85〜5モル%が下記化学式(5)で示される2価のユニットである。【化2】【化3】【化4】【化5】
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公开(公告)号：JP5231227B2
公开(公告)日：2013-07-10
申请号：JP2008530691
申请日：2006-09-11
Applicant: カーベーアー−ノタシ ソシエテ アノニム
Inventor： デュペルチュイ，ディディエール , ガニーニ，アンドレア
IPC: B41F9/10
CPC classification number: B05D1/002 , B05D1/00 , B05D3/0263 , B41F9/1018 , B41F9/1072
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公开(公告)号：JP2013049048A
公开(公告)日：2013-03-14
申请号：JP2012166335
申请日：2012-07-26
Applicant: Renaissance Energy Research:Kk , 株式会社ルネッサンス・エナジー・リサーチ , Kobe Univ , 国立大学法人神戸大学
Inventor： OKADA OSAMU , KAMIO EIJI , TERAMOTO MASAAKI , HANAI NOBUAKI , MATSUYAMA HIDETO
IPC: B01D69/00 , B01D71/38 , B01D71/40 , C01B3/48 , C01B3/56 , C01B32/50 , C08F216/06 , C08F220/06 , H01M8/06
CPC classification number: B01D53/228 , B01D61/38 , B01D69/02 , B01D69/10 , B01D69/142 , B01D71/38 , B01D71/40 , B01D71/76 , B01D2053/221 , B01D2325/22 , B05D1/00 , C01B3/503 , C01B2203/0283 , C01B2203/041 , H01M8/0612 , H01M8/0668 , Y02P70/56
Abstract: PROBLEM TO BE SOLVED: To stably provide a CO-facilitated transport membrane that can be applied to a COpermeable membrane reactor and has excellent carbon dioxide permeability and CO/Hselectivity.SOLUTION: The CO-facilitated transport membrane is provided with a gel layer 1 composed of a hydrogel film being carried on a hydrophilic porous membrane 2. More preferably, the gel layer 1 carried on the hydrophilic porous member 2 is covered and supported by hydrophobic porous membranes 3, 4. The gel film includes a deprotonating agent including an alkali metal element together with glycine. The deprotonating agent is preferably a hydroxide or a carbonate of an alkali metal element, and more preferably, the alkali metal element is potassium, cesium, or rubidium.
Abstract translation: 要解决的问题：为了稳定地提供可应用于CO
2 的CO 2 并且具有优异的二氧化碳渗透性和CO 2 / H 2 选择性。 解决方案：具有由承载在亲水性多孔膜2上的水凝胶膜构成的凝胶层1的CO 2 。更优选地，凝胶 亲水性多孔构件2承载的层1被疏水性多孔膜3,4覆盖并负载。凝胶膜包括含有碱金属元素和甘氨酸的去质子化剂。 脱质子化剂优选为碱金属元素的氢氧化物或碳酸盐，更优选碱金属元素为钾，铯或铷。 版权所有（C）2013，JPO＆INPIT -
公开(公告)号：JP4906014B1
公开(公告)日：2012-03-28
申请号：JP2011546501
申请日：2011-09-30
Applicant: 株式会社シンクロン
CPC classification number: B05D1/00 , C23C14/022 , C23C14/06 , C23C14/22 , C23C14/546
Abstract: Provided is a film formation apparatus that can efficiently form an anti-contamination film that can withstand actual use while also having improved abrasion resistance. A film formation apparatus (1) in which a substrate holder (12) that has a substrate holding surface for holding a plurality of substrates (14) is disposed rotatably within a vacuum vessel (10), said film formation apparatus (1) comprising: an ion source (38) mounted within the vacuum vessel (10) so as to have a configuration, position and orientation such that an ion beam can be radiated to an area that is a part of the substrate holding surface; and a vapor deposition source (34) and a control plate (36) that act as film formation means mounted within the vacuum vessel (10) so as to have a configuration such that the film formation material can be supplied to a region which is a part of the substrate holding surface and which overlaps at least a part of the ion beam radiation area irradiated by the ion source (38).
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Patent Agency Ranking46.发明专利Method for manufacturing ceramic-metal structure, method for bonding, and structure formed therefrom 审中-公开制造陶瓷金属结构的方法，其结合方法和结构形式
公开(公告)号：JP2008012922A
公开(公告)日：2008-01-24
申请号：JP2007179433
申请日：2007-07-09
Applicant: Dow Global Technologies Inc , ダウ・グローバル・テクノロジーズ・インコーポレーテツド
Inventor： PYZIK ALEKSANDER J , ROSSOW HAROLD E , OTT JACK J , DESHMUKH UDAY V
IPC: B32B15/04 , B05D1/00 , C03C17/00 , C04B37/00 , C04B37/02 , C04B41/45 , C04B41/88 , C23C24/08 , C23C24/10 , C23C26/02
CPC classification number: C04B41/4507 , B05D1/00 , C03C17/007 , C03C2217/42 , C03C2217/45 , C03C2217/475 , C04B37/006 , C04B2235/5436 , C04B2235/5445 , C04B2235/658 , C04B2235/6581 , C04B2237/121 , C04B2237/366 , C04B2237/58 , C04B2237/597 , C04B2237/61 , C04B2237/708 , C23C24/10 , C23C26/02 , Y10T156/1038 , C04B41/5025 , C04B41/4523 , C04B41/51
Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a ceramic-metal tape easy to adjust the thickness thereof, and considerably dense so that shrinkage hardly or never occurs at the time of being compressed at high temperatures. SOLUTION: This method for manufacturing the ceramic-metal tape comprises the steps of adhering a non-wettable ceramic powder layer on a solid molding, adhering a wettable ceramic powder layer on the non-wettable ceramic powder layer, bringing a metal into contact with the wettable powder layer, heating the metal so that the metal can melt and penetrate/infiltrate the wettable powder layer, and cooling the metal-penetration structure to solidify the metal. COPYRIGHT: (C)2008,JPO&INPIT
Abstract translation: 要解决的问题：提供一种制造容易调节其厚度的陶瓷 - 金属带的方法，并且相当密集，使得在高温下被压缩时几乎或不会发生收缩。 解决方案：制造陶瓷金属带的方法包括以下步骤：将不可润湿的陶瓷粉末层粘附在固体成型件上，将可湿性陶瓷粉末层粘附在不可润湿的陶瓷粉末层上，使金属进入 与可湿性粉末层接触，加热金属，使金属熔化并渗透/渗透可湿性粉末层，并冷却金属穿透结构以固化金属。 版权所有（C）2008，JPO＆INPIT
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47.发明专利Production method of nanoparticle dispersion solution and production method of nanoparticle thin film using the same 审中-公开纳米颗粒分散溶液的制备方法及其使用的纳米薄膜的制备方法
公开(公告)号：JP2007016317A
公开(公告)日：2007-01-25
申请号：JP2006185832
申请日：2006-07-05
Inventor： CHOI JAI-YOUNG , CHO KYUNG-SANG , LEE EUN SUNG , PARK SHUHO , IN ZENBI , SONG SANG HOON , HONG JONG DAL
CPC classification number: B82Y40/00 , B05D1/00 , B05D3/0493 , B05D3/10 , B82Y30/00 , Y10T428/29
Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a two- or three-dimensional nanoparticle thin film that is uniformly applied onto an area, whereby a dispersion efficiency can be improved by reducing defects and agglomeration of nanoparticles. SOLUTION: The surfaces of the nanoparticles are modified to be electrically charged and subsequently subjected to vacuum drying. The dried nanoparticles are dispersed in a solvent and subsequently centrifuged to be dispersed. A two- or three-dimensional substrate is pre-treated to be charged oppositely of the nanoparticle surfaces, and the pre-treated two- or three-dimensional substrate is coated with the nanoparticle dispersion solution. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供均匀地施加到区域上的二维或三维纳米颗粒薄膜的制造方法，由此可以通过减少纳米颗粒的缺陷和聚集来提高分散效率。 解决方案：将纳米颗粒的表面改性为带电荷并随后进行真空干燥。 将干燥的纳米颗粒分散在溶剂中，随后离心分散。 将二维或三维底物预处理成与纳米颗粒表面相反的方向，并且用纳米颗粒分散液涂覆预处理的二维或三维底物。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2004124235A
公开(公告)日：2004-04-22
申请号：JP2002293913
申请日：2002-10-07
Applicant: Tokyo Electron Ltd , 東京エレクトロン株式会社
Inventor： MARUMO YOSHINORI
IPC: B05D1/00 , C23C18/16 , C23C18/31 , C25D5/02 , H01L21/288
CPC classification number: B05D1/00 , C23C18/1676 , C25D5/02 , H01L21/288
Abstract: PROBLEM TO BE SOLVED: To provide an electroless plating method by which the uniformity of a plating film to be formed can be improved.
SOLUTION: An electroless plating liquid is fed, and reaction promotion conditions are imparted to start the formation of a plating film. In the stage where the electroless plating liquid is fed, the formation of the plating film is not performed, or, even if it is performed, the film forming rate therein is low. Thus, the electroless plating liquid is spread over a substrate before the normal formation of the plating film to improve the uniformity of the electroless plating film.
COPYRIGHT: (C)2004,JPOAbstract translation: 要解决的问题：提供可以提高要形成的镀膜的均匀性的化学镀方法。 解决方案：进料无电镀液，并赋予反应促进条件以开始形成镀膜。 在进料化学镀液的阶段中，不进行镀膜的形成，即使进行了，其成膜速度也低。 因此，在电镀膜正常形成之前，化学镀液体分散在基板上，以提高化学镀膜的均匀性。 版权所有（C）2004，JPO
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公开(公告)号：JPH11511378A
公开(公告)日：1999-10-05
申请号：JP51034397
申请日：1996-08-16
Applicant: ミネソタ・マイニング・アンド・マニュファクチャリング・カンパニー
Inventor： クーヤー，リチャード・エル , ヘンドリクソン，ウィリアム・エイ
Abstract: (57)【要約】 本発明は、粉末を基材に接着させる方法に関する。 この方法には、ａ）振動磁界を与えるステップと、ｂ）コーティング材料、基材、および少なくともコーティング材料の流動化床を形成することによってコーティング材料を基材に付着させ、コーティング材料を基材の表面に接着させるのに十分な力を与える手段を連続的に磁界内に導入するステップと、ｃ）被覆された基材を連続的に収集するステップとを含む。
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公开(公告)号：KR102232758B1
公开(公告)日：2021-03-29
申请号：KR1020130134161A
申请日：2013-11-06
Applicant: 프랙스에어 에스.티. 테크놀로지, 인코포레이티드
CPC classification number: C23C28/04 , B05D1/00 , B05D3/007 , C04B41/50 , C09D5/08 , C23C24/08 , C23C30/00 , C23F4/04 , B05D2350/60
Abstract: 특정 크롬-무함유 실리케이트-기재 바인더에 기초한 조성물이 기재된다. 1-액형 슬러리 조성물은 알루미늄 또는 알루미늄 합금 파우더와 조합된 리튬 도핑된 칼륨 실리케이트의 수용액이다. 1-액형 슬러리 조성물은 감소된 코팅 두께에서 향상된 성능을 나타내는 상응하는 코팅을 생성한다.
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