Chemically amplified positive resist composition, and supermolecule and method for producing the same
    48.
    发明专利
    Chemically amplified positive resist composition, and supermolecule and method for producing the same 审中-公开
    化学稳定的阳离子组合物及其生产的超分子和方法

    公开(公告)号:JP2011088929A

    公开(公告)日:2011-05-06

    申请号:JP2011003777

    申请日:2011-01-12

    Abstract: PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition suitable for ArF excimer laser lithography and good in properties such as resolution, sensitivity and a pattern form, and also line edge roughness, in particular. SOLUTION: The composition includes a polymer which is soluble or poorly soluble in an aqueous alkali solution but becomes soluble in the solution by action of an acid, a compound which generates the acid by irradiation with active light or radiation, and a compound expressed by formula (I). In formula (I) Z is a 2-14C hydrocarbon group; A is a 3-14C hydrocarbon group; and W is H, 1-12C alkyl, 2-12C alkylalkoxy or a group expressed by formula (II) (wherein X is a bivalent linking group; R is H, 1-6C alkyl or 3-6C cycloalkyl; Y is an atom required for forming a 3-12C alicyclic hydrocarbon group; and l is 0 or 1). COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种适用于ArF准分子激光光刻的化学放大型正性抗蚀剂组合物,特别是分辨率,灵敏度和图案形式以及线边缘粗糙度等性质良好。 解决方案:组合物包括在碱性水溶液中可溶或难溶性但通过酸,通过用活性光或辐射照射产生酸的化合物的作用可溶于溶液的聚合物和化合物 由式(I)表示。 在式(I)中,Z是2-14C烃基; A是3-14C烃基; 并且W是H,1-12C烷基,2-12C烷基烷氧基或由式(Ⅱ)表示的基团(其中X是二价连接基团; R是H,1-6C烷基或3-6C环烷基; Y是原子 形成3-12C脂环族烃基所必需的; l是0或1)。 版权所有(C)2011,JPO&INPIT

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