公开(公告)号：JP4812986B2

公开(公告)日：2011-11-09

申请号：JP2001253166

申请日：2001-08-23

Applicant: エア・ウォーター株式会社

Inventor： 大輔 三条 ,  秀彦 奥 ,  洋実 木山 ,  敬志 横山

IPC: B08B7/00 ,  B01J13/00 ,  B05B7/04 ,  C01B32/55 ,  C09K3/30 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing dry ice aerosol, by which high hardness dry ice particles of a micrometer order or lower can be produced, which has no possibility of inclusi on of impurities, and is suitable for cleaning the surface of a semiconductor wafer or the like. SOLUTION: A liquefied carbon dioxide gas is evacuated so as to be a gas- liquid mixed state, and is thereafter jetted to the inside of a nozzle 3. Further, gaseous nitrogen is jetted to the inside of the nozzle 3 at a high speed, and the liquefied carbon dioxide gas and carbon dioxide gas in a gas-liquid mixed state are cooled by the cold of the gaseous nitrogen to produce aerosol with the gaseous nitrogen as a dispersion medium and dry ice particles as a dispersion phase. Further, the aerosol is jetted from the nozzle 3 by the jet flow of the gaseous nitrogen.

公开(公告)号：JP3534518B2

公开(公告)日：2004-06-07

申请号：JP521396

申请日：1996-01-16

Applicant: エア・ウォーター株式会社

Inventor： 明 吉野 ,  宣典 大森 ,  秀彦 奥 ,  洋実 木山

IPC: H01L21/22 ,  H01L21/205 ,  H01L21/31 ,  H01L21/324

公开(公告)号：JP3497317B2

公开(公告)日：2004-02-16

申请号：JP1436696

申请日：1996-01-30

Applicant: エア・ウォーター株式会社

Inventor： 明 吉野 ,  宣典 大森 ,  秀彦 奥 ,  篤 宮本 ,  洋実 木山

IPC: H01L21/22 ,  H01L21/205 ,  H01L21/31 ,  H01L21/324