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公开(公告)号:JP3723332B2
公开(公告)日:2005-12-07
申请号:JP25096797
申请日:1997-09-16
Applicant: エア・ウォーター株式会社
IPC: B01D53/34 , B01D53/54 , B01D53/68 , H01L21/3065
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公开(公告)号:JP3669911B2
公开(公告)日:2005-07-13
申请号:JP2000284049
申请日:2000-09-19
Applicant: エア・ウォーター株式会社
CPC classification number: F25B9/145 , F25B2309/1408 , F25B2309/1412 , F25B2400/17
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5.
公开(公告)号:JP3597990B2
公开(公告)日:2004-12-08
申请号:JP14133698
申请日:1998-05-22
Applicant: エア・ウォーター株式会社 , 三菱電機株式会社
IPC: H01L21/205 , C23C16/455
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公开(公告)号:JP4812986B2
公开(公告)日:2011-11-09
申请号:JP2001253166
申请日:2001-08-23
Applicant: エア・ウォーター株式会社
Abstract: PROBLEM TO BE SOLVED: To provide a method for producing dry ice aerosol, by which high hardness dry ice particles of a micrometer order or lower can be produced, which has no possibility of inclusi on of impurities, and is suitable for cleaning the surface of a semiconductor wafer or the like. SOLUTION: A liquefied carbon dioxide gas is evacuated so as to be a gas- liquid mixed state, and is thereafter jetted to the inside of a nozzle 3. Further, gaseous nitrogen is jetted to the inside of the nozzle 3 at a high speed, and the liquefied carbon dioxide gas and carbon dioxide gas in a gas-liquid mixed state are cooled by the cold of the gaseous nitrogen to produce aerosol with the gaseous nitrogen as a dispersion medium and dry ice particles as a dispersion phase. Further, the aerosol is jetted from the nozzle 3 by the jet flow of the gaseous nitrogen.
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公开(公告)号:JP4782467B2
公开(公告)日:2011-09-28
申请号:JP2005132480
申请日:2005-04-28
Applicant: エア・ウォーター株式会社
IPC: F17C3/08 , B23K9/00 , B23K9/23 , B23K101/12 , B65D88/06
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公开(公告)号:JP3488600B2
公开(公告)日:2004-01-19
申请号:JP20175097
申请日:1997-07-28
Applicant: エア・ウォーター株式会社 , 株式会社神戸製鋼所
IPC: F25J3/04
CPC classification number: F25J3/04224 , F25J3/0426 , F25J3/04351 , F25J3/04412
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