-
-
公开(公告)号:JP5417131B2
公开(公告)日:2014-02-12
申请号:JP2009265116
申请日:2009-11-20
IPC: H01L21/683 , H01L21/301
CPC classification number: H01L21/67132 , Y10T156/12
-
公开(公告)号:JP4711904B2
公开(公告)日:2011-06-29
申请号:JP2006208119
申请日:2006-07-31
Inventor: 雅之 山本
IPC: H01L21/683 , H01L21/304
CPC classification number: H01L21/67132 , Y10S156/931 , Y10S156/941 , Y10T156/1168 , Y10T156/17 , Y10T156/1978
-
公开(公告)号:JP4698519B2
公开(公告)日:2011-06-08
申请号:JP2006208117
申请日:2006-07-31
Inventor: 雅之 山本
IPC: H01L21/683
CPC classification number: H01L21/67132 , Y10S156/941 , Y10T156/12 , Y10T156/1313 , Y10T156/14 , Y10T156/1978
-
5.
公开(公告)号:JP4642002B2
公开(公告)日:2011-03-02
申请号:JP2006307726
申请日:2006-11-14
IPC: H01L21/683
CPC classification number: B26F1/3846 , H01L21/67132 , Y10T83/141 , Y10T83/162 , Y10T83/173 , Y10T83/8776
-
公开(公告)号:JP4401322B2
公开(公告)日:2010-01-20
申请号:JP2005119707
申请日:2005-04-18
IPC: H01L21/683 , H01L21/301
CPC classification number: B29C63/0013 , H01L21/67132 , H01L21/6835 , H01L2221/6834 , H01L2221/6839 , Y10T29/49126 , Y10T156/1179 , Y10T156/19
-
公开(公告)号:JP5589045B2
公开(公告)日:2014-09-10
申请号:JP2012233761
申请日:2012-10-23
IPC: H01L21/683
CPC classification number: H01L21/6835 , H01L21/67132 , H01L21/6836 , H01L2221/68318 , H01L2221/68327 , H01L2221/68381 , H01L2924/1305 , H01L2924/13055 , H01L2924/1461 , H01L2924/00
-
公开(公告)号:JP5324319B2
公开(公告)日:2013-10-23
申请号:JP2009126650
申请日:2009-05-26
IPC: H01L21/683 , H01L21/301 , H01L21/677
CPC classification number: H01L21/67132 , Y10T156/17
Abstract: A reinforcing support substrate is joined to a surface of the semiconductor wafer via a double-faced adhesive tape, and then is removed from the semiconductor wafer. Subsequently, the semiconductor wafer with the support substrate removed therefrom is adhesively held on a rear face of a ring frame via a support adhesive tape, and the double-faced adhesive tape is separated from the surface of the semiconductor wafer integrate with the ring frame.
-
公开(公告)号:JP5324232B2
公开(公告)日:2013-10-23
申请号:JP2009002312
申请日:2009-01-08
IPC: H01L21/683 , H01L21/68
CPC classification number: H01L21/681
Abstract: A wafer has an annular ridge formed along an outer periphery thereof to serve as a reinforcing portion, and a circuit pattern surrounded with the reinforcing portion. The wafer is placed on a wafer placement plane of a holding stage in a state that the circuit pattern is directed downward. The wafer placement plane is larger in size than the wafer. On the holding stage, a center of the wafer is aligned with a center of the holding stage in such a manner that a plurality of guide pins are engaged with relevant cutout portions formed on the reinforcing portion. Then, the holding stage rotates while suction-holding the reinforcing portion of the wafer, and simultaneously a photosensor detects a portion for alignment formed on the outer periphery of the wafer.
-
公开(公告)号:JP4740927B2
公开(公告)日:2011-08-03
申请号:JP2007306104
申请日:2007-11-27
IPC: H01L21/683 , B26D3/10 , B26D7/18 , H01L21/02 , H01L21/304
CPC classification number: H01L21/67092 , H01L21/67132 , Y10T83/0405 , Y10T83/0453 , Y10T83/0605 , Y10T83/207 , Y10T83/2072 , Y10T83/728 , Y10T83/9377 , Y10T83/9401 , Y10T156/108
-
-
-
-
-
-
-
-
-