中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

56 records (took 0.038 seconds)

    Sample analysis method
    1.
    发明专利
    Sample analysis method 有权

    公开(公告)号：JP4534235B2

    公开(公告)日：2010-09-01

    申请号：JP2007190890

    申请日：2007-07-23

    Applicant: 株式会社日立ハイテクノロジーズ ,  株式会社日立製作所

    Inventor： 武夫 上野 ,  英巳 小池 ,  紀恵 矢口

    IPC: G01N23/04

    Abstract: PROBLEM TO BE SOLVED: To observe the phenomenon generated within a device by directly applying voltage at a specific position within an LSI with design dimensions of about 0.1 μm. SOLUTION: This method comprises, in addition to a process for processing arbitrary area of an object sample into a fine sample piece by using charged particle beam and extracting the sample piece, a process for attaching fine conductors 30a and 30b to the extracted fine sample piece 72, and a process for applying voltage to the attached fine conductors. COPYRIGHT: (C)2008,JPO&INPIT

    Sample preparation apparatus and the sample preparation method
    5.
    发明专利
    Sample preparation apparatus and the sample preparation method 有权

    公开(公告)号：JP4016970B2

    公开(公告)日：2007-12-05

    申请号：JP2004167930

    申请日：2004-06-07

    Applicant: 株式会社日立製作所

    Inventor： 聡 富松 ,  英巳 小池 ,  馨 梅村

    IPC: G01N1/28 ,  G01N23/00 ,  G01N1/32 ,  G01N27/62 ,  G01Q30/02 ,  G01Q30/08 ,  G01Q30/20 ,  H01J37/20 ,  H01J37/30 ,  H01J37/317

    Abstract: PROBLEM TO BE SOLVED: To simplify work from a sample preparation to an observation, to prepare a sample in one device, and to easily transfer the prepared sample to an analyzer. SOLUTION: This sample preparing device is constituted of at least an irradiation optical system for emitting an ion beam, a secondary particle detecting means for detecting a secondary particle generated from a sample piece by irradiation of the ion beam, a side entry type of sample stage for mounting a sample holder for mounting the sample piece to fix the analytical sample, and a transfer means for transferring the picked-up sample provided by separating one portion of the sample piece to the sample holder. The work from the sample preparation up to the observation is simplified thereby, the sample is prepared in one device, the prepared sample is easy to be transferred to the analyzer, and the possibility of sample damage is reduced thereby. COPYRIGHT: (C)2005,JPO&NCIPI

    Sample preparation apparatus
    7.
    发明专利
    Sample preparation apparatus 有权

    公开(公告)号：JP3778008B2

    公开(公告)日：2006-05-24

    申请号：JP2001176475

    申请日：2001-06-12

    Applicant: 株式会社日立製作所

    Inventor： 聡 富松 ,  英巳 小池 ,  正作 山岡 ,  広康 志知 ,  宗行 福田 ,  昌和 菅谷 ,  幸二 金杉 ,  浩之 鈴木 ,  秀夫 鹿島

    IPC: G01N1/28 ,  G01N23/225 ,  G01N23/04 ,  H01J37/20 ,  H01J37/30 ,  H01L21/302 ,  H01L21/3065

    Abstract: PROBLEM TO BE SOLVED: To provide a sample preparation device for a large diameter wafer, equipped with an introduction means of a TEM holder capable of preventing pressure increase in a vacuum vessel and contamination, for fixing a sample piece having the size of several μm, enabling quick observation, and having a sample chamber having a small volume. SOLUTION: This device is equipped with a sample stage for loading a sample thereon, a charged particle beam irradiation optical system, a secondary particle detection means for detecting secondary particles generated by irradiation of the charged particle beam, a sample piece separation means for separating the sample piece from the sample, a cassette for storing the sample, a sample transfer means for transferring the sample from the cassette to the sample stage, a cartridge for holding a sample holder for fixing the sample piece, a sample loading part for fixing the sample holder and the sample loading part, having a constitution mountable on and dismountable from a sample stage body part, a cartridge station for storing the cartridge, and a transfer means for transferring the cartridge from the cartridge station onto the sample stage from the outside of the vessel.

Patent Agency Ranking