公开(公告)号：JP2011253729A

公开(公告)日：2011-12-15

申请号：JP2010127156

申请日：2010-06-02

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KAWASAKI TAKESHI ,  HAYATA YASUNARI ,  URANO KOTOKO ,  ESUMI MAKOTO ,  AGEMURA TOSHIHIDE

IPC: H01J37/145 ,  H01J37/141 ,  H01J37/20 ,  H01J37/244

Abstract: PROBLEM TO BE SOLVED: To provide a scanning electron microscope device with an inclined column capable of obtaining an inclined image having high resolution in the same level as that of a top-down image obtained using a vertical column.SOLUTION: The scanning electron microscope device includes a vertical column 100 and an inclined column 200. A tip magnetic pole 25 of an objective lens 24 of the inclined column 200 is electrically insulated by being separated from a magnetic pole body, and disposed close to a sample 13, then the tip magnetic pole 25 of the objective lens 24 and the sample 13 are kept in the same potential, thereby enabling top-down observation with high resolution by being retarded in the vertical column 100 and inclination observation with high resolution by short focus operation in the inclined column 200.

Abstract translation: 要解决的问题：提供具有能够获得与使用垂直列获得的自顶向下图像相同水平的高分辨率的倾斜图像的倾斜列的扫描电子显微镜装置。 解决方案：扫描电子显微镜装置包括垂直柱100和倾斜柱200.倾斜柱200的物镜24的尖端磁极25通过与磁极体分离而电绝缘，并且设置 靠近样品13，则物镜24的尖端磁极25和样品13保持相同的电位，从而能够通过在立柱100中延迟而以高分辨率进行自上而下观察，并且以高的倾斜观察 倾斜柱200中的短焦操作的分辨率。（C）2012年，JPO＆INPIT

公开(公告)号：JP2004214111A

公开(公告)日：2004-07-29

申请号：JP2003001686

申请日：2003-01-08

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： OSE YOICHI ,  TAYA TOSHIMICHI ,  TODOKORO HIDEO ,  OTAKA TADASHI ,  SATO MITSUGI ,  ESUMI MAKOTO

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/153 ,  H01J37/26 ,  H01J37/28 ,  H01J49/46

CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J37/28

Abstract: PROBLEM TO BE SOLVED: To provide a scanning electron microscope with a monochromator capable of increasing image resolution by monochromatizing the energy and reducing the chromatic aberration without significantly reducing the current strength of primary electron beams.
SOLUTION: Electron beams are converged at a pair of fan-shaped magnetic field and fan-shaped electric field, each having a deflection direction reverse to each other, and are restricted the energy width by a slit. Then another pair of fan-shaped magnetic field and fan-shaped electric field of the same shape are provided at a mirrored position with respect to the surface including the slit. This configuration cancels energy dispersion at a mirrored position of the object point, and reduces the size of the spot beam spatially point-focused by a focusing lens, thus improving the image resolution performance of the scanning electron microscope.
COPYRIGHT: (C)2004,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供具有能够通过使能量单色化并降低色差而增加图像分辨率的单色仪的扫描电子显微镜，而不显着降低一次电子束的电流强度。 解决方案：电子束在一对扇形磁场和扇形电场会聚，每个具有彼此相反的偏转方向，并且通过狭缝限制能量宽度。 然后，在相对于包括狭缝的表面的镜像位置处设置相同形状的另一对扇形磁场和扇形电场。 该配置消除了物点的镜像位置处的能量散射，并且减小了由聚焦透镜空间点聚焦的光点的尺寸，从而提高了扫描电子显微镜的图像分辨率性能。 版权所有（C）2004，JPO＆NCIPI

公开(公告)号：JP2007087971A

公开(公告)日：2007-04-05

申请号：JP2006355604

申请日：2006-12-28

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： OSE YOICHI ,  SATO MITSUGI ,  TODOKORO HIDEO ,  ESUMI MAKOTO ,  ARAI NORIAKI ,  DOI TAKASHI

IPC: H01J37/153

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus to reduce resolution lowering even when the beam is inclined with respect to a test sample. SOLUTION: The trajectory of a primary beam 4 toward a plurality of lenses 6, 7 is drawn out of the axes thereof with a deflector or a movable aperture. By controlling the off-axis trajectory, the charged particle beam apparatus and a method for charged particle beam irradiation include the method to cancel aberration generated by the objective lens 7 when the beam is inclined with aberration by the other lens 6. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种带电粒子束装置，即使当束相对于测试样品倾斜时，降低分辨率降低。 解决方案：将主光束4朝向多个透镜6,7的轨迹从偏转器或活动光阑的轴线拉出。 通过控制离轴轨迹，带电粒子束装置和带电粒子束照射方法包括当光束被另一透镜6的像差倾斜时消除由物镜7产生的像差的方法。 （C）2007，JPO＆INPIT

公开(公告)号：JP2012003909A

公开(公告)日：2012-01-05

申请号：JP2010136717

申请日：2010-06-16

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： SUZUKI MAKOTO ,  KASAI YUJI ,  ESUMI MAKOTO ,  SUZUKI NAOMASA ,  FUKUDA MUNEYUKI

IPC: H01J37/244 ,  H01J37/05

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of obtaining a charged particle beam image in which shape contrast and shade contrast are emphasized while maintaining a high SN ratio.SOLUTION: The charged particle beam device includes a metal plate for generating a tertiary electron by impacting a secondary electron or a reflection electron against the metal plate, between an electron source and a specimen. The metal plate comprises divided regions in each of which a voltage can be applied independently. In addition, a primary beam through hole provided in the metal plate is provided at a place adequately far from an electron beam optical axis.

Abstract translation: 要解决的问题：提供一种能够获得在保持高SN比的同时强调形状对比度和色调对比度的带电粒子束图像的带电粒子束装置。 解决方案：带电粒子束装置包括用于通过在电子源和样本之间冲击二次电子或反射电子而抵抗金属板产生三次电子的金属板。 金属板包括分开的区域，每个区域可以独立地施加电压。 此外，设置在金属板中的初级光束通孔设置在远离电子束光轴的位置处。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009135119A

公开(公告)日：2009-06-18

申请号：JP2009069502

申请日：2009-03-23

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： SATO MITSUGI ,  ESUMI MAKOTO ,  YAMAGUCHI SATOSHI

IPC: H01J37/04 ,  H01J37/153

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device with less resolution deterioration even if a beam has inclination to a sample.
SOLUTION: The charged particle beam device is provided with a means to cancel aberration generated at an objective lens 7 at a beam inclining with aberration of another lens 6 by setting an orbit of a primary beam 4 off each of axes of a plurality of lenses 6, 7, and controlling the off-axis orbit, further, a means to modulate excitation of the plurality of lenses containing the objective lens simultaneously is provided.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供即使光束对样品具有倾斜度，分辨率劣化也更小的带电粒子束装置。

解决方案：带电粒子束装置设置有通过将主光束4的轨道从多个轴的每个轴上设定而消除在物镜7处产生的像差的装置，该像差以另一透镜6的像差倾斜 的透镜6,7，并且控制离轴轨道，此外，还提供了同时调制包含物镜的多个透镜的激发的装置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009099540A

公开(公告)日：2009-05-07

申请号：JP2008218954

申请日：2008-08-28

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： ESUMI MAKOTO ,  IWAMA SATORU ,  TSUNODA JUNICHI ,  SATO TAKAHIRO ,  IKEGAMI AKIRA

IPC: H01J37/21 ,  H01J37/28 ,  H01L21/66

CPC classification number: H01J37/26 ,  G01N23/2251 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0048 ,  H01J2237/281

Abstract: PROBLEM TO BE SOLVED: To provide a method and a device for achieving accurate observation, inspection, or measurement of a contact hole with a large aspect ratio. SOLUTION: As one embodiment for achieving above purposes, in the method and the device for observing, inspecting, or measuring a sample by scanning a second electron beam after scanning a first electron beam to the sample to charge the sample, a beam diameter of the first electron beam is made larger than that of the second electron beam. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于实现具有大纵横比的接触孔的精确观察，检查或测量的方法和装置。 解决方案：作为实现上述目的的一个实施方案，在用于在向样品扫描第一电子束以对样品充电之后通过扫描第二电子束来观察，检查或测量样品的方法和装置中， 第一电子束的直径比第二电子束的直径大。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007184139A

公开(公告)日：2007-07-19

申请号：JP2006000764

申请日：2006-01-05

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： MORI WATARU ,  ESUMI MAKOTO ,  OSE YOICHI

IPC: H01J37/153 ,  H01J37/05 ,  H01J37/21

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/216

Abstract: PROBLEM TO BE SOLVED: To automatically execute adjustment of an electron beam entering into a monochromator and adjustment of an operating condition of the monochromator, in a scanning electron microscope equipped with the monochromator.
SOLUTION: This scanning electron microscope equipped with the monochromator is provided, between an electron source and the monochromator, with a first focusing lens for adjusting focusing of an electron beam entering into the monochromator, and a first astigmatism correction lens for correcting astigmatism of the electron beam entering into the monochromator, and also provided with a means for acquiring an image of an electron beam adjusting sample arranged at a position in the monochromator for focusing the electron beam and for driving the first focusing lens and the first astigmatism correction lens to adjust the focusing and astigmatism of the electron beam entering into the monochromator based on the acquired image.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：在配备有单色仪的扫描电子显微镜中，自动执行进入单色仪的电子束的调整和调节单色仪的工作状态。 解决方案：配备有单色仪的扫描电子显微镜在电子源和单色仪之间设置有用于调节进入单色仪的电子束的聚焦的第一聚焦透镜和用于校正像散的第一散光校正透镜 的电子束，并且还设置有用于获取布置在单色仪中的位置处的电子束调节样本的图像的装置，用于聚焦电子束和用于驱动第一聚焦透镜和第一散光校正透镜 基于所获取的图像来调整进入单色仪的电子束的聚焦和散光。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2014038864A

公开(公告)日：2014-02-27

申请号：JP2013219732

申请日：2013-10-23

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： ESUMI MAKOTO ,  IWAMA SATORU ,  TSUNODA JUNICHI ,  SATO TAKAHIRO ,  IKEGAMI AKIRA

IPC: H01J37/20 ,  H01J37/05 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/26 ,  G01N23/2251 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0048 ,  H01J2237/281

Abstract: PROBLEM TO BE SOLVED: To provide a method and device which allow the observation, inspection or measurement of a contact hole having a large aspect ratio to be realized.SOLUTION: As an embodiment to achieve the above objective, a method and device is proposed in which, when a sample is to be electrically charged, first a region having a first size is scanned by an electron beam whose secondary electron generation efficiency δ1 is larger than 1.0, secondly a region narrower than the first size is scanned by an electron beam whose secondary electron generation efficiency δ2 is smaller than the δ1 and then scanned by an electron beam to inspect or measure the sample.

Abstract translation: 要解决的问题：提供一种允许观察，检查或测量具有大纵横比的接触孔的方法和装置。解决方案：作为实现上述目的的实施例，提出了一种方法和装置， 当样品被充电时，首先通过其二次电子发生效率δ1大于1.0的电子束扫描具有第一尺寸的区域，其次通过电子束扫描比第一尺寸窄的区域 二次电子发生效率δ2小于δ1，然后用电子束扫描来检查或测量样品。

公开(公告)号：JP2011258573A

公开(公告)日：2011-12-22

申请号：JP2011184325

申请日：2011-08-26

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KAWASAKI TAKESHI ,  SATO MITSUGU ,  ESUMI MAKOTO ,  NAKANO TOMONORI

IPC: H01J37/153 ,  H01J37/12

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device allowing stable observation with high resolution by reducing an influence of noise of many power supplies used in an aberration corrector.SOLUTION: The charged particle beam device has: an SEM column 101 which irradiates a sample 18 with an electron beam while scanning the sample; a sample chamber in which a sample stage 80 for mounting the sample is stored; a detector 73 which detects secondary electrons generated by scanning the electron beam; display means for displaying an output signal from the detector as an SEM image; and a control unit 103 which controls respective components including the SEM column, the sample chamber and the display means. The SEM column comprises a pair of electrostatic lenses 91 and 92, and an aberration corrector 10 located between the pair of electrostatic lenses in order to correct aberration of the electron beam, and is configured to accelerate the electron beam while passing through the aberration corrector by applying a high voltage to a pair of acceleration electrodes.

Abstract translation: 要解决的问题：提供一种带电粒子束装置，通过减小像差校正器中使用的许多电源的噪声的影响，能够以高分辨率进行稳定的观察。 解决方案：带电粒子束装置具有扫描样品的扫描电子显微镜柱101，其用电子束照射样品18; 其中存储用于安装样品的样品台80的样品室; 检测器73，其检测通过扫描电子束产生的二次电子; 显示装置，用于显示来自检测器的输出信号作为SEM图像; 以及控制单元103，其控制包括SEM柱，样品室和显示装置的各个组分。 扫描电子显微镜柱包括一对静电透镜91和92以及位于一对静电透镜之间的像差校正器10，以校正电子束的像差，并且被配置为在通过像差校正器的同时加速电子束 对一对加速电极施加高电压。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010010125A

公开(公告)日：2010-01-14

申请号：JP2009103490

申请日：2009-04-22

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KATAGIRI SOUICHI ,  OSHIMA TAKU ,  TAKAMI TAKASHI ,  ESUMI MAKOTO ,  DOI TAKASHI ,  KASAI YUJI

IPC: H01J37/18

CPC classification number: H01J37/18 ,  H01J2237/06341 ,  H01J2237/182 ,  H01J2237/188

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus using a non-evaporation getter pump for keeping a degree of vacuum extremely high, namely 10
-8 -10
-9 Pa, near an electron source even in the condition of releasing electron beams without being influenced by fall-off foreign matters.
SOLUTION: The charged particle beam apparatus includes a vacuum container in which a charged particle source 2 (an electron source, an ion source or the like) is arranged, and the non-evaporation getter pump 6 provided at a position of not directly facing electron beams. To avoid the movement of foreign matters falling off the non-evaporation getter pump 6 toward an electron optical system, it is constructed so that the non-evaporation getter pump 6 is turned upward in the horizontal direction to fall into the bottom of a groove 4' of an electrode 4 or it is covered with a shielding means. Otherwise, it has a means which is installed right over the face of the non-evaporation getter pump at a position of not viewing the electron beams and which has a recessed structure for trapping the fall-off foreign matters in the lower part of the non-evaporation getter pump.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供使用非蒸发吸气泵的带电粒子束装置，以保持真空度非常高，即10 -8 -10 -9 < / SP> Pa，即使在释放电子束的条件下也不受脱落异物的影响。 解决方案：带电粒子束装置包括其中布置有带电粒子源2（电子源，离子源等）的真空容器，并且非蒸发吸气剂泵6设置在不是的位置 直接面向电子束。 为了避免从非蒸发吸气剂泵6向电子光学系统脱落的异物的移动，使得非蒸发吸气泵6在水平方向上向上转动以落入槽4的底部 的电极4，或者用屏蔽装置覆盖。 否则，它具有在非蒸发吸气泵的表面上安装在不观察电子束的位置的装置，并且具有凹陷结构，用于捕获非脱气吸气剂下部的脱落异物 - 蒸发吸气泵。 版权所有（C）2010，JPO＆INPIT