Abstract:
PROBLEM TO BE SOLVED: To provide a scanning electron microscope in which resolution improvement is made compatible with pattern identification capability improvement.SOLUTION: In a scanning electron microscope comprising a monochromator which makes an electron beam monochromatic, the monochromator includes a magnetic field generator which deflects the electron beam and a selectively energy diaphragm which passes a part of the electron beam deflected by the magnetic field generator. On a trajectory where electrons discharged from a sample are deflected by a magnetic field generated by the magnetic field generator, there are arranged a stop which passes a part of electrons discharged from the sample and a detector which detects the electrons passing through the diaphragm.
Abstract:
PROBLEM TO BE SOLVED: To provide a charged particle beam processing apparatus suppressing direct influence of a floating magnetic field on a charged particle beam, and to provide a method of adjusting a charged particle beam apparatus. SOLUTION: In a charged particle beam apparatus having a focusing lens provided between a charged particle source and an objective lens to adjust the focusing position of a charged particle beam, the focusing position of the charged particle beam by the focusing lens is changed; detection signals in a plurality of different focus positions are acquired, based on charged particles detected, while the focus position is changed; and conditions of the focusing lens at a focusing position in which evaluation value of the amount of image deviation or the amount of image deviation is relatively small are selected. A method of adjusting the charged particle beam apparatus is also provided. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To automatically execute adjustment of an electron beam entering into a monochromator and adjustment of an operating condition of the monochromator, in a scanning electron microscope equipped with the monochromator. SOLUTION: This scanning electron microscope equipped with the monochromator is provided, between an electron source and the monochromator, with a first focusing lens for adjusting focusing of an electron beam entering into the monochromator, and a first astigmatism correction lens for correcting astigmatism of the electron beam entering into the monochromator, and also provided with a means for acquiring an image of an electron beam adjusting sample arranged at a position in the monochromator for focusing the electron beam and for driving the first focusing lens and the first astigmatism correction lens to adjust the focusing and astigmatism of the electron beam entering into the monochromator based on the acquired image. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To solve the problem in which: when positional deviation occurs according to a scanning direction of electron beams, the amount of deviation becomes different for each scanning direction in reciprocating scanning, and therefore, continuity of images is lost and a correct image cannot be obtained; every image is deviated in the same direction in a one-way scanning, and the center position of the images is deviated; and if the center position of the images is deviated, a field of view becomes different when the images are enlarged or reduced.SOLUTION: A charged particle beam device includes: a deflector that scans beams emitted from a charged particle source on a sample; a scanning signal generating unit that generates scanning signals to be provided to the deflector; a detecting unit that detects charged particles obtained on the basis of the irradiation of the beams emitted from the charged particle source; an AD conversion unit that digitally converts the output of the detecting unit; a control unit that generates operation timing of the deflector; and a delaying unit that delays the operation timing. The AD conversion unit is operated at the operation timing delayed by the delaying unit.
Abstract:
PROBLEM TO BE SOLVED: To provide an electron beam type measurement and inspection apparatus and a measurement and inspection method featuring a reduced divergence in electron beam scanning caused by a mirror body current noise.SOLUTION: A measurement or inspection apparatus includes an electron irradiation system which irradiates a subject to be inspected with an electron beam, a mirror body though which an electron beam passes until it irradiates the subject to be inspected after being emitted from the electron irradiation system, a secondary electron detection system which detects secondary electrons generated by irradiating the subject to be inspected with the electron beam which passes through the mirror body, a signal processing system which processes a signal based on the secondary electrons detected by the secondary electron detection system, and correction means which measures a current value flowing in the mirror body when the electron beam emitted from the electron irradiation system passes through the mirror body and corrects the irradiated position of the electron beam based on a relationship between the current value and a predetermined current value and a divergence in beam position.