公开(公告)号：JP2012003909A

公开(公告)日：2012-01-05

申请号：JP2010136717

申请日：2010-06-16

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： SUZUKI MAKOTO ,  KASAI YUJI ,  ESUMI MAKOTO ,  SUZUKI NAOMASA ,  FUKUDA MUNEYUKI

IPC: H01J37/244 ,  H01J37/05

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of obtaining a charged particle beam image in which shape contrast and shade contrast are emphasized while maintaining a high SN ratio.SOLUTION: The charged particle beam device includes a metal plate for generating a tertiary electron by impacting a secondary electron or a reflection electron against the metal plate, between an electron source and a specimen. The metal plate comprises divided regions in each of which a voltage can be applied independently. In addition, a primary beam through hole provided in the metal plate is provided at a place adequately far from an electron beam optical axis.

Abstract translation: 要解决的问题：提供一种能够获得在保持高SN比的同时强调形状对比度和色调对比度的带电粒子束图像的带电粒子束装置。 解决方案：带电粒子束装置包括用于通过在电子源和样本之间冲击二次电子或反射电子而抵抗金属板产生三次电子的金属板。 金属板包括分开的区域，每个区域可以独立地施加电压。 此外，设置在金属板中的初级光束通孔设置在远离电子束光轴的位置处。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010118564A

公开(公告)日：2010-05-27

申请号：JP2008291624

申请日：2008-11-14

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： NOZOE MARI ,  MIYAI YASUSHI ,  OKAMURA MITSURU ,  SUZUKI MAKOTO ,  OMINAMI YUSUKE

IPC: H01L21/66 ,  G01N23/225 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J2237/0048 ,  H01J2237/2008 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To simply set optimum conditions of precharge to be carried out before inspection of a pattern formed during a semiconductor device manufacturing process to automatically determine whether the precharge is successful and feed back the results to subsequent operations so as to prevent degradation in reliability of inspection results for constantly stable inspection. SOLUTION: An apparatus for inspecting the pattern includes a charge forming means for generating electrons from another electron source different from an electron source for generating electron beams before radiating an electron beam to form the charge on a surface of a substrate, a current measuring means for measuring a value of current flowing to the substrate while the charge is formed on the surface of the substrate by the charge forming means, and an adjusting means for adjusting the charge formed by the charge forming means so that the value of the current measured by the current measuring means is a predetermined target value. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了在半导体器件制造过程中形成的图案的检查之前简单地设置预充电的最佳条件，以自动确定预充电是否成功并将结果反馈到后续操作，以便 防止检查结果的可靠性降低，不断稳定检查。 解决方案：用于检查图案的装置包括电荷形成装置，用于在辐射电子束之前从不同于用于产生电子束的电子源的另一个电子源产生电子，以在衬底的表面上形成电荷 测量装置，用于测量在通过电荷形成装置在基板的表面上形成电荷时流过基板的电流值;以及调节装置，用于调节由电荷形成装置形成的电荷，使得电流值 由电流测量装置测量的是预定的目标值。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012204108A

公开(公告)日：2012-10-22

申请号：JP2011066724

申请日：2011-03-24

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KASAI YUJI ,  SUZUKI MAKOTO ,  MAKINO HIROSHI

IPC: H01J37/244 ,  H01J37/05 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/05 ,  G06T1/00 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24495

Abstract: PROBLEM TO BE SOLVED: To automate a synthesizing function for signal charged particles with different energies.SOLUTION: A charged particle beam device includes a charged particle source which irradiates a sample with a primary charged particle beam; a first detector which detects a first signal electrode having first energy among signal charged particles generated by the sample; a second detector which detects a second signal electron having second energy among the signal charged particles generated by the sample; a first arithmetic part which generates a detection image corresponding to each synthesis ratio by varying the synthesis ratio of a signal intensity of the first signal electron and a signal intensity of the second signal electron; a second arithmetic part which calculates a ratio of signal intensities corresponding to two predetermined areas of detection images generated for respective synthesis ratios; and a third arithmetic part which determines a mixing ratio to be used to acquire a detection image based upon variation in the ratio of signal intensities.

Abstract translation: 要解决的问题：使具有不同能量的信号带电粒子的合成功能自动化。 带电粒子束装置包括用原子带电粒子束照射样品的带电粒子源; 第一检测器，其检测由所述样品产生的信号带电粒子中具有第一能量的第一信号电极; 第二检测器，其检测由所述样品产生的所述信号带电粒子中具有第二能量的第二信号电子; 第一运算部，其通过改变第一信号电子的信号强度和第二信号电子的信号强度的合成比来生成与各合成比相对应的检测图像; 计算对应于针对各合成比生成的检测图像的两个预定区域的信号强度的比率的第二算术部分; 以及第三运算部，其基于信号强度比的变化来决定用于获取检测图像的混合比。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2009187851A

公开(公告)日：2009-08-20

申请号：JP2008028299

申请日：2008-02-08

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： SUZUKI MAKOTO ,  TANIMOTO NORIFUMI

IPC: H01J37/20 ,  H01J37/22 ,  H01J37/28

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of obtaining a stable sample image without changing condition of a sample by enabling measurement of electrical potential in the surface of the sample so as to control the surface of the sample at a constant electrical potential, and to provide a method of knowing electrostatic charge condition in the surface of the sample, in regard to a charged particle beam device for obtaining an image by radiating charged particle beams to a sample and detecting a signal secondarily generated from the sample and a method of knowing electrostatic charge condition in the surface of a sample. SOLUTION: The charged particle beam device for obtaining an image by converging charged particle beams with an objective lens, radiating a sample, and detecting a signal secondarily generated from the sample includes an electron source for generating a second charged particle beam having a locus crossing between the sample and the objective lens, a detecting unit for detecting the second charged particle beam, and a computing section for computing electrostatic charge condition in the surface of the sample based on the locus of the second charged particle beam detected by the detecting unit. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种带电粒子束装置，其能够通过能够测量样品表面中的电位而获得稳定的样品图像而不改变样品的状态，以便将样品的表面控制在 恒定的电位，并且提供一种了解样品表面的静电电荷状态的方法，就带电粒子束装置而言，用于通过向样品照射带电粒子束来获得图像，并且检测从第二次产生的信号 样品和在样品表面知道静电电荷状态的方法。 解决方案：用于通过用物镜会聚带电粒子束，照射样品和检测从样品二次产生的信号来获得图像的带电粒子束装置包括：电子源，用于产生第二带电粒子束，具有 用于检测第二带电粒子束的检测单元和用于根据检测到的第二带电粒子束的轨迹计算样本表面中的静电电荷状况的计算部分， 单元。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2014137974A

公开(公告)日：2014-07-28

申请号：JP2013007706

申请日：2013-01-18

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： RI UEN ,  TAKAHASHI HIROYUKI ,  SUZUKI MAKOTO ,  KAWANO HAJIME

IPC: H01J37/22 ,  H01J37/24 ,  H01J37/28 ,  H01L21/66

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/2485 ,  H01J2237/2809

Abstract: PROBLEM TO BE SOLVED: To provide a measurement and inspection device of a scanning type electron beam system, and to provide a technology capable of achieving high-accuracy measurement and inspection depending on a scanning speed.SOLUTION: A secondary electron signal detection system in a measurement and inspection device deals with scanning control of a plurality of scanning speeds, and comprises: a detector 107 for detecting a secondary electron signal (SE) resulted from irradiation of an electron beam to a sample 110 by the scanning control; a preamplifier 30 for performing a current-voltage conversion of an output of the detector 107 to pre-amplify the converted output; an analog signal processing amplification part 51 for receiving an output of the preamplifier 30 and performing analog processing amplification of the output, and an ADC (Analog-Digital Conversion part) 52 for performing analog-to-digital conversion of an output of the analog signal processing amplification part 51, as a secondary electron signal detector 50; and an image processing part 205 for generating a measurement or inspection image on the basis of an output of the secondary electron signal detector 50. The controller 210 performs switching control of each part including a LPF (12) in the analog signal processing amplification part 51 depending on a scanning speed and the like.

Abstract translation: 要解决的问题：提供扫描型电子束系统的测量和检查装置，并提供能够根据扫描速度实现高精度测量和检查的技术。解决方案：二次电子信号检测系统 测量和检查装置处理多个扫描速度的扫描控制，并且包括：检测器107，用于检测通过扫描控制将电子束照射到样品110产生的二次电子信号（SE）; 前置放大器30，用于对检测器107的输出进行电流电压转换，以对放大转换的输出进行预放大; 用于接收前置放大器30的输出并对输出进行模拟处理放大的模拟信号处理放大部分51和用于对模拟信号的输出执行模数转换的ADC（模拟数字转换部分）52 处理放大部分51作为二次电子信号检测器50; 以及用于基于二次电子信号检测器50的输出产生测量或检查图像的图像处理部分205.控制器210对模拟信号处理放大部分51中包括LPF（12）的每个部分进行切换控制 取决于扫描速度等。

公开(公告)号：JP2013168215A

公开(公告)日：2013-08-29

申请号：JP2012029057

申请日：2012-02-14

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： SUZUKI MAKOTO ,  ASAO KAZUNARI

IPC: H01J37/22

CPC classification number: H01J37/263 ,  H01J37/265 ,  H01J2237/221

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of selecting proper pre-processing conditions in performing automatic brightness and contrast adjustment.SOLUTION: There is provided a charged particle beam device including: a plurality of noise elimination filters which eliminate noise of an electric signal; a measurement section which measures a contrast noise ratio after applying one of the noise elimination filters; and a determination section which determines magnitude between the contrast noise ratio measured by the measurement section and a preset threshold.

Abstract translation: 要解决的问题：提供一种能够在执行自动亮度和对比度调整中选择适当的预处理条件的带电粒子束装置。解决方案：提供一种带电粒子束装置，包括：多个消除噪声的滤波器，其消除 电信号 测量部分，其在施加所述噪声消除滤波器之一之后测量对比度噪声比; 以及确定部，其确定由测量部测量的对比度噪声比与预设阈值之间的大小。

公开(公告)号：JP2006032202A

公开(公告)日：2006-02-02

申请号：JP2004211415

申请日：2004-07-20

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： SUZUKI MAKOTO ,  TANIMOTO NORIFUMI ,  SASAKI HIROKO

IPC: H01J37/28 ,  H01L21/66

CPC classification number: H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/2826

Abstract: PROBLEM TO BE SOLVED: To provide a charged particle beam device allowing accurate condition setting to be easily carried out in a short time.
SOLUTION: This charge particle beam device used for detecting a generation signal generated from a sample and including secondary electrons to obtain an image is provided with: an input means for inputting a current value and a voltage value to be applied to a charged particle optical system through which a charged particle beam flows; a storage means for storing the shape, position and properties of the charged particle optical system and accuracy of the current or the voltage to be applied; an electromagnetic field calculation means for carrying out electromagnetic field calculation in the vicinity of a charged particle beam path; a charged particle beam track calculation means for calculating the track of the charged particle beam in the calculated electromagnetic field; a storage means for storing the result of the track calculation; and a control part for controlling the charged particle optical system based on the calculation result.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种允许在短时间内容易地执行精确状态设置的带电粒子束装置。 解决方案：用于检测从样品产生的并包括二次电子以获得图像的产生信号的电荷粒子束装置具有：输入装置，用于输入电流值和施加到带电的电压值的电压值 带电粒子束流过的粒子光学系统; 存储装置，用于存储带电粒子光学系统的形状，位置和特性以及要施加的电流或电压的精度; 用于在带电粒子束路径附近进行电磁场计算的电磁场计算装置; 带电粒子束轨迹计算装置，用于计算所计算的电磁场中的带电粒子束的轨迹; 用于存储轨道计算结果的存储装置; 以及用于基于计算结果控制带电粒子光学系统的控制部分。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2014146722A

公开(公告)日：2014-08-14

申请号：JP2013014968

申请日：2013-01-30

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KAWADA HIROKI ,  SUZUKI MAKOTO

IPC: H01L21/02 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide a management device of a semiconductor device for facilitating management of a semiconductor device by providing micro identification information to a semiconductor chip, or the like, and to provide a microscope.SOLUTION: In this invention, a management device of a semiconductor device includes an arithmetic unit accessible to a storage medium for storing the finger print pattern information in association with at least one of the semiconductor manufacturing conditions, measurement conditions when measuring the semiconductor, measurement results when measuring the semiconductor, and chip information. The arithmetic unit refers to at least one of the semiconductor manufacturing conditions, measurement conditions, measurement results, and chip information, based on the input of the finger print pattern information. This invention also provides a microscope.

Abstract translation: 要解决的问题：提供一种半导体器件的管理装置，用于通过向半导体芯片等提供微型识别信息来提供对半导体器件的管理，并提供显微镜。解决方案：在本发明中，管理装置 与半导体制造条件，测量半导体时的测量条件，测量半导体时的测量结果以及芯片信息相关联地存储指纹图案信息的存储介质可访问的运算单元。 算术单元基于指纹图案信息的输入来参考半导体制造条件，测量条件，测量结果和芯片信息中的至少一个。 本发明还提供一种显微镜。

公开(公告)号：JP2013178880A

公开(公告)日：2013-09-09

申请号：JP2012040865

申请日：2012-02-28

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： YAMAZAKI MINORU ,  KAZUMI HIDEYUKI ,  SASAKI HIROKO ,  SUZUKI MAKOTO

IPC: H01J37/244 ,  H01J37/05 ,  H01J37/147 ,  H01J37/22 ,  H01J37/29

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/1501 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/2814

Abstract: PROBLEM TO BE SOLVED: To provide a scanning electron microscope in which an angle of electrons discharged from a sample is discriminated without providing an angle restriction aperture out of an axis.SOLUTION: A scanning electron microscope is proposed which comprises a deflector for deflecting a position to be irradiated with an electron beam and a control device for controlling the deflector. The scanning electron microscope further comprises a detector which detects electrons obtained by irradiating a sample with the electron beam, an aperture forming member which is disposed between the detector and the deflector and includes a passing aperture for the electron beam, and a secondary signal deflector which deflects the electrons discharged from the sample. In accordance with deflection control of the deflector, the secondary signal deflector is controlled so as to deflect the electrons discharged from the sample toward the passing aperture for the electron beam.

Abstract translation: 要解决的问题：提供一种扫描电子显微镜，其中鉴别从样品排出的电子的角度，而不在轴外提供角度限制孔。解决方案：提出一种扫描电子显微镜，其包括用于偏转位置的偏转器 用电子束照射和用于控制偏转器的控制装置。 扫描电子显微镜还包括检测器，其检测通过用电子束照射样品获得的电子;孔形成构件，其设置在检测器和偏转器之间并且包括用于电子束的通过孔，以及次级信号偏转器， 偏转从样品排出的电子。 根据偏转器的偏转控制，控制次级信号偏转器以使从样品排出的电子朝向电子束的通过孔偏转。

公开(公告)号：JP2011014414A

公开(公告)日：2011-01-20

申请号：JP2009158370

申请日：2009-07-03

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： SUZUKI MAKOTO ,  TANIMOTO NORIFUMI ,  YAMAMOTO TAKUMA

IPC: H01J37/20 ,  G01N23/225 ,  H01J37/28 ,  H01L21/66

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To solve a problem that it is impossible to obtain the same sensitivity of a test in the outer peripheral part and the center part of a tested specimen since charged characteristics are different between the outer peripheral part and the center part of the tested specimen.SOLUTION: A specimen cover is installed at the outer peripheral part of a specimen holder on which the testing specimen is placed, and the charged characteristics of the specimen cover are changed according to the charged characteristics of the tested specimen.

Abstract translation: 要解决的问题：为了解决在试验样品的外周部分和中心部分不能获得相同的试验灵敏度的问题，因为外周部分和中心部分的带电特性不同 测试样本。解决方案：将样品盖安装在放置测试样本的样品架的外周部分，并根据被测样品的带电特性改变样品盖的带电特性。