公开(公告)号：JP2014165087A

公开(公告)日：2014-09-08

申请号：JP2013036580

申请日：2013-02-27

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KADOI RYO ,  RI UEN ,  KAWANO HAJIME ,  TAKAHASHI HIROYUKI

IPC: H01J37/147 ,  H01J37/28

Abstract: PROBLEM TO BE SOLVED: To provide an inspection device which can perform measurement with high accuracy by an inexpensive structure.SOLUTION: An inspection device for inspecting a sample by deflecting an electron beam and has: an electron gun for emitting the electron beam; a deflector 109 for deflecting electron beams; a deflection control unit 101 for controlling the deflector; a digital/analog converter 102 for converting a deflection signal of the deflection control unit 101 into an analog signal; an inverted amplifier 103 for changing polarity of an output signal of the digital/analog converter 102 and outputting the signal; a non-inverted amplifier 106 for outputting the output signal of the digital/analog converter 102 without changing the polarity; variable delay parts 104 and 107 for varying a delay amount of a signal; and a delay control unit 110 for controlling delay amounts of the variable delay parts 104 and 107. The delay amounts of the variable delay parts 104 and 107 are adjusted by control by the delay control unit 110, so that delay difference between the inverted amplifier 103 and the non-inverted amplifier 106 is eliminated, and an astigmatic error is cancelled highly accurately and inexpensively.

Abstract translation: 要解决的问题：提供一种可以通过廉价的结构以高精度进行测量的检查装置。解决方案：一种用于通过偏转电子束来检查样品的检查装置，并具有：用于发射电子束的电子枪; 用于偏转电子束的偏转器109; 用于控制偏转器的偏转控制单元101; 用于将偏转控制单元101的偏转信号转换为模拟信号的数字/模拟转换器102; 反转放大器103，用于改变数/模转换器102的输出信号的极性并输出该信号; 非反相放大器106，用于在不改变极性的情况下输出数/模转换器102的输出信号; 可变延迟部分104和107，用于改变信号的延迟量; 以及用于控制可变延迟部分104和107的延迟量的延迟控制单元110.通过延迟控制单元110的控制来调整可变延迟部分104和107的延迟量，使得反相放大器103 并且消除非反相放大器106，并且高精度和低成本地消除像散误差。

公开(公告)号：JP2013084344A

公开(公告)日：2013-05-09

申请号：JP2011221474

申请日：2011-10-06

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KANEOKA NORIYUKI ,  TAKAHASHI HIROYUKI

IPC: H01J37/24 ,  H01J37/09 ,  H01J37/147

Abstract: PROBLEM TO BE SOLVED: To solve such a problem that noise is generated for a deflection signal and a detection signal between the control circuit of a charged particle beam device and a controlled apparatus, and a problem that maintenance is difficult in a sample chamber when the cable connecting the control circuit and the controlled apparatus is shortened in order to reduce noise, and to provide a charged particle beam device which can produce a high-quality image, in which the impact of noise is reduced, without sacrifice of maintainability.SOLUTION: The charged particle beam device comprises a column for irradiating a sample with a charged particle beam, a control unit for controlling the internal apparatus of the column, and a moving mechanism for moving the control unit. The control unit is located in the vicinity of the column when an image is acquired by irradiating a charged particle beam, and can move to recede from the column during maintenance.

Abstract translation: 解决的问题为了解决在带电粒子束装置和受控装置的控制电路之间产生偏转信号的噪声和检测信号的问题，以及样本的维护困难的问题 缩短连接控制电路和受控装置的电缆，以减少噪音，并且提供可以产生高质量图像的带电粒子束装置，其中噪声的影响降低，而不牺牲可维护性 。 解决方案：带电粒子束装置包括用于用带电粒子束照射样品的柱，用于控制柱的内部装置的控制单元和用于移动控制单元的移动机构。 当通过照射带电粒子束获取图像时，控制单元位于列的附近，并且可以在维护期间从柱移动到后退。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2007194293A

公开(公告)日：2007-08-02

申请号：JP2006009159

申请日：2006-01-17

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： TAKAHASHI HIROYUKI ,  ANDO MASAAKI ,  KAMATA MASATO ,  TAKAHASHI KAZUKI

IPC: H01L21/027 ,  H01J37/305

Abstract: PROBLEM TO BE SOLVED: To realize an electron beam drawing apparatus which can calculate an optimal moving speed of a test piece table without invalid drawing, and optimally control the speed of the test piece to shorten the drawing processing time.
SOLUTION: Drawing date are output to a graphic disassembling part 3, it is disassembled at a size enough to be shot, and then the disassembled data are stored in a drawing data buffer 4. A counter 7 meters the number of irradiation times of electron beam in a sub-field output by the disassembling part 3, and the result is output to a test piece speed computation part 17. The data stored in the data buffer 4 is read out by a correction computation part 5, and a sub-field coordinate under drawing is output to a test piece table control unit 14. The data buffer 4 stores a drawing data larger than one sub-field, and the operation of the disassembling part 3 and the computation part 5 is made to have a phase difference by one sub-field or more, and then the number of the drawing data that advances by one or more from the sub-field under drawing is output to the computation part 17. The test piece table control unit 14 calculates the optima moving speed of the test piece table 13 according to the number 16 of data for each of output sub-fields of the counter 7, so as to control the test piece table moving speed.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：实现能够计算没有无效绘制的试片台的最佳移动速度的电子束描绘装置，并且最佳地控制试件的速度以缩短绘制处理时间。

解决方案：绘图日期输出到图形拆卸部件3，以足够大的尺寸拆卸，然后将拆卸的数据存储在绘图数据缓冲器4中。计数器7将照射次数 的电子束，并将结果输出到试片速度计算部17.存储在数据缓冲器4中的数据由校正计算部5读出，子部分 绘制中的场地坐标被输出到测试台表控制单元14.数据缓冲器4存储大于一个子场的绘图数据，并且使分解部分3和计算部分5的操作具有相位 差异为一个子场以上，然后将从图画中的子场前进一个或多个的绘图数据的数量输出到计算部17.测试台表控制部14计算最佳移动速度 的试片表13 g到计数器7的每个输出子场的数据数16，以便控制测试片的移动速度。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2015015161A

公开(公告)日：2015-01-22

申请号：JP2013141301

申请日：2013-07-05

Applicant: 株式会社日立ハイテクノロジーズ ,  Hitachi High-Technologies Corp

Inventor： HIRANO KATSUNORI ,  TOBA TADANOBU ,  WADA MASAJI ,  KAWAMURA KATSUAKI ,  OHASHI MASAHIRO ,  TAKAHASHI HIROYUKI

IPC: H01J37/28 ,  H01J37/22

Abstract: 【課題】本発明は高精度、高スループットな画像処理装置及びSEM式計測装置を実現することを目的とする。【解決手段】走査型電子顕微鏡装置を用い、電子ビームを照射して基板上の検査対象領域を走査し、出射される二次電子を検出して該検査対象領域の画像情報を取得するSEM式計測装置であって、電子ビームを任意の方向に走査し、被対象物上の離散的な位置に照射する照射部と、前記照射部を制御するスキャン制御部と、前記電子ビームが照射された前記被対象物上の離散的な位置から順次二次電子を検出する検出部と、前記検出された二次電子の信号を画像データに変換する変換部と、前記画像データを取込む画像取込み部と、前記離散的な位置から変換された画像データを並び替える並び替え部と、前記並び替えられた画像データを表示する表示部とを備え、前記スキャン制御部と前記変換部と前記並び替え部を前記走査型電子顕微鏡装置の筺体内に搭載したことを特徴とする。【選択図】図1

Abstract translation: 要解决的问题：实现具有高精度和高产量的图像处理装置和SEM型测量装置。解决方案：使用扫描电子显微镜装置的SEM型测量装置，通过以下方式获取基板上的检查对象区域的图像信息 通过用电子束进行照射来扫描检查对象区域，检测发射的二次电子。 SEM型测量装置包括：照射单元，用于在任意方向上用用于扫描的电子束照射目标上的离散位置; 扫描控制单元，用于控制照射单元; 检测单元，用于从照射电子束的目标上的离散位置顺序地检测二次电子; 转换单元，用于将来自检测到的二次电子的信号转换为图像数据; 用于捕获图像数据的捕获单元; 重新排列单元，用于从离散位置重新排列转换的图像数据; 以及用于显示重新排列的图像数据的显示单元。 扫描控制单元，转换单元和重新排列单元安装在扫描电子显微镜装置的外壳中。

公开(公告)号：JP2014137974A

公开(公告)日：2014-07-28

申请号：JP2013007706

申请日：2013-01-18

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： RI UEN ,  TAKAHASHI HIROYUKI ,  SUZUKI MAKOTO ,  KAWANO HAJIME

IPC: H01J37/22 ,  H01J37/24 ,  H01J37/28 ,  H01L21/66

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/2485 ,  H01J2237/2809

Abstract: PROBLEM TO BE SOLVED: To provide a measurement and inspection device of a scanning type electron beam system, and to provide a technology capable of achieving high-accuracy measurement and inspection depending on a scanning speed.SOLUTION: A secondary electron signal detection system in a measurement and inspection device deals with scanning control of a plurality of scanning speeds, and comprises: a detector 107 for detecting a secondary electron signal (SE) resulted from irradiation of an electron beam to a sample 110 by the scanning control; a preamplifier 30 for performing a current-voltage conversion of an output of the detector 107 to pre-amplify the converted output; an analog signal processing amplification part 51 for receiving an output of the preamplifier 30 and performing analog processing amplification of the output, and an ADC (Analog-Digital Conversion part) 52 for performing analog-to-digital conversion of an output of the analog signal processing amplification part 51, as a secondary electron signal detector 50; and an image processing part 205 for generating a measurement or inspection image on the basis of an output of the secondary electron signal detector 50. The controller 210 performs switching control of each part including a LPF (12) in the analog signal processing amplification part 51 depending on a scanning speed and the like.

Abstract translation: 要解决的问题：提供扫描型电子束系统的测量和检查装置，并提供能够根据扫描速度实现高精度测量和检查的技术。解决方案：二次电子信号检测系统 测量和检查装置处理多个扫描速度的扫描控制，并且包括：检测器107，用于检测通过扫描控制将电子束照射到样品110产生的二次电子信号（SE）; 前置放大器30，用于对检测器107的输出进行电流电压转换，以对放大转换的输出进行预放大; 用于接收前置放大器30的输出并对输出进行模拟处理放大的模拟信号处理放大部分51和用于对模拟信号的输出执行模数转换的ADC（模拟数字转换部分）52 处理放大部分51作为二次电子信号检测器50; 以及用于基于二次电子信号检测器50的输出产生测量或检查图像的图像处理部分205.控制器210对模拟信号处理放大部分51中包括LPF（12）的每个部分进行切换控制 取决于扫描速度等。

公开(公告)号：JP2011049041A

公开(公告)日：2011-03-10

申请号：JP2009196748

申请日：2009-08-27

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： RI UEN ,  MAKUUCHI MASAMI ,  IMAGAWA KENGO ,  OTA HIROYA ,  MAKINO HIROSHI ,  TAKAHASHI HIROYUKI ,  GUNJI YASUHIRO

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: PROBLEM TO BE SOLVED: To provide a high-sensitivity, a high-throughput electron beam type inspection device and an inspection method for alleviating artificial defects caused by scanning shift of primary electron beams. SOLUTION: A semiconductor inspection device with a plurality of primary electron beams is provided with an adjustment means for setting a position where the plurality of primary electron beams are emitted to a sample for inspection. An irradiation positions of the plurality of primary electron beams on the sample are set in accordance with a repetition pattern interval of the sample for the inspection, and repetition pattern images of the comparison object are obtained at the same time. On the plurality of images obtained at the same time, scanning shift of the primary electron beams is the same at places of the repetition pattern to be compared. For that, artificial defects caused by the scanning shift of the electron beams are eliminated on the images, whereby a high-sensitivity, the high-throughput electron beam type inspection device, and the inspection method can be provided. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供高灵敏度，高通量电子束型检查装置和用于减轻由一次电子束的扫描偏移引起的人为缺陷的检查方法。 解决方案：具有多个一次电子束的半导体检查装置设置有用于将发射多个一次电子束的位置设置到用于检查的样品的调节装置。 根据用于检查的样本的重复图案间隔来设定样本上的多个一次电子束的照射位置，并且同时获得比较对象的重复图案图像。 在同时获得的多个图像中，一次电子束的扫描移位在要比较的重复图案的位置处相同。 为此，在图像上消除了由电子束的扫描偏移引起的人造缺陷，从而可以提供高灵敏度，高通量电子束型检查装置和检查方法。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010103322A

公开(公告)日：2010-05-06

申请号：JP2008273713

申请日：2008-10-24

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： TAKAHASHI HIROYUKI ,  GUNJI YASUHIRO ,  ITO HIROICHI

IPC: H01L21/66 ,  G01N23/225

CPC classification number: G06T7/001 ,  G06T7/13 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To prevent a circuit pattern inspection device from decreasing in operation rate by measuring image noise of the circuit pattern inspection device and detecting a sign for an abnormal device state. SOLUTION: The circuit pattern inspection device, which detects abnormality of a circuit pattern by irradiating a substrate where the circuit pattern is formed with an electron beam and detecting a secondary electron or reflected electron, includes: an image processing section which generates an image based upon the signal intensity of the detected secondary electron or reflected electron and displays the image on a display device of an interface; and a control section which performs frequency analysis of noise included in the image. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了防止电路图案检查装置通过测量电路图案检查装置的图像噪声并检测异常装置状态的符号来降低操作速率。 解决方案：通过用电子束照射电路图形的基板并检测二次电子或反射电子来检测电路图案的异常的电路图案检查装置包括：图像处理部，其生成 基于检测到的二次电子或反射电子的信号强度的图像，并将该图像显示在界面的显示装置上; 以及对图像中包含的噪声进行频率分析的控制部。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009301812A

公开(公告)日：2009-12-24

申请号：JP2008153638

申请日：2008-06-12

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： GUNJI YASUHIRO ,  FUJII KEN ,  TAKAHASHI HIROYUKI ,  FUNATSU RYUICHI ,  HONDA TOSHIFUMI

IPC: H01J37/21 ,  H01J37/28 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide an excellent apparatus and method achieving highly sensitive defect-detecting performance without bringing about degradation of focusing accuracy, even in case contrast at defective portions is not enough obtained due to special features of a wafer.
SOLUTION: An SEM system appearance inspection method and a device thereof, in which, after loading a sample on a portable stage and carrying out measurement of a height of the sample, electron beams are scanned over the sample to find a defective part from an image thus obtained, include a height measurement with a correction processing function through stage movement.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：即使在由于晶片的特殊性而不能获得缺陷部分的对比度的情况下，也可以提供一种实现高灵敏度缺陷检测性能而不会导致聚焦精度降低的优良装置和方法。 解决方案：SEM系统外观检查方法及其装置，其中在将样品装载在便携式载物台上并进行样品的高度测量之后，将电子束扫描在样品上以找到缺陷部分 根据这样获得的图像，通过平台移动包括具有校正处理功能的高度测量。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006086182A

公开(公告)日：2006-03-30

申请号：JP2004266635

申请日：2004-09-14

Applicant: Canon Inc ,  Hitachi High-Technologies Corp ,  キヤノン株式会社 ,  株式会社日立ハイテクノロジーズ

Inventor： TAKAHASHI HIROYUKI ,  ANDO MASAAKI ,  YODA HARUO ,  YUI TAKASUMI

IPC: H01L21/027 ,  G03F7/20 ,  H01J37/147 ,  H01J37/305

Abstract: PROBLEM TO BE SOLVED: To provide an electron-beam exposure method properly correcting the slippage of a μ field forming a drawing pattern and having the excellent accuracy of a drawing at a high speed.
SOLUTION: The electron-beam exposure method has a means for generating a plurality of beams arrayed in a latticed shape, a means for converting the drawing pattern into the on/off-information of the beams, a means for separately turning a plurality of the beams on/off, and a means for obtaining the correcting volume of latticed shape of the corrected beams. The electron-beam exposure method further has a means for independently controlling places of the plurality of irradiated beams, and correcting the latticed shapes of the plurality of beams, a means for simultaneously deflecting the places of the plurality of irradiated beams arrayed in the latticed shape, and a means for correcting deflecting shapes in the case of simultaneous deflections. Drawing is performed while correcting the latticed shape and simultaneous deflecting shapes of the plurality of beams.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种适当地校正形成绘图图案的μ场的滑动并且具有高速绘图精度优良的电子束曝光方法。 解决方案：电子束曝光方法具有用于产生以格子形状排列的多个光束的装置，用于将绘图图案转换成光束的开/关信息的装置，用于分别转动 多个光束开/关，以及用于获得校正光束的格子形状的校正量的装置。 电子束曝光方法还具有用于独立地控制多个照射光束的位置并校正多个光束的格子形状的装置，用于同时偏转以格子形状排列的多个照射光束的位置的装置 以及用于在同时偏转的情况下校正偏转形状的装置。 在校正多个光束的格子形状和同时偏转形状的同时执行绘图。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006032614A

公开(公告)日：2006-02-02

申请号：JP2004208676

申请日：2004-07-15

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： ADACHI NAOTAKA ,  TAKAHASHI HIROYUKI ,  KAMATA MASATO

IPC: H01L21/027 ,  G03F7/20 ,  H01J37/20 ,  H01J37/305

Abstract: PROBLEM TO BE SOLVED: To provide a method of controlling to move a sample stand of electron beam drawing that is reduced in vibration and with good drawing accuracy.
SOLUTION: The drawing region of the sample is partitioned into a sub-drawing region zone which performs a column to the moving direction of the sample stand and a sub-sub drawing region zone for partitioning the sub-drawing region zone in a direction intersecting perpendicularly to the moving direction of the sample stand. The drawing repeating the irradiation scanning of an electron beam is performed at a unit of the sub-sub drawing region zone. A target position value for each sub-sub-drawing region zone used for controlling the moving of the position is obtained in response to the size of the sub-sub drawing region zone occupying in the sub-drawing region zone. When the drawing of each sub-sub drawing region zone is sequentially performed from one end of the sub-drawing region zone toward the other end, the moving control of the sample stand is performed according to the position value of the moving target of the sample stand to be added with the target position value whenever the turn of the drawing is advanced.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种控制移动电子束拉伸样品台的方法，其减少了振动并且具有良好的拉伸精度。 解决方案：将样品的绘制区域划分为对样品台的移动方向进行列的亚绘图区域区域和用于将样品区域中的亚图像区域划分的副图像区域区域 方向垂直于样品台的移动方向相交。 在副图画区域的单位进行重复对电子束的照射扫描的图。 响应于在副图画区域中占据的副图画区域的大小，获得用于控制位置移动的每个子亚图区域区域的目标位置值。 当从副图画区域的一端向另一端顺序地进行每个副图画区域的绘制时，根据样品的移动目标的位置值进行样品台的移动控制 每当图纸转动提前时，立即添加目标位置值。 版权所有（C）2006，JPO＆NCIPI