Abstract:
PROBLEM TO BE SOLVED: To improve light condensing efficiency while restricting an increase in size of an objective lens.SOLUTION: A photo-detector comprises: an objective lens element (17) configured to condense light from an object (16) being measured; and a photo-detection element configured to detect light condensed by the objective lens element (17). The objective lens element (17) includes a central portion (28) configured to condense light by refraction, and a peripheral portion (29) located in the vicinity of the central portion (28) and configured to condense light by reflection. This makes it possible to condense even light at a large radiation angle, which a normal convex lens cannot condense, and to improve condensing efficiency, thus increasing sensitivity by means of the photo-detection element.
Abstract:
PROBLEM TO BE SOLVED: To provide a system, method and computer program product for CAD-based registration.SOLUTION: A system for location-based wafer analysis comprises (i) a first input interface, (ii) a second input interface, (iii) a correlator, and (iv) a processor, and is configured to generate inspection results for the inspected wafer, with the help of at least one frame run-time displacement.
Abstract:
PROBLEM TO BE SOLVED: To solve such a problem that it is difficult to quickly and highly accurately detect a defect and calculate the size of the detect without applying thermal damage to a sample in a conventional technique.SOLUTION: In a defect inspection method, illuminating light of which the illumination intensity distribution is substantially uniform in one direction on the surface of a sample is applied to the surface of the sample, a plurality of scattered light components outgoing to a plurality of mutually different directions out of scattered light from the surface of the sample are detected, a plurality of scattered light detection signals corresponding to the scattered light components are obtained, at least one of the plurality of scattered light detection signals is processed to determine the existence of a defect, at least one of the plurality of scattered light detection signals corresponding to respective positions determined as defective by the processing is processed to determine the size of the defect, and a position and a defect size on the surface of the sample for each position determined as defective are displayed.
Abstract:
PROBLEM TO BE SOLVED: To provide a measuring method capable of obtaining high accuracy of measurement, when scanning light with respect to a plurality of channels for samples which are arranged on a substrate, and optically measuring fine particles introduced to the channels for samples. SOLUTION: In the fine particle measuring method for scanning light with respect to the plurality of channels 111 for samples which are arranged on the substrate 11, and optically measuring fine particles introduced to the channels 111 for samples, by sequentially irradiating light to at least two reference regions 113, which are juxtaposed to the channels 111 for samples and detecting changes in the optical characteristics generated in the light by the reference regions 113, the emission timing of the light to the channels 111 for samples is controlled. COPYRIGHT: (C)2009,JPO&INPIT