摘要:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a metal film material, by which the recovery performance after leaving on an inkjet recording device is improved, the etching resistance of the metal film material is increased, and thereby the precision of obtained pattern shape is enhanced, and to provide the metal film material obtained by using the method.SOLUTION: The method for manufacturing a metal film material comprises: an ink application step by an inkjet method; a cured film forming step for forming a cured film by carrying out at least one of light exposure or heating of an ink composition; a catalyst application step for applying a plating catalyst or a precursor thereof to the cured film; and a plating processing step for performing plating of the plating catalyst or precursor thereof. The ink composition contains: a first monomer having a cyano group, alkyloxy group, amino group, pyridine residue, pyrrolidone residue, imidazole residue, alkylsulfonyl group, or ether residue; a second monomer that is polyfunctional; and a polymerization initiator, such that the total monomer content is 85% by mass or greater.
摘要:
PROBLEM TO BE SOLVED: To provide a method of forming a metallic pattern for simply providing a metallic pattern excelling in adhesiveness to the metallic pattern, and excelling in fine wire repeatability and conductivity, and to provide the metallic pattern provided thereby. SOLUTION: This method for forming the metallic pattern includes: a printing process of printing a pattern portion on a substrate by an ink jet method using ink containing a precursor of an electrodeless plating catalyst; and a plating process of forming a metallic pattern by electrodeless plating on the pattern portion, wherein the surface of the substrate is formed of ink non-absorptive resin, and has been subjected to a plasma treatment, and the ink has a pH value ≥9.0 at 25°C. COPYRIGHT: (C)2011,JPO&INPIT
摘要:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a printed circuit board by which a fine conductor pattern is formed inexpensively. SOLUTION: Firstly, a catalyst 2 for performing electroless plating in a subsequent step is caused to adhere to surfaces of uneven portions 1a of a matrix 1. Next, an insulating layer 3 made of a resin material is prepared. Then, the insulating layer 3 is heated to be softened while the uneven portions 1a of the matrix 1 are pressed against one surface of the insulating layer 3. Thus, grooves R2 corresponding to shapes of the uneven portions 1a of the matrix 1 are formed in the insulating layer 3 while the catalyst 2 is transferred to bottom surfaces and side surfaces of the grooves R2. The insulating layer 3 is then subjected to the electroless plating. In this case, metal is deposited by reduction reaction on portions of the insulating layer 3 where the catalyst 2 exists. Accordingly, conductor patterns 4 are formed in the grooves R2 of the insulating layer 3. COPYRIGHT: (C)2010,JPO&INPIT